SUPERCONDUCTOR QUENCH DETECTION METHOD AND DEVICE

    公开(公告)号:JPH06221833A

    公开(公告)日:1994-08-12

    申请号:JP1099693

    申请日:1993-01-26

    Applicant: CANON KK

    Abstract: PURPOSE:To provide a method and device for detecting a superconductor quench which can detect a small change related to generation of quench and can cope with a device utilizing a superconductive wire consisting of an oxide superconductor. CONSTITUTION:Incoherent light is applied skewly to a side surface 6 of a superconductor device where a superconductive wire 1 exists through optical systems 4 and 5. An image indicating the symmetrical position of the superconductive wire is read from the reflection light passing through the optical systems 7 and 8 using a photoelectric transducer. Parts which are positioned at equal spacing are extracted out of read images indicating the symmetrical positions of the superconductive wire by an electrical signal pre-processing device 12 and then the extracted parts are subjected to Fourier conversion by an FFT processor and are converted to frequency space. A signal analysis device 14 and control devices 15 and 16 detect that quench was generated when the converted output changes above a threshold and then reduce current supplied to the superconductive wire.

    ALIGNMENT DEVICE AND ALIGNER AND MANUFACTURE OF SEMICONDUCTOR ELEMENT USING THEM

    公开(公告)号:JPH04303914A

    公开(公告)日:1992-10-27

    申请号:JP9362091

    申请日:1991-03-29

    Applicant: CANON KK

    Abstract: PURPOSE:To align a wafer with an image pickup means with high accuracy by a method wherein a plurality of alignment marks which are composed of diffraction gratings and whose line width is different are formed on the face of a wafer. CONSTITUTION:A wafer mark GW is composed of three alignment marks Wa1 to Wa3 which are composed of relief-shaped diffraction gratings and whose line width is different. The line width of the alignment marks Wa1 is at D1 and their pitch is at LW1; a plurality of the marks are arranged at equal intervals in an alignment direction. The line width of the alignment marks Wa2 is at D2 and their pitch is at LW2; the line width of the alignment marks Wa3 is at D3 and their pitch is at LW3; and a plurality of the marks are arranged at equal intervals in respective alignment directions. A reference mark Gs is composed of diffraction gratings whose pitch is set so as to be at the same pitch as the pitch LW1 of the alignment marks Wa1 on the wafer mark GW on the face of a reception means CCD 11.

    EXPOSURE DEVICE
    13.
    发明专利

    公开(公告)号:JPH03293609A

    公开(公告)日:1991-12-25

    申请号:JP9727490

    申请日:1990-04-12

    Applicant: CANON KK

    Abstract: PURPOSE:To enable fast automatic focusing by transmitting light beams which differ in wavelength through a TTL(through the lens) and comparing outputs corresponding to their wavelengths with each other. CONSTITUTION:Several kinds of light in different kinds of wavelength range illuminate an extremely small pattern 12 on a reticle R. The light passed through the reticle R irradiates a wafer W through an optical system 11 for exposure and is reflected by the surface of the wafer W and passed through the optical system 11 for exposure agaian to enter detection optical systems 15, 120, and 121. The light entering the detection optical systems 15, 120, and 121 is split again by the wavelengths, an evaluated quantity is calculated from voltage values detected by photoelectric conversion systems 126 - 128 provided corresponding to the wavelengths, and the focus of the exposure optical system 11 is corrected with the evaluated quantity. Consequently, highly accurate TTL characteristics are maintained and the fast focusing is enabled.

    ALIGNING METHOD
    14.
    发明专利

    公开(公告)号:JPH03282715A

    公开(公告)日:1991-12-12

    申请号:JP8104390

    申请日:1990-03-30

    Applicant: CANON KK

    Abstract: PURPOSE:To find the position of a pattern without depending on a sampling pitch by converting a one-dimensional signal obtained by estimating a video signal obtained by image-picking up the pattern having periodicity with an image pickup means in one direction to a spatial frequency area, and finding the strength and the phase of a spatial frequency from the pattern. CONSTITUTION:A projection optical system 11, a detection optical system 14, an image pickup device 15, an A/D converter 16, an estimation device 17, and an FFT arithmetic unit 18 are provided. Then, the pattern to be detected is formed so as to attach the periodicity, and a one-dimensional discrete electrical signal string by estimation in a direction intersecting orthogonally to a direction desired to detect the position of the pattern is converted to the spatial frequency area by applying known orthogonal transformation, and the strength and the phase of a spatial frequency component appearing properly in the pattern desired to detect are detected. In such a manner, it is possible to detect the position of the pattern without being affected by a noise.

    CHARGED PARTICLE TRACK CALCULATING METHOD AND RECORDING MEDIUM RECORDING CHARGED PARTICLE TRACK CALCULATION PROCESSING PROGRAM

    公开(公告)号:JPH11317158A

    公开(公告)日:1999-11-16

    申请号:JP12252798

    申请日:1998-05-01

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To provide a charged particle track calculating method using a computer capable of automatically making the time variable with respect to a system having a different scale and also with respect to a system having a stagnation point, and capable of performing track calculation of an electron accurately in a short period of time. SOLUTION: In a charged particle track calculating method using a computer for calculating the position of a charged particle after an elapse of an infinitesimal time under a given electric field, the position of a charged particle after the elapse of an infinitesimal time is calculated by solving a Newton's equation where the infinitesimal time is changed every moment according to the magnitude of the electric field. Also, in this calculating method, the infinitesimal time is changed every moment according to the position of a charged particle.

