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    Method and apparatus for setting optical imaging properties by means of radiation treatment
    11.
    发明申请
    Method and apparatus for setting optical imaging properties by means of radiation treatment 有权
    通过辐射处理设置光学成像性能的方法和装置

    公开(公告)号：US20060118703A1

    公开(公告)日：2006-06-08

    申请号：US11228286

    申请日：2005-09-19

    Applicant: Ulrich Wegmann ,  Eric Eva

    Inventor： Ulrich Wegmann ,  Eric Eva

    IPC: H01J3/14

    CPC classification number: G01J9/00 ,  G02B27/0025 ,  G03F7/70308 ,  G03F7/706

    Abstract: Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state, and a method for setting the imaging properties of an internal optical element with radiation treatment. A measurement is carried out on the optical system in order to determine one or more aberrations in a spatially resolved fashion, a correction that changes the shape and/or refractive index of the internal optical element is calculated in order to reduce the measured aberration or aberrations, and the optical element is irradiated with the aid of a processing radiation that changes the shape and/or refractive index, in accordance with the calculated correction. In addition, a radiation treatment of an optical element for setting its imaging properties uses a compacting processing radiation with the aid of which the optical element is irradiated in a controlled fashion in such a way that its imaging properties are influenced in a controlled fashion via spatially resolved material shrinkage and/or increase of the refractive index. The method and apparatus are suited, for example, for producing correction aspherics in microlithography projection objectives in the installed state.

    Abstract translation: 具体地说，一种使用放射线治疗来设定光学成像特性的方法和装置，具体地说，一种用于在安装状态下设置光学系统的至少一个光学元件的放射线处理光学系统的成像特性的方法和装置，以及一种设置方法 具有放射线处理的内部光学元件的成像特性。 在光学系统上进行测量以便以空间分辨的方式确定一个或多个像差，计算改变内部光学元件的形状和/或折射率的校正，以便减少所测量的像差或像差 并且借助于根据所计算的校正改变形状和/或折射率的处理辐射照射光学元件。 此外，用于设置其成像特性的光学元件的辐射处理使用压实处理辐射，借助于该光学元件以受控的方式照射光学元件，使得其成像特性以受控的方式经由空间影响 分辨的材料收缩和/或折射率的增加。 该方法和装置例如适用于在安装状态下在微光刻投影物镜中产生校正非球面。

    LENS BLANK AND LENS ELEMENTS AS WELL AS METHOD FOR THEIR PRODUCTION
    14.
    发明申请
    LENS BLANK AND LENS ELEMENTS AS WELL AS METHOD FOR THEIR PRODUCTION 有权
    透镜孔和镜头元件也是其生产方法

    公开(公告)号：US20080018992A1

    公开(公告)日：2008-01-24

    申请号：US11775991

    申请日：2007-07-11

    Applicant: Eric Eva

    Inventor： Eric Eva

    IPC: G02B13/14 ,  G02B3/00

    CPC classification number: G02B3/06 ,  G02B1/02 ,  G02B1/08 ,  G03F7/70341

    Abstract: A method for manufacturing a preferably asymmetrical lens element (5a) from a tempered blank (1) is characterized by: producing the lens element (5a) from a first partial volume (1a) of the tempered blank (1), whose thickness d is less than approximately 70%, preferably less than approximately 60%, particularly preferably less than approximately 50% of the thickness D of the tempered blank (1). Preferably, from a second partial volume (1b) of the tempered blank (1) at least a further lens element (5a′) is produced, wherein before the lens elements (5a, 5a′) are produced the tempered blank (1) is divided into the first and second partial volume (1a, 1b).

    Abstract translation: 用于从回火坯料（1）制造优选不对称的透镜元件（5a）的方法的特征在于：从回火坯料（1）的第一部分体积（1a）产生透镜元件（5a），其中 厚度d小于回火坯料（1）的厚度D的约70％，优选小于约60％，特别优选小于约50％。 优选地，从回火坯料（1）的第二部分体积（1b）产生至少另一个透镜元件（5a），其中在制造透镜元件（5a，5a'）之前，回火坯料 （1）被分成第一和第二部分体积（1a，1b）。

    Projection optical system
    15.
    发明授权
    Projection optical system 失效
    投影光学系统

    公开(公告)号：US06992753B2

    公开(公告)日：2006-01-31

    申请号：US10743815

    申请日：2003-12-24

    Applicant: Daniel Krähmer ,  Eric Eva

    Inventor： Daniel Krähmer ,  Eric Eva

    IPC: G03B27/42

    CPC classification number: G03F7/70983 ,  G03F7/70958

    Abstract: Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC

    Abstract translation: 通过选择用于透镜的最大设计注量值H D D和/或由具有特征转变点T ，其中，例如，T RC <0.8。 以及透镜的其它关系和/或特性之中。

    Projection optical system
    16.
    发明申请
    Projection optical system 失效
    投影光学系统

