中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

23 records (took 0.029 seconds)

    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009044172A

    公开(公告)日：2009-02-26

    申请号：JP2008257605

    申请日：2008-10-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KUIT JAN JAAP ,  BARTRAY PETRUS RUTGERUS ,  BIJVOET DIRK-JAN ,  HOOGKAMP JAN F

    IPC: H01L21/027 ,  G03B27/42 ,  G03F7/20 ,  H01L21/677 ,  H01L21/683

    CPC classification number: G03F7/70733 ,  G03F7/7075

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an improved transfer unit. SOLUTION: The lithographic apparatus includes a processing unit that performs a lithographic process including exchangeable objects. The processing unit includes an illumination system that provides a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation; a substrate holder configured to hold a substrate; and a projection system configured to project the patterned beam to a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有改进的转印单元的光刻设备。 光刻设备包括执行包括可交换对象的光刻处理的处理单元。 处理单元包括提供辐射束的照明系统; 支撑结构，其构造成支撑图案形成装置，所述图案形成装置将期望的图案赋予所述辐射束; 衬底保持器，其构造成保持衬底; 以及投影系统，被配置为将图案化的光束投影到基板的目标部分。 光刻设备还包括包括单个机器人的传送单元。 单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment and device-manufacture method
    2.
    发明专利
    Lithography equipment and device-manufacture method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006100832A

    公开(公告)日：2006-04-13

    申请号：JP2005282290

    申请日：2005-09-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KUIT JAN JAAP ,  BIJVOET DIRK J ,  HOOGKAMP JAN FREDERIK ,  SEGERS HUBERT M ,  VISSER RAIMOND ,  MAQUINE JOHANNES

    IPC: H01L21/027 ,  H01L21/677

    CPC classification number: G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment for reducing replacement time required for arranging another substrate on a substrate support.
    SOLUTION: The lithography equipment comprises a replaceable object handling device, capable of replacing a replaceable object using replaceable object station and support. The replaceable object is one substrate W. Pattern forming device and support are one of a substrate support WT and the pattern forming device support. The replaceable object handling device 1 comprises an intermediate holding device 3 for holding the replaceable object. The intermediate holding device 3 can act mutually with the support WT such that the substrate W is arranged on the support WT or the substrate W is taken out from the support WT. A robot 2 can replace the replaceable object, using the support WT, the intermediate holding device 3 and the replaceable object station.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供光刻设备，以减少在基板支撑件上布置另一基板所需的更换时间。 解决方案：光刻设备包括可更换的物体处理装置，能够使用可替换的对象站和支撑来替换可更换物体。 替换对象是一个基板W.图案形成装置和支撑件是基板支撑件WT和图案形成装置支撑件之一。 可替换物体处理装置1包括用于保持可更换物体的中间保持装置3。 中间保持装置3可以与支撑件WT相互作用，使得基板W布置在支撑件WT上，或者基板W从支撑件WT取出。 机器人2可以使用支撑件WT，中间保持装置3和可更换对象工位来代替可更换物体。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and device manufacturing method
    4.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2006128672A

    公开(公告)日：2006-05-18

    申请号：JP2005305274

    申请日：2005-10-20

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KUIT JAN JAAP ,  HOOGKAMP JAN FREDERIK ,  SEGERS HUBERT M ,  VISSER RAYMOND ,  MAQUINE JOHANNES

    IPC: H01L21/027 ,  B65G49/06 ,  B65G49/07 ,  G03F7/20 ,  H01L21/677

    CPC classification number: G03F7/70741

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including an improved pattering device handling apparatus which gives optimum conditions relative to an expense and a required space more favorable than those given by a conventional patterning device handling apparatus.
    SOLUTION: The present invention provides a lithographic apparatus including an illumination system for conditioning a radiation beam; a patterning device support for supporting a patterning device which can impart a pattern to the cross section of the radiation beam; a substrate table for holding a substrate; a projection system for projecting the patterned radiation beam to a target portion of the substrate; and a patterning device handling apparatus which comprises a single robot for exchanging the patterning device between the patterning device support and a loading station. The robot includes a first holding device for holding the patterning device in a first holding position and a second holding device for holding the patterning device in a second holding position. Such a robot allows the rapid and accurate exchange of the patterning device.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其包括改进的图案装置处理装置，其提供相对于常规图案形成装置处理装置给出的费用和所需空间的最佳条件。 解决方案：本发明提供一种包括用于调节辐射束的照明系统的光刻设备; 图案形成装置支撑件，用于支撑图案形成装置，所述图案形成装置可赋予所述辐射束的横截面图案; 用于保持衬底的衬底台; 投影系统，用于将图案化的辐射束投影到基板的目标部分; 以及图案形成装置处理装置，其包括用于在图案形成装置支撑件和装载工位之间更换图案形成装置的单个机器人。 机器人包括用于将图案形成装置保持在第一保持位置的第一保持装置和用于将图案形成装置保持在第二保持位置的第二保持装置。 这样的机器人能够快速且准确地交换图案形成装置。 版权所有（C）2006，JPO＆NCIPI

    End effector including integral illumination system for reticle prealignment sensor
    6.
    发明专利
    End effector including integral illumination system for reticle prealignment sensor 有权
    终端效应器，包括用于反馈预处理传感器的整体照明系统

    公开(公告)号：JP2007013166A

    公开(公告)日：2007-01-18

    申请号：JP2006178862

    申请日：2006-06-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KUIT JAN JAAP ,  VISSER RAYMOND ,  MAQUINE JOHANNES

    IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

    CPC classification number: G03F9/7088 ,  G03F9/7011

    Abstract: PROBLEM TO BE SOLVED: To provide an end effector including an integral illumination system for a prealignment sensor. SOLUTION: Equipment includes a first support structure constituted so that it may support an element having an alignment marker. The equipment includes a light source and at least one detector, wherein the light source is integrally formed on the first support structure, and is constituted so that it may provide a light beam which illuminates the alignment marker, and the detector is constituted so that it may detect a position of the alignment marker, by analyzing the light beam transmitting the element. Such equipment can be used to align the element to the first support structure. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供包括用于预对准传感器的整体照明系统的末端执行器。 解决方案：设备包括构造成使得其可以支撑具有对准标记的元件的第一支撑结构。 该设备包括光源和至少一个检测器，其中光源一体地形成在第一支撑结构上，并且被构造成使得其可以提供照射对准标记的光束，并且检测器被构造成使得 可以通过分析透射元件的光束来检测对准标记的位置。 这种设备可用于将元件对准第一支撑结构。 版权所有（C）2007，JPO＆INPIT

    Lithography apparatus and device-manufacturing method
    8.
    发明专利
    Lithography apparatus and device-manufacturing method 有权
    LITHOGRAPHY装置和装置制造方法

    公开(公告)号：JP2006100829A

    公开(公告)日：2006-04-13

    申请号：JP2005279999

    申请日：2005-09-27

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： HOOGKAMP JAN FREDERIK ,  KUIT JAN JAAP ,  VISSER RAIMOND

    IPC: H01L21/027 ,  B65G49/07 ,  G03F7/20 ,  H01L21/677

    CPC classification number: G03F7/70741 ,  H01L21/68707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of arranging and removing objects, such as a quickly and effectively patterning device and substrate. SOLUTION: The lithography apparatus is provided with a lighting system that adjusts radiation beams, support that gives patterns to the cross-section of radiation beams and supports patterning devices to form patterning radiation beams, substrate table that holds a substrate, projection system that projects patterning radiation beams on the targeted part of the substrate, and robot that is configured to transmit replaceable objects, to and from a support region. The robot is provided with an arm and end-effecter equipped with first and second carriers that are configured to transmit each replaceable object. The end-effecter is connected with the arm of the robot so that it can be rotated about the axis of rotation that extends substantially in parallel with the support region. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供能够布置和移除诸如快速有效地构图装置和基板的物体的光刻设备。 解决方案：光刻设备设置有调节辐射束的照明系统，支撑件，其形成辐射束横截面的图案并且支撑图案形成装置以形成图案化辐射束，保持衬底的衬底台，投影系统 这些工程将衬底的目标部分上的辐射束图案化，以及被配置为向支撑区域传送可替换物体的机器人。 机器人设置有臂和端部执行器，其配备有被配置为传送每个可替换对象的第一和第二托架。 端部执行器与机器人的臂连接，使得其可以围绕基本上平行于支撑区域延伸的旋转轴线旋转。 版权所有（C）2006，JPO＆NCIPI

    Lithographic apparatus and method of manufacturing device
    10.
    发明专利
    Lithographic apparatus and method of manufacturing device 审中-公开
    光刻设备及其制造方法

    公开(公告)号：JP2010153867A

    公开(公告)日：2010-07-08

    申请号：JP2009290308

    申请日：2009-12-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ONVLEE JOHANNES ,  KUIT JAN JAAP ,  KOS JOOST

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03B27/54 ,  G03F9/7065 ,  G03F9/7088

    Abstract: PROBLEM TO BE SOLVED: To alleviate the problem caused by the fact that a lighting source has to supply a beam having a large area for illuminating an alignment marker. SOLUTION: The lithographic apparatus includes a support section for supporting a patterning device for forming a radiation beam with a pattern, by giving a pattern to the section of the radiation beam and a substrate table for holding a substrate. The projection system projects the radiation beam with a pattern to the target part of the substrate. The patterning device includes one or a plurality of alignment patterns, and the lithographic apparatus includes a sub-lighting system for lighting each of the alignment patterns by another radiation using the radiation beam. The projection system projects an image of the respective alignment patterns to the substrate table. The substrate table includes one or a plurality of sensors for detecting the projected image of the alignment pattern. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：为了减轻由于照明源必须提供具有用于照射对准标记的大面积的光束的事实而引起的问题。 解决方案：光刻设备包括支撑部分，用于通过向辐射束的部分提供图案和用于保持基板的基板台支撑用于形成具有图案的辐射束的图案形成装置。 投影系统将辐射束以图案投射到基板的目标部分。 图案形成装置包括一个或多个对准图案，并且光刻设备包括用于通过使用辐射束的另一个辐射来照亮每个对准图案的子照明系统。 投影系统将各个对准图案的图像投影到基板台。 衬底台包括用于检测对准图案的投影图像的一个或多个传感器。 版权所有（C）2010，JPO＆INPIT

Patent Agency Ranking