Radiation-cured polyurethane-acrylate]-based contact adhesive - contg. vinyl monomer and reaction prod. of di:isocyanate, poly:ol, diol. unsatd. hydroxy cpd. and cyclic ether with hydroxy or amino gp.

    公开(公告)号:DE3915981A1

    公开(公告)日:1990-11-29

    申请号:DE3915981

    申请日:1989-05-17

    Applicant: BASF AG

    Abstract: Radiation-curable contact adhesives (I) contain (A) 10-98 wt. % oligomeric or polymeric reaction prod. with mol. wt. 500-100,000 and (B) 2-99 wt. % mono-vinyl cpd. (A) is the reaction prod. of (a) di-isocyanate, (b) 20-99 equiv. % polyester-polyol and/or polyether-polyol (c) 0-79 equiv. % 2-50C diol, (d) an OH gp. which is not directly linked with (II) and (e) a cpd. with an OH or amino gp. namely up to 20C acetal or ketal and/or a cycloaliphatic ether with a 3- or 10-membered ring, amt. of (d+e) is 1-50 equiv. % w.r.t. NCO gps. in (a), equiv. ratio (d):(e) = (10:90)-(90:10), and NCO gps. in (a) are equiv. to the sum of the OH and amino gps. in (b), (c), (d) and (e). Amts. are 40-70 wt. % (A) and 30-60 wt. % (B) and (A) has mol. wt. 1000-40,000 and is derived from (a) 50-98 equiv. % (b) 0-40 equiv. % (c) and 2-40 equiv. % (d+e) (wtih equiv. ratio (d):(e) = (15:85)-(30:70)), (d) is hydroxy(1-20C alkyl)-(meth)acryalte or -(meth)acrylamide, pref. a versatic acid mono-ester (III) of 2,3-dihydroxypropyl 1-(meth)acrylate and/or 1,3-dihydroxypropyl 2-(meth)acrylate, (e) is an up to 20C acetal or ketal with an OH amino gp. or a 3-10membered cycloaliphatic ether with an OH or amino gp. (B) is a vinyl monomer which gives a homopolymer with Tg below 20 deg.C pref. a reaction prod. of the above versatic acid mono-esters with an equimol. amt. of a satd. or mono-unsatd. 4-5C cyclic dicarboxylic anhydride. USE/ADVANTAGE - (I) are useful for the prodn. of labels, adhesives strips, decorative film, etc. These adhesives have a balanced combination of surface tackiness, peel strength and cohesion.

    3.
    发明专利
    未知

    公开(公告)号:DE59204026D1

    公开(公告)日:1995-11-23

    申请号:DE59204026

    申请日:1992-03-09

    Applicant: BASF AG

    Abstract: Polyurethane vinyl ethers are obtainable by reacting A) 1 NCO equivalent of one or more isocyanurate-containing polyisocyanates with B) 0.01-1.0 OH equivalent of one or more monohydroxyvinyl ethers and C) 0-0.99 equivalent of functional groups of further compounds, which groups are reactive with OCN.

    5.
    发明专利
    未知

    公开(公告)号:DE4337481A1

    公开(公告)日:1995-05-04

    申请号:DE4337481

    申请日:1993-11-03

    Applicant: BASF AG

    Abstract: Free-radical-crosslinkable copolymers having a number average molecular weight of from 1500 to 6000 and a molecular weight distribution corresponding to a polydispersity of from 1 to 4.0, obtainable by polymer-analogous reaction of A) a copolymer (A) comprising a1) from 50 to 85 mol % of a monomer (a1) containing the methacrylic acid structural unit and a2) from 15 to 50 mol % of another free-radical-polymerising monomer (a2), where a3) from 5 to 50 mol % of the total amount of the monomers (a1) and (a2) are monomers (a3) carrying functional groups which are capable of a condensation or addition reaction, obtainable by a free-radical bulk or solution polymerisation at from 140 to 210 DEG C and a mean residence time of from 2 to 90 min, with B) an olefinically unsaturated monomer (B) carrying a functional group which is complementary to that of the monomers (a3). The free-radical-crosslinkable copolymers are used as binders for powder coatings (paints).

    New sulphonium salts with olefinic gps. - useful as photoinitiators for cationic polymerisation and for prodn. of photoresists

    公开(公告)号:DE4305332A1

    公开(公告)日:1993-09-09

    申请号:DE4305332

    申请日:1993-02-20

    Applicant: BASF AG

    Abstract: Sulphonium salts of formula (I), (II) or (III), or polymeric sulphonic salts contg. repeat gps. of formula (IV) are new; where R1 = H or 1-4C alkyl; R2, R3 = monovalent 5-8C aromatic ring system, opt. contg. heteroatoms and opt. substd. with 5-15C aryl or aryloxy, 1-10C alkyl or alkoxy, halo, OH, or amino gps. or with OH or amino gp.-contg. 5-15C aryl or aryloxy or 1-10C alkyl or alkoxy gps.; R4 = as for R2/R3, or also 1-20C alkyl or alkaryl; R5, R6 = bivalent gps. corresp. to R2 and R3; X = counter-ion. Producing these salts, comprises reacting aromatic mono- or di-thiols with aromatic mono- or di-ethynyl cpds. and converting the resulting sulphides into salts with an alkylating or arylating agent. Pref., R1 = H, R2 and R3 -= phenylene, opt. substd. with one or two 1-6C alkyl gps., R5 and R6 = as for R2 and R3, R4 = Ph (opt. substd. as above) or 1-8C alkyl or 7-15C alkaryl; X = e.g. BF4, FeCl4, PF6, CF3SO3 etc.. Pref. arylating agent (stage 2) is e.g. Ph2IBF4. Amt. of salt is 0.2-5 wt.% w.r.t. polymerisable cpds.. USE/ADVANTAGE - Used as photoinitaotors for cationic polymerisation (claimed). Also claimed are copolymerisable sulhonium salts obtd. by reactin of the above salts (in which at least one of the gsp. R2-R6 contains an amino or OH gp.) with cpds. contg. copolymersable ethylenic gps.. Also claimed are radiation-curable materials contg. the claimed salts. The claimed cpds. overcome the disadvantages of prior-art sulphonium salt photoinitiators (yellowing of polymer film, loss of activity due to the absorbance of decompsn. prods. in the 240-250 nm range); applications include cationic polymerisation of vinyl ethers or epoxides with the aid of UV or electron beam radiation, and the prodn. of photoresists and structured polymer layers.

Patent Agency Ranking