    INNER POINT JUDGING METHOD AND CONVEX POLYGON FORMING METHOD

    公开(公告)号:JPH11175695A

    公开(公告)日:1999-07-02

    申请号:JP36170197

    申请日:1997-12-11

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To make it possible to judge an inner point in shorter time. SOLUTION: Whether a given point P is the inner point of a convex polygon B including a given polygon A or not is judged by an algorithm A of step S301 (step S301, step S302). In this case, when the point P is the inner point of the convex polygon B, whether the point P is the inner point of the polygon A or not is judged again by an algorithm B of step S303 (step S303, step S304).

    ELECTRON EMITTING ELEMENT, ELECTRON SOURCE, IMAGE FORMING DEVICE USING THE SAME, AND THEIR MANUFACTURE

    公开(公告)号:JPH0927273A

    公开(公告)日:1997-01-28

    申请号:JP19796895

    申请日:1995-07-12

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To reduce the influence on element component members and on electron emission characteristics by heat generation during current-carrying forming process so as to achieve high reliability of an electron emission element by forming an electron emitting part through a reverse piezoelectric effect on a conductive film. SOLUTION: A piezoelectric element 6 consisting of a piezoelectric electrode 7 and a piezoelectric layer 8 is formed over a substrate 1, element electrodes 4, 5 are provided on the piezoelectric element 6, and a conductive film 3 is formed between the electrodes 4, 5. In current-passing forming, a current is passed between the electrodes 4, 5 and a voltage is applied to the piezoelectric electrode 7 to destroy, deform, or denature the conductive film 3 locally to form an electron emitting part 2. Deflection of the conductive film 3 caused by a reverse piezoelectric effect promotes the local destruction, deformation, or denaturing to reduce the amount of heat during the current-passing forming so as to reduce the influence of the heat on the component members of the element and on electron emission characteristics. Also, the power consumption and the processing time required for the formation of the electron emitting part can both be reduced greatly.

    METHOD AND APPARATUS FOR TRANSMITTING INFORMATION USING JOSEPHSON TRANSMISSION LINE

    公开(公告)号:JPH08162683A

    公开(公告)日:1996-06-21

    申请号:JP29813094

    申请日:1994-12-01

    Applicant: CANON KK

    Abstract: PURPOSE: To effectively increase the propagation speed of a soliton corresponding to a signal when information is transmitted by the soliton by using a Josephson transmission line. CONSTITUTION: A soliton corresponding to a transmission signal is transmitted to a Josephson transmission line 10 by a soliton signal transmitter 14, the soliton having smaller propagation speed than that of the soliton corresponding to the transmission signal is used as a background signal soliton, which is ordinarily and periodically transmitted. The propagating speed of the soliton of the side corresponding to the transmission signal is effectively enhanced by the shift of the phase when the background signal soliton passes on the line 10. At the reception side, a soliton signal identifying circuit 16 identifies by the sum of the square of the differentiation of sign=Galtonian solution of a phase difference signal and twice differentiation, and only the soliton corresponding to the transmission signal is detected.

    ELECTRON SOURCE, IMAGE FORMING DEVICE USING THIS ELECTRON SOURCE AND MANUFACTURE THEREOF

    公开(公告)号:JPH0864119A

    公开(公告)日:1996-03-08

    申请号:JP21524194

    申请日:1994-08-18

    Applicant: CANON KK

    Abstract: PURPOSE: To reduce the dispersion between elements due to the forming by cooling the whole of an electron source at the time of applying voltage between element electrodes of at least a line of electron discharging elements at the same time for forming. CONSTITUTION: The element electrode material is deposited on a substrate 1 after washing the substrate 1, and element electrodes 4, 51 are formed on the surface of the substrate 1. An organic metal film is formed on the substrate 1 formed with the electrodes 4, 5, and heating is performed so as to form a conductive thin film 3. Next, the electrifying processing named forming is performed. When electrifying from a power source is performed between the electrodes 4, 5, a part of the thin film 3 is formed with an electron discharging part 2 having the changed structure. Condition of the electron discharging part of the electron source, in which multiple surface transmission type conductive electron discharging elements are arranged, is changed in response to the condition at the time of forming, and dispersion is generated between each element with the line forming. Consequently, the whole of the electron source is cooled at the time of performing the line forming.

    MANUFACTURE OF ELECTRON EMISSION ELEMENT

    公开(公告)号:JPH0765711A

    公开(公告)日:1995-03-10

    申请号:JP23596293

    申请日:1993-08-30

    Applicant: CANON KK

    Abstract: PURPOSE:To form an electron emission part with high positional accuracy by processing one part of the conductive film made on an insulating substrate by the use of the probe of a scanning type of tunneling microscope, and then, applying a current treatment. CONSTITUTION:Element electrodes 12 and 13 consisting of Ni are made on the surface of an insulating quartz substrate 11 cleaned with organic solvent. Hereon, solution containing organic palladium is applied, and then it is heat- treated to form a conductive fine particle thin film 14 consisting of paradium oxide fine particles. Next, tungsten fin particles 16 are formed by shifting the probe 15 of a scanning type of tunneling microscope on which tungsten atoms are stuck and bringing it into contact with the film or separating it while confirming a tunnel current. When pulse voltage is applied between the electrodes 12 and 13, the structural change of the film 14 occurs from the place of particles 16, and the electron emission part 17 consisting of a crack can be made with the positional accuracy on atom scale.

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