    公开(公告)号：US20050140954A1

    公开(公告)日：2005-06-30

    申请号：US10743815

    申请日：2003-12-24

    Applicant: Daniel Krahmer ,  Eric Eva

    Inventor： Daniel Krahmer ,  Eric Eva

    IPC: G03F7/20 ,  G03B27/54

    CPC classification number: G03F7/70983 ,  G03F7/70958

    Abstract: Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC

    Abstract translation: 通过选择用于透镜的最大设计注量值H D D和/或由具有特征转变点T ，其中，例如，T RC <0.8。 以及透镜的其它关系和/或特性之中。

    Method for manufacturing a lens of synthetic quartz glass with increased H2 content
    17.
    发明授权
    Method for manufacturing a lens of synthetic quartz glass with increased H2 content 有权
    制造具有增加的H2含量的合成石英玻璃透镜的方法

    公开(公告)号：US07934390B2

    公开(公告)日：2011-05-03

    申请号：US11748151

    申请日：2007-05-14

    Applicant: Eric Eva

    Inventor： Eric Eva

    IPC: C03C21/00 ,  C03C19/00

    CPC classification number: C03C3/06 ,  C03B23/0013 ,  C03B23/0026 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

    Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

    Abstract translation: 本发明涉及一种用于制造具有增加的H 2含量的合成石英玻璃透镜的方法，特别是用于具有小于250nm，特别是小于200nm的工作波长的光学系统的透镜，步骤 ：提供合成石英玻璃的前体产物，特别是具有小于2×1015分子/ cm 3的第一H 2含量，周边边界表面和位于相对侧上的两个基底表面，其中至少一个部分表面至少 所述基面之一具有曲率，并且在含H2气氛中处理前体产物，以便产生具有相对于第一H 2含量增加的第二H 2含量的合成石英玻璃的前体产物，特别是与 大于1016分子/ cm 3的第二H 2含量，并测量所述前体产物与所述第二H 2含量的至少一种光学性质。

    PROJECTION LENS FOR MICROLITHOGRAPHY AND CORRESPONDING TERMINAL ELEMENT
    19.
    发明申请
    PROJECTION LENS FOR MICROLITHOGRAPHY AND CORRESPONDING TERMINAL ELEMENT 审中-公开
    投影镜头用于微电脑和相应的终端元件

    公开(公告)号：US20100149500A1

    公开(公告)日：2010-06-17

    申请号：US11993422

    申请日：2005-06-21

    Applicant: Eric Eva

    Inventor： Eric Eva

    IPC: G03B27/52 ,  G02B3/00

    CPC classification number: G03F7/70341 ,  G03F7/70958

    Abstract: The invention relates to a projection lens (5) for microlithography, in particular, for immersion lithography, designed to operate at a wavelength of more than 190 nm and comprising an optical element made from quartz glass with an OH content of less than 50 ppm, in particular between 10 ppm and 50 ppm, and a water content of between 1.5×1016 and 2×1018 molecules/cm3, preferably between 2×1016 and 1×1018 molecules/cm3, in particular between 5×1016 and 2×1017 molecules/cm3. The optical element is preferably a terminal element (14) for the projection lens (5) in a microlithography projection illumination unit (1) for immersion lithography.

    Abstract translation: 本发明涉及用于微光刻的投影透镜（5），特别是用于浸没光刻的设计用于在大于190nm的波长下工作的投影透镜（5），并且包括由OH含量小于50ppm的石英玻璃制成的光学元件， 特别是在10ppm和50ppm之间，水含量在1.5×10 16和2×10 18分子/ cm 3之间，优选在2×10 16和1×10 18分子/ cm 3之间，特别是在5×10 16和2×101 7分子之间 / cm3。 光学元件优选是用于浸没光刻的微光刻投影照明单元（1）中的用于投影透镜（5）的端子元件（14）。

    METHOD FOR MANUFACTURING A LENS OF SYNTHETIC QUARTZ GLASS WITH INCREASED H2 CONTENT
    20.
    发明申请
    METHOD FOR MANUFACTURING A LENS OF SYNTHETIC QUARTZ GLASS WITH INCREASED H2 CONTENT 有权
    具有增加的H2含量的合成石英玻璃镜片的制造方法

    公开(公告)号：US20070266733A1

    公开(公告)日：2007-11-22

    申请号：US11748151

    申请日：2007-05-14

    Applicant: Eric Eva

    Inventor： Eric Eva

    IPC: C03C15/00 ,  C03C19/00

    CPC classification number: C03C3/06 ,  C03B23/0013 ,  C03B23/0026 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

    Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps:providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, andtreating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

    Abstract translation: 本发明涉及一种用于制造具有增加的H 2 O 3含量的合成石英玻璃透镜的方法，特别是用于具有小于250nm的工作波长的光学系统的透镜，特别是 小于200nm，步骤：提供合成石英玻璃的前体产物，特别是具有小于2.10 15分子/ cm 2的第一H 2 O 3含量 其具有周向边界表面和位于相对侧上的两个基面，其中至少一个所述基底表面的至少一个部分表面具有曲率，并且将前体产物处理成H 2 O 3， 2含量的气氛，以便产生合成石英玻璃的前体产物，其具有相对于第一H 2 N 2含量增加的第二H 2 N 2含量 特别是具有超过10个/ 16个分子/ cm 3的第二H 2 N 2含量，并且测量至少一种光学式 所述前体产物具有所述第二H 2 N 2含量的操作性。

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