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    ARTICLE OPTIQUE A COULEUR DE REFLET RESIDUEL ROUGE
    12.
    发明专利
    ARTICLE OPTIQUE A COULEUR DE REFLET RESIDUEL ROUGE 未知

    公开(公告)号：FR3008193B1

    公开(公告)日：2015-08-14

    申请号：FR1356668

    申请日：2013-07-05

    Applicant: ESSILOR INT

    Inventor： ARROUY FREDERIC ,  DE AYGUAVIVES FRANCISCO ,  DIEGUEZ IVAN

    IPC: G02B1/10 ,  G02C7/02

    Abstract: La présente invention concerne un article transparent comprenant un substrat comprenant au moins une face avant et une face arrière, au moins une de ces deux faces principales étant revêtue d'un revêtement interférentiel ayant une valeur de réflexion dans le visible R inférieure ou égale à 50%, caractérisé en ce que ledit revêtement interférentiel possède un angle de teinte h et une valeur de Chroma C* aptes à conférer au reflet résiduel présente une même couleur chromatique perçue dans le rouge

    13.
    发明专利
    未知

    公开(公告)号：BRPI0714043A2

    公开(公告)日：2012-12-18

    申请号：BRPI0714043

    申请日：2007-06-27

    Applicant: ESSILOR INT

    Inventor： ARROUY FREDERIC ,  BEINAT OLIVIER ,  NOUVELOT LUC ,  THOMAS MICHELE

    IPC: G02B1/11

    Abstract: The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the low ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating sum ⁢⁢ of ⁢⁢ the ⁢⁢ physical ⁢⁢ thicknesses ⁢⁢ of ⁢⁢ the high ⁢⁢ refractive ⁢⁢ index ⁢⁢ layers ⁢⁢ of ⁢⁢ the ⁢ anti ⁢ - ⁢ reflection ⁢⁢ coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness ≧100 nm which is not the outermost layer of the anti-reflection coating, said relatively thick layer and the underlying layers are not taken into account in RT calculation.

    14.
    发明专利
    未知

    公开(公告)号：FR2817267A1

    公开(公告)日：2002-05-31

    申请号：FR0015334

    申请日：2000-11-28

    Applicant: ESSILOR INT

    Inventor： HELMSTETTER YVON ,  BERNHARD JEAN DANIEL ,  ARROUY FREDERIC

    IPC: B32B7/02 ,  C23C14/06 ,  G02B1/11 ,  C23C14/08

    Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 DEG C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

    Method for providing at least part of an eyewear equipment
    15.
    发明专利
    Method for providing at least part of an eyewear equipment 未知

    公开(公告)号：AU2013331977B2

    公开(公告)日：2019-06-06

    申请号：AU2013331977

    申请日：2013-05-02

    Applicant: ESSILOR INT

    Inventor： STEPHKOV NATACHA ,  ARROUY FREDERIC

    IPC: G06F17/50

    Abstract: A method implemented by computer means, for providing at least part of an eyewear equipment adapted to a wearer, the method comprising: • a wearer data receiving step (S1), • a wearer data storing step (S2), · an identifier sending step (S3), • an eyewear equipment design sending step (S4), • an eyewear equipment data receiving step (S5), • an eyewear equipment data storing step (S6), and • an eyewear equipment data sending step (S7).

    COLD ANTIREFLECTION LAYER DEPOSITION PROCESS
    16.
    发明专利
    COLD ANTIREFLECTION LAYER DEPOSITION PROCESS 未知

    公开(公告)号：CA2429150C

    公开(公告)日：2010-03-30

    申请号：CA2429150

    申请日：2001-11-26

    Applicant: ESSILOR INT

    Inventor： HELMSTETTER YVON ,  BERNHARD JEAN-DANIEL ,  ARROUY FREDERIC

    IPC: C23C14/06 ,  B32B7/02 ,  G02B1/00 ,  G02B1/11

    Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

    19.
    发明专利
    未知

    公开(公告)号：DE60132914D1

    公开(公告)日：2008-04-03

    申请号：DE60132914

    申请日：2001-11-26

    Applicant: ESSILOR INT

    Inventor： HELMSTETTER YVON ,  BERNHARD JEAN-DANIEL ,  ARROUY FREDERIC

    IPC: C23C14/06 ,  B32B7/02 ,  G02B1/00 ,  G02B1/11

    Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate ( 1 ) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF 2 ( 4, 4 '), preparing the surface of the thus coated substrate, and depositing an outer MgF 2 layer ( 5 ) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

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