公开(公告)号：JP2004343060A

公开(公告)日：2004-12-02

申请号：JP2004065480

申请日：2004-03-09

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN RHEE TASJA ,  CASTENMILLER THOMAS JOSEPHUS M ,  KOENEN WILLEM HERMAN GERTRUDA ,  VAN ZON ALEX ,  BROERS MICHAEL

IPC: G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70508 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To improve focus spot observation in a lithographic projection apparatus comprising a level sensor to measure the height of a wafer at a plurality of points.
SOLUTION: Height information is sent to a processor (8) which is arranged to create a measured height map (50) using input from the level sensor. The processor (8) uses the measured height map (50) to calculate an average die structure (40), subtracts the average die structure (40) from the measured height map (50) with respect to a die (52) on the wafer to create an unworked height map (56) on the surface of the wafer, and uses the unworked height map (56) to detect an arbitrary focus spot on the surface of the wafer.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2006179935A

公开(公告)日：2006-07-06

申请号：JP2005372999

申请日：2005-12-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE KRUIF ROBERTUS CORNELIS MAR ,  BRULS RICHARD J ,  CASTENMILLER THOMAS JOSEPHUS M ,  KLERK JOHANNES WILHELMUS DE ,  BUURMAN ERIK P

IPC: H01L21/027 ,  G03F7/20 ,  H01S3/00

CPC classification number: G03F7/70641 ,  G03F7/70558 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To solve the problem that the dependency on the critical dimension (CD) pitch of a lithographic pattern printing process is associated with the spectrum intensity distribution of radiation used for projecting a pattern and therefore changes from system to system, which is a cause of mismatching of iso-dense bias among systems. SOLUTION: The problem is solved by providing lithographic equipment which comprises a lighting system for supplying a projection beam of radiation, a projection system for projecting a patterned beam on a target position of a substrate, a substrate table for holding the substrate, and a controller for adjusting the spectrum distribution of radiation intensity of the projection beam. The adjustment of the spectrum intensity distribution is based on the data associated with iso-dense bias, and the spectrum intensity distribution is adjusted by widening the spectrum band width or by changing the shape of the spectrum intensity distribution. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了解决光刻图案印刷过程对关键尺寸（CD）间距的依赖性与用于投影图案的辐射的光谱强度分布相关联并因此从系统到系统的变化的问题 ，这是系统间等密度偏差不匹配的原因。 解决方案：通过提供光刻设备来解决问题，该光刻设备包括用于提供投射辐射束的照明系统，用于将图案化的光束投影到基板的目标位置的投影系统，用于保持基板的基板台， 以及用于调整投影光束的辐射强度的光谱分布的控制器。 光谱强度分布的调整是基于与等密度偏差相关的数据，通过扩大光谱带宽或改变光谱强度分布的形状来调整光谱强度分布。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2003224067A

公开(公告)日：2003-08-08

申请号：JP2003006738

申请日：2003-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEERENS GERT-JAN ,  DONDERS SJOERD NICOLAAS L ,  SPANJERS FRANCISCUS ANDREAS CO ,  VAN MEER ASCHWIN LODEWIJK HEND ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method and a device for cleaning a component of a lithographic apparatus in situ. SOLUTION: In a low-pressure environment, by applying a voltage between a tool tip in close proximity to a surface and that surface, contaminants on the surface are attracted and adhered to a tool. Also, a laser is used and each component of a lithographic projection apparatus is cleaned in situ. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2008199034A

公开(公告)日：2008-08-28

申请号：JP2008050997

申请日：2008-02-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JASPER JOHANNES CHRISTIAAN MAR ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  NIJMEIJER GERRIT JOHANNES ,  VAN ASTEN NICOLAAS ANTONIUS A ,  HEUTS FREDERIK THEODORUS E ,  GEMEN JACOBUS ,  DU CROO DE JONGH RICHARD JOHAN ,  BOONMAN MARCUS EMILE JOANNES ,  KLINKHAMER JACOB FREDRIK FRISO ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G01B9/02 ,  H01L21/027 ,  G01B11/00 ,  G01B11/02 ,  G01B11/245 ,  G01B11/25 ,  G01B11/30 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00

CPC classification number: G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To avoid the need to relate the origins of apparatuses which measure heights of substrates or masks on a plurality of stations in a lithographic projection apparatus having a plurality of substrate tables or mask tables. SOLUTION: A substrate W is mounted on a substrate table WT; then, vertical positions of a physical reference surface and vertical positions Z LS of the substrate surface are measured at a plurality of points on a measurement station (at the right of figure 8) using a level sensor 10; simultaneously, vertical positions Z IF of the substrate table are measured at the same points using a Z-interferometer Z IF ; and the substrate surface height, Z Wafer =Z LS +Z IF , is mapped. Then, the substrate table carrying the substrate is moved to an exposure station (to the left of figure 8) and vertical positions of the physical reference surface is again determined. Then, when the substrate is positioned at a right vertical position during the exposure process, the height map is referenced. This process can be applied to a mask. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了避免在具有多个基板台或掩模台的光刻投影设备中将测量基板或掩模高度的设备的起点与多个台站相关联的需要。 解决方案：将衬底W安装在衬底台WT上; 然后使用液位传感器10在测量站（图8右侧）的多个点测量基板表面的物理基准表面和垂直位置Z LS 的垂直位置; 同时，使用Z型干涉仪Z SB，在同一点测量衬底台的垂直位置Z IF ; 并且映射基板表面高度Z Wafer = Z LS + Z IF 。 然后，承载基板的基板台移动到曝光站（图8的左侧），再次确定物理基准面的垂直位置。 然后，当曝光处理期间基板位于右垂直位置时，参考高度图。 该过程可以应用于掩模。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008021997A

