公开(公告)号：AU747516B2

公开(公告)日：2002-05-16

申请号：AU9219998

申请日：1998-09-03

Applicant: GOODRICH CO B F ,  IBM

Inventor： GOODALL BRIAN L ,  JAYARAMAN SAIKUMAR ,  SHICK ROBERT A ,  RHODES LARRY F ,  ALLEN ROBERT DAVID ,  PIETRO RICHARD ANTHONY DI ,  WALLOW THOMAS

IPC: G03F7/004 ,  C08F2/46 ,  C08F32/00 ,  C08G61/08 ,  G03C1/72 ,  G03F7/039

Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

公开(公告)号：HK1036290A1

公开(公告)日：2001-12-28

申请号：HK01106633

申请日：2001-09-20

Applicant: IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08G20060101 ,  G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F20060101 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.