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公开(公告)号:DE69003146D1
公开(公告)日:1993-10-14
申请号:DE69003146
申请日:1990-03-05
Applicant: IBM
Inventor: BETTERTON KATHLEEN MARY , HINSBERG WILLIAM DINAN , NGUYEN HUU TINH , TANG WING TSANG , TWIEG ROBERT JAMES
IPC: G02F1/13 , C07C327/28 , C07C327/32 , C09K19/20 , C09K19/28 , C09K19/32
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公开(公告)号:DE3686103D1
公开(公告)日:1992-08-27
申请号:DE3686103
申请日:1986-05-23
Applicant: IBM
IPC: B05D5/00 , B05D7/26 , H01L21/312
Abstract: A substrate is planarized by applying a liquid coating to it comprising a polyamide alkyl ester formed from a pyromellitic alkyl diester and a para-linked aromatic diamine dissolved in a solvent containing at least 10% of a co-solvent boiling above 220 DEG C, and curing the coating.
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公开(公告)号:DE3861251D1
公开(公告)日:1991-01-24
申请号:DE3861251
申请日:1988-02-09
Applicant: IBM
Inventor: ALLEN ROBERT DAVID , FRECHET JEAN M J , TWIEG ROBERT JAMES , WILLSON CARLTON GRANT
IPC: G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027
Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light x-ray and electron beams. The composition comprises an acid generting onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
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