公开(公告)号：SG112064A1

公开(公告)日：2005-06-29

申请号：SG200406895

申请日：2004-11-10

Applicant: ASML NETHERLANDS BV

Inventor： BARTRAY PETRUS RUTGERUS ,  BOX WILHELMUS JOSEPHUS ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus is provided comprising a substrate table WT for holding a substrate W, a projection system PL for projecting the patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion.