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公开(公告)号:DE3064381D1
公开(公告)日:1983-09-01
申请号:DE3064381
申请日:1980-05-08
Applicant: BASF AG
Inventor: SAENGER DIETRICH DR , BARZYNSKI HELMUT DR
Abstract: A positive working photosensitive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.
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12.
公开(公告)号:DE2209254A1
公开(公告)日:1973-09-06
申请号:DE2209254
申请日:1972-02-26
Applicant: BASF AG
Inventor: SAENGER DIETRICH DR , BARZYNSKI HELMUT DR
Abstract: The thermoplastics contain, as light sensitiser, 0.01-5wt.% 2,4-dinitro-6-bromo-21-acetylamino-41-(beta-hydroxyethyl beta-cyanethyl)-amino 51-methoxy azobenzene. Suitable thermoplastics are olefin, styrene and vinyl chloride polymers, polylactams, polyurethanes, polyesters and polyamides. The sensitiser causes rapid breakdown of the plastics e.g., in the form of disposable containers, packaging films, mulching film, etc., and is itself physiologically acceptable.
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公开(公告)号:DE2209144A1
公开(公告)日:1973-08-30
申请号:DE2209144
申请日:1972-02-26
Applicant: BASF AG
Inventor: SAENGER DIETRICH DR , BARZYNSKI HELMUT DR
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公开(公告)号:DE2209138A1
公开(公告)日:1973-08-30
申请号:DE2209138
申请日:1972-02-26
Applicant: BASF AG
Inventor: SAENGER DIETRICH DR , BARZYNSKI HELMUT DR
IPC: C08K5/1545 , C08F45/58
Abstract: Light-degradation of thermoplastic, synthetic, org. high polymer moulding batches, used as opt. foamed packaging materials, mulch foils for gardening and agriculture, is promoted by incorporating 0.01 - 5 (0.1 - 2) wt.% of di-Na salt of 3',4',5',6'-tetrachloro-2,4,5,7-tetraiodo-fluorescein (I), as sensitiser. (I) are non-toxic and promote quicker rotting. Thermoplasts include polyaddn. and polycondensation polymers (e.g. polyethylene, polypropylene, and impact resistant polystyrene) opt. contg. usual additives.
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公开(公告)号:DE4222834A1
公开(公告)日:1993-01-21
申请号:DE4222834
申请日:1992-07-11
Applicant: BASF AG
Inventor: MCKEE GRAHAM EDMUND DR , GOERRISSEN HEINER DR , SAENGER DIETRICH DR , PREUSS HANS-J , WEIGELT FRANZ WERNER DR
Abstract: Compsns. (I) contain (A) 1-99.9% (all pts. wt.) polyoxymethylene homo (II) or copolymer (III), (B) 0.1-99% mixt. contg. (B12) 10-99% (II) or (III) and (B2) 0.1-90% oligomeric or polymeric stabiliser with amide or amino gps., (C) 0-60% impact toughness-modified rubber, (D) 0-50% fibrous and/or particulate filler, and (E) 0-30% conventional additives and processing auxiliaries. Pref. (B2) is polyamide with no. average mol. wt. at least 2000. USE/ADVANTAGE - Balanced range of properties, esp. heat stability, stiffness, toughness, surface characteristics, e.g. printing, adhesive bonding, writing and electroplating, also water uptake, are light coloured, and show min. surface defects, e.g. streaking
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公开(公告)号:DE3628562A1
公开(公告)日:1988-03-03
申请号:DE3628562
申请日:1986-08-22
Applicant: BASF AG
Inventor: GOERRISSEN HEINER DR , SAENGER DIETRICH DR , SCHUETTE WILHELM DR , WALTER MANFRED DR
Abstract: The invention relates to moulding compositions comprising (A) at least one polyoxymethylene homopolymer and/or copolymer, (B) at least one thermoplastic polyurethane elastomer and (C) optionally additives, which contain, in order to improve the heat resistance, reduce the tendency toward discoloration and minimise the free formaldehyde content, (D) at least one alkaline earth metal carbonate, alkaline earth metal hydroxide carbonate, alkaline earth metal glycerophosphate or a mixture of at least two of the said compounds, expediently in an amount of from 0.005 to 2% by weight, based on the weight of the components (A) and (B), as additive. In order to prepare the moulding compositions, components (A), (B), (D) and, if used, (C) are advantageously melted together in an extruder at temperatures of from 150 to 260 DEG C. The moulding compositions are suitable for the production of films or mouldings used, for example, in the automotive, electrical appliance and electronics industries.
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公开(公告)号:DE3231147A1
公开(公告)日:1984-02-23
申请号:DE3231147
申请日:1982-08-21
Applicant: BASF AG
Inventor: LEYRER REINHOLD J DR , SAENGER DIETRICH DR
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公开(公告)号:DE2232362A1
公开(公告)日:1974-03-07
申请号:DE2232362
申请日:1972-07-01
Applicant: BASF AG
Inventor: HICKMANN ECKHARD DR , SAENGER DIETRICH DR
IPC: C08K5/00 , C08K5/06 , C08K5/1525 , C08K5/156 , C08L1/00 , C08L23/00 , C08L27/00 , C08L101/00 , C08F29/00
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公开(公告)号:DE2209142A1
公开(公告)日:1973-08-30
申请号:DE2209142
申请日:1972-02-26
Applicant: BASF AG
Inventor: SAENGER DIETRICH DR , BARZYNSKI HELMUT DR
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公开(公告)号:DE2150691A1
公开(公告)日:1973-04-19
申请号:DE2150691
申请日:1971-10-12
Applicant: BASF AG
Inventor: BARZYNSKI HELMUT DR , JUN MONG-JON DR , SAENGER DIETRICH DR , VOLKERT OTTO DR
IPC: C09K3/00 , C08F8/00 , C08F8/14 , C08F8/30 , C08F20/00 , C08F20/34 , C08F26/06 , G03C1/72 , G03F7/038 , G03F7/039 , H01L21/027
Abstract: Photosensitive coating materials comprising polymers containing o-nitrocarbinol ester groups, particularly of polymers and copolymers of o-nitrocarbinol esters of ethylenically unsaturated carboxylic acids, which as a result of exposure become soluble in an alkaline solvent used as developer in which they were not soluble prior to exposure. Such materials are used in particular for coating lithographic printing plates and as photoresists.
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