POSITIVE PHOTORESIST LAYER AND MEANS FOR TRANSFER

    公开(公告)号:DE3064381D1

    公开(公告)日:1983-09-01

    申请号:DE3064381

    申请日:1980-05-08

    Applicant: BASF AG

    Abstract: A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.

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