公开(公告)日：2008-01-31

申请号：JP2007177947

申请日：2007-07-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEUNINK ANDRE BERNARDUS ,  MARCEL KOENRAAD MARIE BAGGEN ,  BIJVOET DIRK-JAN ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which corrects an undesirable bend of a patterning device using an improved bending mechanism of the patterning device. SOLUTION: The lithography apparatus includes a support that is structured to support the patterning device. The patterning device can give a pattern to the section of an radiation beam to form a patterned radiation beam, and the support has a support clamp structured to clamp the patterning device onto the support. The lithography apparatus also includes the bending mechanism structured to add a bending torque to the clamped patterning device, and this bending mechanism has a force/torque actuator structured to cause a clamp force added to the patterning device by the support clamp to act on the clamped patterning device with virtually no reduction of the force. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种使用改进的图案形成装置的弯曲机构校正图案形成装置的不期望的弯曲的光刻装置。 解决方案：光刻设备包括构造成支撑图案形成装置的支撑件。 图案形成装置可以向辐射束的部分提供图案以形成图案化的辐射束，并且支撑件具有构造成将图案形成装置夹持到支撑件上的支撑夹。 光刻设备还包括弯曲机构，其被构造为向夹持的图案形成装置增加弯曲扭矩，并且该弯曲机构具有力/扭矩致动器，该力/力矩致动器被构造成使得由支撑夹具附加到图案形成装置的夹紧力作用在夹紧 图案形成装置几乎没有减小力。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007150288A

公开(公告)日：2007-06-14

申请号：JP2006298498

申请日：2006-11-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

Abstract: PROBLEM TO BE SOLVED: To provide an article support which allows every kind of deformation induced by a heat load or the like of an article supported by itself during a lithography process. SOLUTION: The article support which is constructed for supporting a reticle (a first article) or a wafer (a second article) includes several protrusions for support on each of which the article is set when in use and which is constructed in such a way as to demarcate a support region for providing a flat surface on which they support the article, to enable the expansion and contraction of at least a part of the article by the support region when the article is subjected to the heat load in this way and to reduce the accumulation of mechanical stress in the article and a position sensor which is constructed in such a way as to determine a displacement position offset in one direction of the article on a flat surface of its support region for a certain period. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制品支撑件，其允许在光刻工艺期间由其自身支撑的物品的热负载等引起的各种变形。 解决方案：构造用于支撑掩模版（第一制品）或晶片（第二制品）的物品支撑件包括用于在使用时在每个构件上设置制品的几个突起，并且其构造为 用于划定支撑区域以提供它们支撑制品的平坦表面的方式，以便在制品以这种方式承受热负荷时能够通过支撑区域使制品的至少一部分膨胀和收缩 并且减少制品中的机械应力累积和位置传感器，其以这样的方式构造，以便确定在其支撑区域的平坦表面上的物品的一个方向上的位移偏移一段时间。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：WO2006100076A3

公开(公告)日：2006-12-14

申请号：PCT/EP2006002677

申请日：2006-03-23

Applicant: ASML NETHERLANDS BV ,  BUURMAN ERIK PETRUS ,  CASTENMILLER THOMAS JOSEPHUS M ,  TEEUWSEN JOHANNES WILHELMUS MA ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA

Inventor： BUURMAN ERIK PETRUS ,  CASTENMILLER THOMAS JOSEPHUS M ,  TEEUWSEN JOHANNES WILHELMUS MA ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA

IPC: G03F7/20

CPC classification number: G03F7/70575 ,  G03F7/70641 ,  G03F9/7026

Abstract: A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of senso data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table (MT), the substrate table (WT) or optical elements of the projection optical system (PS). In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

Abstract translation: 一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或者提供感官数据的校正。 在第一方面中，波长变化数据被提供给通过移动包括例如掩模台（MT），衬底台（WT）或投影光学系统（PS）的光学元件的装置组件来控制焦点的控制系统， 。 在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。 这两个方面可以组合在单个装置中或者可以单独使用。

公开(公告)号：SG123601A1

公开(公告)日：2006-07-26

申请号：SG200401168

申请日：2004-03-08

Applicant: ASML NETHERLANDS BV

Inventor： RHEE VAN TASJA ,  CASTENMILLER THOMAS JOSEPHUS M ,  KOENEN WILLEM HERMAN GERTRUDA ,  ZON VAN ALEX ,  BROERS MICHAEL

IPC: G03F7/207 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.

公开(公告)号：DE60033775D1

公开(公告)日：2007-04-19

申请号：DE60033775

申请日：2000-12-20

Applicant: ASML NETHERLANDS BV

Inventor： CASTENMILLER THOMAS JOSEPHUS M ,  ARIENS ANDREAS BERNARDUS GERAR ,  HOEKS MARTINUS HENDRICUS HENDR ,  VOGELSANG PATRICK DAVID ,  LOOPSTRA ERIK ROELOF ,  KWAN YIM BUN PATRICK

IPC: G01B11/00 ,  G03F9/00 ,  G01B11/03 ,  G01B15/00 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027

Abstract: A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.

公开(公告)号：SG121753A1

公开(公告)日：2006-05-26

申请号：SG200300099

申请日：2003-01-15

Applicant: ASML NETHERLANDS BV

Inventor： HEERENS GERT-JAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  SPANJERS FRANCISCUS ANDREAS CO ,  MEER VAN ASCHWIN LODEWIJK HEND ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool.