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    11.
    发明专利
    未知

    公开(公告)号：DE19600154A1

    公开(公告)日：1997-07-10

    申请号：DE19600154

    申请日：1996-01-04

    Applicant: BASF AG

    Inventor： BLUM RAINER ,  BECK ERICH DR ,  KELLER PETER

    IPC: B05D7/24 ,  C08F220/18 ,  C09D4/06 ,  C09D5/00 ,  C09D5/02 ,  C09D5/03 ,  C09D133/00 ,  C09D133/06 ,  C09D135/00 ,  C09D125/00 ,  B05D3/06 ,  C08F220/10 ,  C08F232/00 ,  C08J3/02 ,  C08J3/24 ,  C08J3/28

    Abstract: The invention concerns radiation-hardenable coatings processed from melt, solution or dispersion and containing as binders copolymers comprising the following: a) at least one monomer of either the general formula (I) CH2 = C(R )-CO-OR , in which R stands for H, CH3 or C2H5 and R stands for H, CnH2n+1, n being 1-30, an alicyclic, araliphatic or heterocyclic group, a hydroxyalkyl-, alkoxyalkyl-, glycidyl- or aminoalkyl group, or of the general formula (II) CH2 = C(R )-CO-NR R , in which R stands for H or CH3, R and R can be identical or different and stand for H, CH2OH, CnH2n+1, n being 1-30, or CH2OR , R standing for CmH2m+1 and m being 1-12; and b) at least one copolymerisable ethylenically unsaturated organic compound of general formula (A), in which R' and R'' can be identical or different and stand for H or CpH2p+1, p being 1-6, cycloalkyl, aryl or aralkyl, and R''' stands for an acryloyl, methacryloyl, ethacryloyl or cinnamyloyl group and this compound can be partially replaced by one or more other copolymerisable ethylenically unsaturated organic compounds different from (a) and (b).

    13.
    发明专利
    未知

    公开(公告)号：DE59204026D1

    公开(公告)日：1995-11-23

    申请号：DE59204026

    申请日：1992-03-09

    Applicant: BASF AG

    Inventor： JAEGER ULRICH DR ,  BECK ERICH DR ,  KARCHER MICHAEL DR

    IPC: C08F299/06 ,  C08G18/67 ,  C08G18/79 ,  C09D175/16

    Abstract: Polyurethane vinyl ethers are obtainable by reacting A) 1 NCO equivalent of one or more isocyanurate-containing polyisocyanates with B) 0.01-1.0 OH equivalent of one or more monohydroxyvinyl ethers and C) 0-0.99 equivalent of functional groups of further compounds, which groups are reactive with OCN.

    New sulphonium salts with olefinic gps. - useful as photoinitiators for cationic polymerisation and for prodn. of photoresists
    16.
    发明专利
    New sulphonium salts with olefinic gps. - useful as photoinitiators for cationic polymerisation and for prodn. of photoresists 未知

    公开(公告)号：DE4305332A1

    公开(公告)日：1993-09-09

    申请号：DE4305332

    申请日：1993-02-20

    Applicant: BASF AG

    Inventor： JAEGER ULRICH DR ,  BECK ERICH DR ,  NUYKEN OSKAR PROF DR ,  VOGEL RAINER

    IPC: C07C381/12 ,  C08F2/50 ,  C08G59/68 ,  C08G65/10

    Abstract: Sulphonium salts of formula (I), (II) or (III), or polymeric sulphonic salts contg. repeat gps. of formula (IV) are new; where R1 = H or 1-4C alkyl; R2, R3 = monovalent 5-8C aromatic ring system, opt. contg. heteroatoms and opt. substd. with 5-15C aryl or aryloxy, 1-10C alkyl or alkoxy, halo, OH, or amino gps. or with OH or amino gp.-contg. 5-15C aryl or aryloxy or 1-10C alkyl or alkoxy gps.; R4 = as for R2/R3, or also 1-20C alkyl or alkaryl; R5, R6 = bivalent gps. corresp. to R2 and R3; X = counter-ion. Producing these salts, comprises reacting aromatic mono- or di-thiols with aromatic mono- or di-ethynyl cpds. and converting the resulting sulphides into salts with an alkylating or arylating agent. Pref., R1 = H, R2 and R3 -= phenylene, opt. substd. with one or two 1-6C alkyl gps., R5 and R6 = as for R2 and R3, R4 = Ph (opt. substd. as above) or 1-8C alkyl or 7-15C alkaryl; X = e.g. BF4, FeCl4, PF6, CF3SO3 etc.. Pref. arylating agent (stage 2) is e.g. Ph2IBF4. Amt. of salt is 0.2-5 wt.% w.r.t. polymerisable cpds.. USE/ADVANTAGE - Used as photoinitaotors for cationic polymerisation (claimed). Also claimed are copolymerisable sulhonium salts obtd. by reactin of the above salts (in which at least one of the gsp. R2-R6 contains an amino or OH gp.) with cpds. contg. copolymersable ethylenic gps.. Also claimed are radiation-curable materials contg. the claimed salts. The claimed cpds. overcome the disadvantages of prior-art sulphonium salt photoinitiators (yellowing of polymer film, loss of activity due to the absorbance of decompsn. prods. in the 240-250 nm range); applications include cationic polymerisation of vinyl ethers or epoxides with the aid of UV or electron beam radiation, and the prodn. of photoresists and structured polymer layers.

    17.
    发明专利
    未知

    公开(公告)号：DE3806270A1

    公开(公告)日：1989-09-07

    申请号：DE3806270

    申请日：1988-02-27

    Applicant: BASF AG

    Inventor： RAABE ELEONORE DR ,  BECK ERICH DR

    IPC: G03F7/004 ,  G03F7/00 ,  G03F7/027 ,  G03F7/031

    Abstract: The invention relates to a light-sensitive recording material for producing intaglio printing plates and to a process for producing intaglio printing formes. … The photopolymerisable and/or photocrosslinkable material, which is soluble or dispersible in a developer fluid and becomes insoluble or no longer dispersible in this developer fluid by exposure to actinic light, contains, at least in a surface zone of the surface of the layer which later forms the surface of the printing forme, finely disperse abrasive particles, the mean particle size of the abrasive particles being in the range from 0.1 to 6 mu m, the abrasive particles having a hardness of >4.0 on the Mohs hardness scale, the surface of the layer which later forms the surface of the printing forme having a peak-to-valley height of

    19.
    发明专利
    未知

    公开(公告)号：AT198590T

    公开(公告)日：2001-01-15

    申请号：AT96110449

    申请日：1996-06-28

    Applicant: BASF AG

    Inventor： REICH WOLFGANG DR ,  BECK ERICH DR ,  JAEGER ULRICH DR ,  SCHWALM REINHOLD DR

    IPC: C07C68/02 ,  C07C69/96 ,  C08F2/48 ,  C08F2/50 ,  C08F20/26 ,  C08F20/28

    Abstract: Radiation-curable (meth)acrylates (I) are claimed, which are obtd. by reacting: (i) acylphenyl chloroformates of formula (II) with: (ii) hydroxy (meth)acrylates (III) contg. free hydroxy gp(s). and (meth)acryl gps. in the molecule: R-C(=O)-R (II) R = 1-4 C alkyl, aryl or R ; R = a substd. phenyl gp. of formula (IV); R - R = H, 1-4 C alkyl, 1-4 C alkoxy, OH, phenyl, SH, SCH3, SC2H5, F, Cl, Br, CN, COOH, COO-(1-17 C alkyl), COO-(5-10 C aryl), CF3, N(alkyl)2, N(alkyl)(aryl), N(aryl)2, N , or N H(alkyl)2A ; A = an anion; alkyl, aryl = 1-10 C alkyl and 5-10 C aryl, unless otherwise indicated; and 1-3 R - R gps. = -O-C(=O)-Cl. Also claimed are: (a) a process for the prodn. of radiation curable (meth)acrylate; and (b) use of radiation curable (meth)acrylate in radiation curable compsns..

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