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    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009105469A

    公开(公告)日：2009-05-14

    申请号：JP2009033850

    申请日：2009-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which the generation of bubbles in immersion liquid is reduced. SOLUTION: The immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure has a buffer surface, and the buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, is normally full of the immersion liquid to achieve rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中，限制结构具有缓冲表面，并且当使用时，缓冲表面， 被定位在靠近基本上包括衬底的上表面的平面和保持衬底的衬底台上，以限定具有流动阻力的通道。 在缓冲表面设置有凹部，当使用时，凹部通常充满浸没液体，以在间隙在缓冲表面下移动时实现快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and method for manufacturing device
    3.
    发明专利
    Lithography equipment and method for manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHOD FOR MANUFACTURING DEVICE

    公开(公告)号：JP2006093709A

    公开(公告)日：2006-04-06

    申请号：JP2005275937

    申请日：2005-09-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment in which the generation of air bubbles in an immersion liquid is reduced. SOLUTION: Immersion lithography projection equipment has a liquid-confining structure configured so as to confine liquid at least partially in a space between a projection system and a substrate. The confining structure has a buffering plane which is arranged when in use, very close to the a plane substantially including the substrate and the top surface of a substrate table that holds the substrate, and defines a path having flow resistance. In this buffering plane, recesses are formed and normally filled with liquid when in use so that a gap is rapidly filled therewith when the gap between the substrate and the substrate table moves under the buffering plane. The recess may be formed into an annular or a radial shape so that a plurality of recesses can be arranged. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供浸没式光刻设备，其中浸没液体中的气泡的产生减少。 浸渍光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中。 约束结构具有缓冲平面，该平面在使用时非常接近于基本上包括基板的平面和保持基板的基板台的顶表面，并且限定具有流动阻力的路径。 在该缓冲面中，当使用时形成凹部，并且通常在液体中充满液体，使得当基板和基板台之间的间隙在缓冲平面下移动时，间隙迅速填充。 凹部可以形成为环形或径向形状，使得可以布置多个凹部。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012182498A

    公开(公告)日：2012-09-20

    申请号：JP2012135571

    申请日：2012-06-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which generation of bubbles in the immersion liquid is reduced.SOLUTION: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate. The confinement structure having a buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface. The recess, when in use, is normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 解决方案：浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间。 具有缓冲表面的约束结构在使用时位于基本上包括基板的上表面的平面和保持基板的基板台之间，以限定具有流动阻力的通道。 在缓冲表面设有凹槽。 当使用时，凹槽通常充满浸没液体，以便当间隙在缓冲表面下移动时，能够快速填充衬底和衬底台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2012，JPO＆INPIT

    Reticle stage calibration independent of reticle
    9.
    发明专利
    Reticle stage calibration independent of reticle 有权
    附件的独立阶段校准

    公开(公告)号：JP2005101615A

    公开(公告)日：2005-04-14

    申请号：JP2004276289

    申请日：2004-09-24

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： WEHRENS MARTIJN GERARD DOMINIQ ,  LUIJTEN CARLO CORNELIS MARIA

    IPC: G01B11/02 ,  G01B11/16 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/705 ,  G03F7/70516 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide a system, an apparatus, and a method for calibrating the reticle stage of a lithographic system.
    SOLUTION: The method comprises steps of; imaging a reticle through a lithographic system; measuring a set of height offsets based on the imaged reticle; and decomposing the set of measured height offsets in accordance with a plurality of distortional factors. The present invention further comprises steps of: determining the reticle stage deformation attributes based on the distortional factors and the reticle deformation attributes; and then calibrating the reticle stage based on the stage deformation attributes.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于校准光刻系统的标线片台的系统，装置和方法。 解决方案：该方法包括以下步骤： 通过光刻系统对掩模版进行成像; 基于成像的掩模版测量一组高度偏移; 以及根据多个失真因子分解所述一组测量的高度偏移。 本发明还包括以下步骤：基于失真因子和掩模版变形属性确定标线片台变形属性; 然后根据舞台变形属性校准标线台。 版权所有（C）2005，JPO＆NCIPI

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