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11.PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION 有权
Title translation: 光敏组分,结构形成方法使用光敏成分和光敏成分使用的连接公开(公告)号:EP2192134A4
公开(公告)日:2011-04-27
申请号:EP08832644
申请日:2008-09-18
Applicant: FUJIFILM CORP
Inventor: WADA KENJI
CPC classification number: C08F20/10 , C07D211/96 , C07D243/04 , C07D295/26 , C08F214/18 , C08F220/26 , C08F220/28 , C08F220/34 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2022 , G03F7/2041
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公开(公告)号:SI2883866T1
公开(公告)日:2019-07-31
申请号:SI201331373
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C69/00 , A61K31/00 , C07B53/00 , C07C45/00 , C07C67/00 , C07C68/00 , C07C303/00 , C07C309/00 , C07D333/00 , C07H13/00 , C07H15/00 , C07H17/00
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公开(公告)号:HRP20190572T1
公开(公告)日:2019-05-17
申请号:HRP20190572
申请日:2019-03-25
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C69/618 , A61K31/7068 , C07B53/00 , C07C45/00 , C07C67/29 , C07C68/06 , C07C69/28 , C07C69/76 , C07C69/78 , C07C69/92 , C07C69/96 , C07C303/28 , C07C309/73 , C07D333/32 , C07H13/04 , C07H13/08 , C07H15/04 , C07H15/18 , C07H15/203 , C07H17/02
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公开(公告)号:MX2015001935A
公开(公告)日:2015-06-22
申请号:MX2015001935
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C251/38 , A61K31/7068 , A61P35/00 , C07B53/00 , C07C45/00 , C07C47/277 , C07C249/04 , C07C303/28 , C07C309/73 , C07H5/02 , C07H5/10 , C07H19/06
Abstract: Un compuesto representado por la fórmula general 1D (ver Fórmula) (en la fórmula, R1A, R1B, R2A, R2B, R3A y R3B cada uno indica un átomo de hidrógeno, un grupo alquilo de C1-6 sustituido opcionalmente, y similares) es útil como in intermediario para producir un tionucleósido, y este método de producción es útil como un método para producir un tionucleósido.
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公开(公告)号:CA2880794A1
公开(公告)日:2014-02-20
申请号:CA2880794
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C251/38 , A61K31/7068 , A61P35/00 , C07B53/00 , C07C45/00 , C07C47/277 , C07C249/04 , C07C303/28 , C07C309/73 , C07H5/02 , C07H5/10 , C07H19/06
Abstract: A compound represented by general formula [1D] (in the formula, R1A, R1B, R2A, R2B, R3A and R3B each denote a hydrogen atom, an optionally substituted C1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and this production method is useful as a method for producing a thionucleoside.
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公开(公告)号:PL2883866T3
公开(公告)日:2019-07-31
申请号:PL13879640
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C69/618 , A61K31/7068 , C07B53/00 , C07C45/00 , C07C67/29 , C07C68/06 , C07C69/28 , C07C69/76 , C07C69/78 , C07C69/92 , C07C69/96 , C07C303/28 , C07C309/73 , C07D333/32 , C07H13/04 , C07H13/08 , C07H15/04 , C07H15/18 , C07H15/203 , C07H17/02
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公开(公告)号:ES2718307T3
公开(公告)日:2019-07-01
申请号:ES13879640
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C69/618 , A61K31/7068 , C07B53/00 , C07C45/00 , C07C67/29 , C07C68/06 , C07C69/28 , C07C69/76 , C07C69/78 , C07C69/92 , C07C69/96 , C07C303/28 , C07C309/73 , C07D333/32 , C07H13/04 , C07H13/08 , C07H15/04 , C07H15/18 , C07H15/203 , C07H17/02
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公开(公告)号:AU2013303534A1
公开(公告)日:2015-02-26
申请号:AU2013303534
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C45/00 , A61K31/7068 , A61P35/00 , C07B53/00 , C07C47/277 , C07C249/04 , C07C251/38 , C07C303/28 , C07C309/73 , C07H5/02 , C07H5/10 , C07H19/06
Abstract: A compound represented by general formula [1D] (in the formula, R
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19.INTERMEDIATE FOR SYNTHESIS OF 1-(2-DEOXY-2-FLUORO-4-THIO-beta-D-ARABINOFURANOSYL) CYTOSINE, INTERMEDIATE FOR SYNTHESIS OF THIONUCLEOSIDE, AND METHODS FOR PRODUCING THESE INTERMEDIATES 审中-公开
Title translation: 中间体1-(2-脱氧-2-氟-4-硫代-β-D-阿拉伯呋喃糖)合成胞嘧啶,中间体的硫代核苷生产这种中间体的合成和方法公开(公告)号:EP2883866A4
公开(公告)日:2016-06-15
申请号:EP13879640
申请日:2013-08-13
Applicant: FUJIFILM CORP
Inventor: NAKAMURA KOUKI , SHIMAMURA SATOSHI , IMOTO JUNICHI , TAKAHASHI MOTOMASA , WATANABE KATSUYUKI , WADA KENJI , FUJINO YUUTA , MATSUMOTO TAKUYA , TAKAHASHI MAKOTO , OKADA HIDEKI , YAMANE TAKEHIRO , ITO TAKAYUKI
IPC: C07C251/38 , A61K31/7068 , A61P35/00 , C07B53/00 , C07C45/00 , C07C47/277 , C07C249/04 , C07C303/28 , C07C309/73 , C07H5/02 , C07H5/10 , C07H19/06
CPC classification number: C07D333/32 , A61K31/7068 , C07B53/00 , C07C45/00 , C07C47/277 , C07C67/29 , C07C68/06 , C07C69/28 , C07C69/618 , C07C69/76 , C07C69/78 , C07C69/92 , C07C69/96 , C07C249/04 , C07C251/38 , C07C251/40 , C07C303/28 , C07C309/66 , C07C309/73 , C07F7/1844 , C07H1/00 , C07H7/04 , C07H13/04 , C07H13/08 , C07H15/04 , C07H15/18 , C07H15/203 , C07H17/02 , C07H19/06 , C07H19/067 , C07H19/073 , C07H23/00 , Y02P20/55
Abstract: A compound represented by a formula [ID] as shown below (wherein R 1A , R 1B , R 2A , R 2B , R 3A and R 3B represent a hydrogen atom, an optionally substituted C 1-6 alkyl group, and the like) is useful as an intermediate for producing a thionucleoside, and the production method of the present invention is useful as a method for producing a thionucleoside.
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20.METHOD FOR PATTERN FORMATION, AND RESIST COMPOSITION, DEVELOPING SOLUTION AND RINSING LIQUID FOR USE IN THE METHOD FOR PATTERN FORMATION 有权
Title translation: 结构,教育和照片涂料组合物,开发解决方案的方法和清洗,以便用于结构教学过程公开(公告)号:EP2138898A4
公开(公告)日:2012-12-05
申请号:EP08740284
申请日:2008-04-11
Applicant: FUJIFILM CORP
Inventor: TARUTANI SHINJI , TSUBAKI HIDEAKI , MIZUTANI KAZUYOSHI , WADA KENJI , HOSHINO WATARU
CPC classification number: G03F7/40 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/325
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