公开(公告)号：DE69738705D1

公开(公告)日：2008-07-03

申请号：DE69738705

申请日：1997-12-19

Applicant: IBM

Inventor： GRECO NANCY ANNE ,  GRECO STEPHEN EDWARD ,  WAGNER TINA JANE

IPC: H01L21/28 ,  H01L21/768

Abstract: A method of fabricating semiconductor structures, particularly contact structures, forms features of differing sizes at different points in the semiconductor process, so as to enhance lithographic resolution.

公开(公告)号：DE3751127T2

公开(公告)日：1995-09-14

申请号：DE3751127

申请日：1987-04-28

Applicant: IBM

Inventor： GRECO STEPHEN EDWARD ,  LYONS CHRISTOPHER FRANCIS ,  YANG JER-MING

IPC: H01L21/30 ,  C08J9/26 ,  G03C1/00 ,  G03F7/004 ,  G03F7/26 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027