公开(公告)号：AU2872499A

公开(公告)日：1999-09-06

申请号：AU2872499

申请日：1999-02-19

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：AT264352T

公开(公告)日：2004-04-15

申请号：AT99909541

申请日：1999-02-19

Applicant: SUMITOMO BAKELITE CO ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：HK1036290A1

公开(公告)日：2001-12-28

申请号：HK01106633

申请日：2001-09-20

Applicant: IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08G20060101 ,  G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F20060101 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.