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公开(公告)号：FI98660C
公开(公告)日：1997-07-25
申请号：FI901418
申请日：1990-03-21
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
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公开(公告)号：AU622530B2
公开(公告)日：1992-04-09
申请号：AU5147790
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG , ROTHENHAEUSLER BENNO
Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.
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公开(公告)号：AU5147590A
公开(公告)日：1990-09-27
申请号：AU5147590
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.
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公开(公告)号：FI902197A0
公开(公告)日：1990-05-02
申请号：FI902197
申请日：1990-05-02
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.
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公开(公告)号：FI901417A0
公开(公告)日：1990-03-21
申请号：FI901417
申请日：1990-03-21
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG , ROTHENHAEUSLER BENNO
IPC: G01B11/06 , G01B11/30 , G01N21/552 , G01N21/88 , G01B
Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.
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Patent Agency Ranking
公开(公告)号：AU622992B2
公开(公告)日：1992-04-30
申请号：AU5147590
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
Abstract: The invention relates to a method for determining the refractive index and layer thickness of ultrathin layers. In order to determine the refractive index and/or thickness of layers having layer thicknesses 1 mu m, layers which are applied to a solid substrate are recorded by means of surface/plasmon microscopy as a function of the angle of incidence of the irradiating laser beam. It is possible in this way to determine layer thicknesses with a vertical resolution >/= 0.1 nm in conjunction with simultaneous lateral resolution >/= 5 mu m.
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公开(公告)号：AU5459790A
公开(公告)日：1990-11-08
申请号：AU5459790
申请日：1990-05-02
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
Abstract: The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.
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公开(公告)号：AU5391090A
公开(公告)日：1990-11-01
申请号：AU5391090
申请日：1990-04-27
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG
Abstract: The invention relates to a method for optical filtering of polarised light, the polarised light to be filtered impinging on a layer system in which surface plasmons or optical waveguide modes are excited.
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公开(公告)号：AU5147790A
公开(公告)日：1990-09-27
申请号：AU5147790
申请日：1990-03-20
Applicant: BASF AG
Inventor： HICKEL WERNER , KNOLL WOLFGANG , ROTHENHAEUSLER BENNO
Abstract: The invention relates to a method for examination of surface structures which differ with respect to refractive index and/or height modulation of the surface, these surface structures being brought into a surface/plasmon field and scanned by means of surface/plasmon microscopy.
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公开(公告)号：AU5059390A
公开(公告)日：1990-09-06
申请号：AU5059390
申请日：1990-03-01
Applicant: BASF AG
Inventor： FUNHOFF DIRK , FUCHS HARALD , LICHT ULRIKE , SCHREPP WOLFGANG , HICKEL WERNER , KNOLL WOLFGANG , WEGNER GERHARD , DUDA GISELA
Abstract: The invention relates to a method for reproducing information which is recorded in thin polymer films, information in thin polymer films which have been applied to a metal or semiconductor layer, by means of electromagnetic or particle beams which induce a permanent change in the properties of the polymer films in the irradiated areas, being reproduced by surface plasmons. … …
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