Abstract:
Portions (40 and 44) of a structure, such as a flat-panel display, are positioned such that a sealing area (40S) of one portion is at least partially separated from a corresponding sealing area (44S) of another portion such that a gap (48) at least partially separates the two sealing areas, typically by height of 25 microns or more. Energy is applied in a "gap jumping technique" to locally heat material of at least one portion along the sealing area such that the material bridges the gap and seals the portions (40 and 44) together. A laser is typically employed to locally melt and draw the material into the gap by a combination of factors such as surface tension and capillary action. A first part of the gap jumping technique may be performed in a non-vacuum environment to tack the portions together, but the gap jumping technique is typically completed in a vacuum to form an evacuated panel.
Abstract:
A flat panel display (300) having a faceplate structure (320), a backplate structure (330), a focusing structure (333a), and a plurality of spacers (340). The backplate structure includes an electron emitting structure (332) which faces the faceplate structure. The focusing structure has a first surface which is located on the electron emitting structure, and a second surface which extends away from the electron emitting structure. The electrical end of the combination of the focusing structure and the electron emitting structure is located at an imaginary plane located intermediate the first and second surfaces of the focusing structure. The spacers are located between the focusing structure and the light emitting structure. Each spacer is located within a corresponding groove in the focusing structure such that the electrical end of each spacer is located coincident with the electrical end of the combination of the focusing structure and the electron emitting structure.
Abstract:
A gated electron-emitter is fabricated by a process in which particles (26) are deposited over an insulating layer (24). Gate material is provided over the insulating layer in the space between the particles after which the particles and any overlying material are removed. The remaining gate material forms a gate layer (28A or 48A) through which gate openings (30 or 50) extend at the locations of the removed particles. When the gate material deposition is performed so that part of the gate material extends into the spaces below the particles, the gate openings are beveled. The insulating layer is etched through the gate openings to form dielectric openings (32 or 52). Electron-emissive elements (36A or 56A) are formed in the dielectric openings. This typically involves introducing emitter material through the gate openings into the dielectric openings and using a lift-off layer (34), or an electrochemical technique, to remove excess emitter material.