公开(公告)号：FI901417A0

公开(公告)日：1990-03-21

申请号：FI901417

申请日：1990-03-21

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG ,  ROTHENHAEUSLER BENNO

IPC: G01B11/06 ,  G01B11/30 ,  G01N21/552 ,  G01N21/88 ,  G01B

Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.

公开(公告)号：FI98660B

公开(公告)日：1997-04-15

申请号：FI901418

申请日：1990-03-21

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG

IPC: G01B11/06 ,  G01N21/41

Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.

公开(公告)号：AU619085B2

公开(公告)日：1992-01-16

申请号：AU5059390

申请日：1990-03-01

Applicant: BASF AG

Inventor： FUNHOFF DIRK ,  FUCHS HARALD ,  LICHT ULRIKE ,  SCHREPP WOLFGANG ,  HICKEL WERNER ,  KNOLL WOLFGANG ,  WEGNER GERHARD ,  DUDA GISELA

IPC: G11B7/00 ,  G11B7/005 ,  G11B7/24 ,  G11B7/244 ,  G11B7/245 ,  G11B11/00 ,  G11B9/10 ,  G11B9/00

Abstract: The invention relates to a method for reproducing information which is recorded in thin polymer films, information in thin polymer films which have been applied to a metal or semiconductor layer, by means of electromagnetic or particle beams which induce a permanent change in the properties of the polymer films in the irradiated areas, being reproduced by surface plasmons. … …

公开(公告)号：FI901418A0

公开(公告)日：1990-03-21

申请号：FI901418

申请日：1990-03-21

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG

IPC: G01B11/06 ,  G01N21/41 ,  G01B

Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.

公开(公告)号：AU622992B2

公开(公告)日：1992-04-30

申请号：AU5147590

申请日：1990-03-20

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG

IPC: G01B11/06 ,  G01N21/41 ,  G01B9/04

Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.

公开(公告)号：FI910568A

公开(公告)日：1991-08-11

申请号：FI910568

申请日：1991-02-06

Applicant: BASF AG

Inventor： KNOLL WOLFGANG ,  KNOBLOCH HARALD

IPC: G01N21/21 ,  G01N21/552 ,  G01N21/65 ,  G01N21/84 ,  G01N

Abstract: Investigation of the physical properties of thin films is carried out by directing polarised light onto a film system in which surface plasmons (PSP) are excited for generating, in the film or film system, Raman-scattered light which is imaged on a detector.

公开(公告)号：AU5459790A

公开(公告)日：1990-11-08

申请号：AU5459790

申请日：1990-05-02

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG

IPC: G01N21/21 ,  G01N21/00 ,  G01N21/55 ,  G01N21/552 ,  G01N21/59 ,  G01N21/84

Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.

公开(公告)号：AU5391090A

公开(公告)日：1990-11-01

申请号：AU5391090

申请日：1990-04-27

Applicant: BASF AG

Inventor： HICKEL WERNER ,  KNOLL WOLFGANG

IPC: G02B6/12 ,  G02B5/26 ,  G02B5/30 ,  G02F1/19 ,  G02B5/20

Abstract: The invention relates to a method for optical filtering of polarised light, the polarised light to be filtered impinging on a layer system in which surface plasmons or optical waveguide modes are excited.