公开(公告)号：JP2004205505A

公开(公告)日：2004-07-22

申请号：JP2003417329

申请日：2003-12-15

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： BROCK PHILLIP J ,  DIPIETRO RICHARD A ,  FENDER NICOLETTE S ,  MILLER ROBERT D ,  SWANSON SALLY A ,  WALLRAFF GREGORY M

IPC: C12N15/09 ,  G01N33/543 ,  G01N33/547

CPC classification number: G01N33/54393 ,  G01N33/54353

Abstract: PROBLEM TO BE SOLVED: To provide a series of surface coupled linker molecules able to be brought into an optically active form used for preparing a bio-molecule microarray.
SOLUTION: A composition contains a solid substrate, an organic coupling group having one terminal part coupled to the solid substrate and having at least another terminal part containing an alcoholic or carbonyl functional group, and a protection group unstable against an acid selected from a group comprising an acetal or a ketal coupled to the alcoholic or carbonyl functional group. The present invention describes also a composition containing the solid substrate, the organic coupling group having the one terminal part coupled to the solid substrate, and having at least another terminal part containing an aldehyde. The present invention provides also a composition containing the solid substrate, and at least one photoacid generator or sensitizer coupled to the solid substrate.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004046098A

公开(公告)日：2004-02-12

申请号：JP2003128938

申请日：2003-05-07

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： ALLEN ROBERT DAVID ,  GREGORY BUREITA ,  BROCK PHILLIP ,  DIPIETRO RICHARD A ,  FENZEL-ALEXANDER DEBRA ,  LARSON CARL ,  MEDEIROS DAVID ,  PFEIFFER DIRK ,  SOORIYAKUMARAN RATNAM ,  TRUONG HOA D ,  WALLRAFF GREGORY M

IPC: C08F20/22 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/22 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition containing a polymer having at least one methacrylate monomer and to provide a method of pattering a substrate using the photoresist composition. SOLUTION: The photoresist composition contains a methacrylate monomer of formula 1 where R 1 represents hydrogen (H), a linear or branched 1-20C alkyl group or a semi- or perfluorinated linear or branched 1-20C alkyl group; where R 2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF 3 ) group bonded to each carbon of the substituted aliphatic group or a substituted or unsubstituted aromatic group; and where R 3 represents hydrogen (H), methyl (CH 3 ), trifluoromethyl (CF 3 ), difluoromethyl (CHF 2 ) or fluoromethyl (CH 2 F). COPYRIGHT: (C)2004,JPO

公开(公告)号：AU2872499A

公开(公告)日：1999-09-06

申请号：AU2872499

申请日：1999-02-19

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：SG11201501917SA

公开(公告)日：2015-05-28

申请号：SG11201501917S

申请日：2013-09-04

Applicant: IBM ,  AGENCY SCIENCE TECH & RES

Inventor： COADY DANIEL J ,  DIPIETRO RICHARD A ,  ENGLER AMANDA C ,  HEDRICK JAMES L ,  LEE ASHLYNN L ,  VENKATARAMAN SHRINIVAS ,  YANG YI YAN

IPC: A61K9/06 ,  A61K47/30

Abstract: A composite hydrogel comprises an amphiphilic triblock copolymer (ABA) and a loaded micelle bound by noncovalent interactions. The loaded micelle comprises a biologically active substance and an amphiphilic diblock copolymer (CD). The A blocks comprise a steroidal repeat unit (repeat unit 1) having both a backbone carbonate and a side chain bearing a steroid functional group. Each of the A blocks has a degree of polymerization of about 0.5 to about 4.0. The B block comprises a first poly(alkylene oxide) backbone. The C block comprises a second poly(alkylene oxide) backbone. The D block comprises a steroidal repeat unit (repeat unit 2) having both a backbone carbonate group and a side chain comprising a steroid functional group. The composite hydrogel is capable of controlled release of the biologically active substance.

公开(公告)号：AT264352T

公开(公告)日：2004-04-15

申请号：AT99909541

申请日：1999-02-19

Applicant: SUMITOMO BAKELITE CO ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：DE69618752T2

公开(公告)日：2002-09-12

申请号：DE69618752

申请日：1996-10-01

Applicant: IBM

Inventor： BREYTA GREGORY ,  DIPIETRO RICHARD A ,  HOFER DONALD C ,  ITO HIROSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.

公开(公告)号：DE69618752D1

公开(公告)日：2002-03-14

申请号：DE69618752

申请日：1996-10-01

Applicant: IBM

Inventor： BREYTA GREGORY ,  DIPIETRO RICHARD A ,  HOFER DONALD C ,  ITO HIROSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.

公开(公告)号：HK1036290A1

公开(公告)日：2001-12-28

申请号：HK01106633

申请日：2001-09-20

Applicant: IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08G20060101 ,  G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F20060101 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.