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公开(公告)号:AT343724T
公开(公告)日:2006-11-15
申请号:AT00943235
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:DE60018425T2
公开(公告)日:2006-04-06
申请号:DE60018425
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , SCHERER AXEL , QUAKE STEPHEN R , CHOU HOU-PU , THORSEN TODD A
IPC: F04B43/04 , G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:AU2866402A
公开(公告)日:2002-06-11
申请号:AU2866402
申请日:2001-11-28
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R , LIU JIAN , ADAMS MARK L , HANSEN CARL L
IPC: B01L3/00 , B01L7/00 , B01L9/00 , B67D99/00 , B81B1/00 , B81B3/00 , B81C1/00 , C12Q1/68 , F04B43/04 , F15C5/00 , F16K7/00 , F16K31/126 , F16K99/00 , A61F2/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:NO20016268A
公开(公告)日:2002-02-27
申请号:NO20016268
申请日:2001-12-20
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K
CPC classification number: B29C51/00 , B01L3/502707 , B01L3/50273 , B01L3/502738 , B01L2300/0861 , B01L2300/0887 , B01L2300/123 , B01L2400/046 , B01L2400/0481 , B01L2400/0655 , B33Y80/00 , B81B5/00 , B81B2201/036 , B81B2201/054 , B81C1/00119 , B81C2201/019 , B81C2201/034 , C12Q1/6874 , F04B43/043 , F15C1/06 , F15C5/00 , F16K11/20 , F16K13/00 , F16K31/126 , F16K99/0001 , F16K99/0015 , F16K99/0046 , F16K99/0048 , F16K99/0051 , F16K99/0059 , F16K2099/0074 , F16K2099/0076 , F16K2099/0078 , F16K2099/008 , F16K2099/0094 , Y10T137/0491 , Y10T137/0497 , Y10T137/2224 , Y10T137/87249 , Y10T156/10 , Y10T428/24479 , Y10T428/24744 , C12Q2535/125
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公开(公告)号:GB2352283A
公开(公告)日:2001-01-24
申请号:GB0015726
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K7/14 , F04B43/14 , G02B26/08
Abstract: A microfabricated structure is formed by layers 20,22 of elastomeric material having recesses or channels 23 formed in them either by moulding the layers with the recesses/channels in their surface or by incorporating a portion of photoresist material between the layers which is then removed. Between overlying layers in the region of the channels/recesses a thin membrane is formed which can be actuated so as to enter one of the channel/recess and so restrict or prevent flow in that channel/recess. A series of channels/recesses may be formed and the membranes actuated in sequence so as to provide a pumping action. The membranes may be actuated by fluid pressure in one of the channel/recess or by electrostatic or magnetic forces. The membranes may reflect light and a series of them may be provided to form a micro-mirror array. The elastomeric material may be capable of transmitting incident light enabling the invention to be applied to a refracting structure. The dimensions of the channels/recesses and the thickness of the membranes is in the micro-metre range.
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公开(公告)号:CA2721172A1
公开(公告)日:2001-01-04
申请号:CA2721172
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: B81B3/00 , G03F7/20 , B01L3/00 , B81B1/00 , B81B7/00 , B81B7/02 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C1/06 , F15C1/22 , F15C3/04 , F15C3/16 , F15C5/00 , F16K7/00 , F16K7/07 , F16K7/17 , F16K7/20 , F16K17/02 , F16K99/00 , H01H59/00
Abstract: A microfabricated elastomeric structure comprises an elastomeric block formed with microfabricated recesses having a width less than 1000 µm therein. A portion of the elastomeric block is deflectable into one of the recesses when the portion is actuated.
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公开(公告)号:AU779988B2
公开(公告)日:2005-02-24
申请号:AU5773400
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K17/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:BR0011982A
公开(公告)日:2002-09-17
申请号:BR0011982
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHUO HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K17/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:NO20016268L
公开(公告)日:2002-02-27
申请号:NO20016268
申请日:2001-12-20
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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公开(公告)号:AU5773400A
公开(公告)日:2001-01-31
申请号:AU5773400
申请日:2000-06-27
Applicant: CALIFORNIA INST OF TECHN
Inventor: UNGER MARC A , CHOU HOU-PU , THORSEN TODD A , SCHERER AXEL , QUAKE STEPHEN R
IPC: G03F7/20 , B01L3/00 , B81B1/00 , B81B3/00 , B81B7/00 , B81C1/00 , B81C99/00 , C12Q1/68 , F04B17/00 , F04B35/04 , F04B43/04 , F15C5/00 , F16K7/00 , F16K17/02 , F16K99/00 , F16K17/00
Abstract: A method of fabricating an elastomeric structure, comprising: forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer, bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
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