公开(公告)号：JP2009016868A

公开(公告)日：2009-01-22

申请号：JP2008251029

申请日：2008-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BARTRAY PERTRUS R ,  BOX WILHELMUS J ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To overcome the problems associated with the supply of conventional reference frame materials, without encountering performance problems in return. SOLUTION: The lithographic apparatus includes: a substrate table WT for holding a substrate W; a projection system PL for projecting a patterned beam onto a target portion of the substrate W; and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了克服与传统参考框架材料的供应相关的问题，而不会遇到性能问题。 光刻设备包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及用于提供测量衬底W的参考表面的隔离参考框架MF，其中参考框架MF包括具有高热膨胀系数的材料。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012028797A

公开(公告)日：2012-02-09

申请号：JP2011199359

申请日：2011-09-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BARTRAY PERTRUS R ,  WILHELMUS JOSEPHUS BOX ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  TEN BHOMER MICHAEL ,  FERDI MICHELBRINK

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a material for a reference frame that can solve the problems associated with conventional technique while avoiding performance problems.SOLUTION: A lithographic apparatus includes a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an independent reference frame MF for providing a reference surface with which the position of the substrate W is measured. The reference frame MF is made of a material having a high coefficient of thermal expansion.

Abstract translation: 要解决的问题：提供可以解决与常规技术相关的问题的参考框架的材料，同时避免性能问题。 解决方案：光刻设备包括用于保持基板W的基板台WT，用于将图案化光束投影到基板W的目标部分的投影系统PL以及用于提供基准面的参考表面的独立参考框架MF 测量基板W的位置。 参考框架MF由具有高热膨胀系数的材料制成。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2005150732A

公开(公告)日：2005-06-09

申请号：JP2004328305

申请日：2004-11-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BARTRAY PERTRUS R ,  BOX WILHELMUS J ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/7095 ,  G02B7/028 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide reference frame materials which reduce production costs without encountering performance problems.
SOLUTION: A lithographic apparatus comprises a substrate table WT for holding a substrate W, a projection system PL for projecting a patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured. The reference frame MF comprises a material having a high coefficient of thermal expansion, and has a sandwich structure or a laminated structure when made of specified materials.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供降低生产成本而不遇到性能问题的参考框架材料。 解决方案：光刻设备包括用于保持基板W的基板台WT，用于将图案化光束投影到基板W的目标部分上的投影系统PL和用于提供参考表面的隔离参考框架MF 测量衬底W。 参考框架MF包括具有高热膨胀系数的材料，并且当由特定材料制成时具有夹层结构或层压结构。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：SG112064A1

公开(公告)日：2005-06-29

申请号：SG200406895

申请日：2004-11-10

Applicant: ASML NETHERLANDS BV

Inventor： BARTRAY PETRUS RUTGERUS ,  BOX WILHELMUS JOSEPHUS ,  KUIT JAN JAAP ,  LUIJTEN CARLO CORNELIS MARIA ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  TEN BHOMER MICHAEL ,  MIGCHELBRINK FERDY

IPC: H01L21/027 ,  G02B7/02 ,  G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus is provided comprising a substrate table WT for holding a substrate W, a projection system PL for projecting the patterned beam onto a target portion of the substrate W, and an isolated reference frame MF for providing a reference surface with respect to which the substrate W is measured, wherein the reference frame MF comprises a material having a high coefficient of thermal expansion.