公开(公告)号：EP1851589A4

公开(公告)日：2009-08-19

申请号：EP06735757

申请日：2006-02-22

Applicant: IBM

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/00

CPC classification number: G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

公开(公告)号：WO2007039346A2

公开(公告)日：2007-04-12

申请号：PCT/EP2006065528

申请日：2006-08-21

Applicant: IBM ,  IBM UK ,  ALLEN ROBERT DAVID ,  DIPIETRO RICHARD ANTHONY ,  TRUONG HOA ,  BROCK PHILLIP JOE ,  SOORIYAKUMARAN RATNAM

Inventor： ALLEN ROBERT DAVID ,  DIPIETRO RICHARD ANTHONY ,  TRUONG HOA ,  BROCK PHILLIP JOE ,  SOORIYAKUMARAN RATNAM

CPC classification number: G03F7/0045 ,  C07J9/005 ,  C07J17/00 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/115

Abstract: A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.

Abstract translation: 包括聚合物，光致酸产生剂和溶解改性剂的光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图像的方法和溶解改性剂组合物。 溶解改性剂不溶于含水碱性显影剂中，并且抑制聚合物在显影剂中的溶解，直至酸被光致酸性发生剂暴露于光化辐射为止，因此溶解改性剂在合适的温度下变得可溶于显影剂， 允许聚合物溶解在显影剂中。 DMA是用酸不稳定的乙氧基乙基，四氢呋喃基和天竺葵酰基保护的葡糖苷，胆酸盐，柠檬酸盐和金刚烷二羧酸盐。

公开(公告)号：JP2006251794A

公开(公告)日：2006-09-21

申请号：JP2006048025

申请日：2006-02-24

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： RATONAMU SOORIYAKUMARAN ,  SUNDBERG LINDA KARIN ,  ALLEN ROBERT DAVID

IPC: G03F7/11 ,  C08G77/38 ,  C09D183/04 ,  C09D183/05 ,  C09D183/08 ,  C09D183/10 ,  G03F7/075 ,  H01L21/027

CPC classification number: C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist topcoat extremely suitable for photolithography and a liquid immersion photolithographic system. SOLUTION: The topcoat consists of a composition including functionalized polyhedral oligomeric silsesquioxane derivatives of formulae T m R3 , wherein m is equal to 8, 10 or 12 and Q n M n R1, R2, R3 , (wherein n is equal to 8, 10, 12). The functional groups preferably include aqueous base soluble moieties. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供非常适合于光刻的光致抗蚀剂外涂层和液浸光刻系统。 解决方案：面漆由包含官能化的式T的三面体低聚倍半硅氧烷衍生物（其中m等于8,10或12和Q < SB> n R1，R2，R3 （其中n等于8,10,12）。 官能团优选包括碱水溶性部分。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011110552A

公开(公告)日：2011-06-09

申请号：JP2010247449

申请日：2010-11-04

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NA YOUNG-HYE ,  SOORIYAKUMARAN RATNAM ,  ALLEN ROBERT DAVID

IPC: B01D71/70 ,  B01D69/12 ,  B01D71/38 ,  B01D71/40 ,  B01D71/78 ,  C08F220/00 ,  C08F230/08 ,  C08F290/06

CPC classification number: B01D69/12 ,  B01D69/125 ,  B01D71/70 ,  B01D71/82 ,  B01D2323/34 ,  B01D2325/20 ,  C08J7/18

Abstract: PROBLEM TO BE SOLVED: To provide a polymeric film made from cage type polyhedral oligomeric silsesquioxane (POSS) and a hydrophilic comonomer.
SOLUTION: A composite membrane includes a filtration membrane and a layer on the surface of the filtration membrane. The layer includes a polymer including a cage type polyhedral oligomeric silsesquioxane (POSS) derivative having a hydrophilic moiety bonded to at least one vertex thereof. A method for making the composite membrane includes a step of applying a photopolymerizable composition including a POSS compound, the hydrophilic comonomer and a photoinitiator to the surface of the filtration membrane. The composition is cured to form a hydrophilic layer on the filtration membrane.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供由笼型多面体低聚倍半硅氧烷（POSS）和亲水性共聚单体制成的聚合物膜。 解决方案：复合膜包括过滤膜和过滤膜表面上的层。 该层包括包含具有结合到其至少一个顶点的亲水部分的笼型多面体低聚倍半硅氧烷（POSS）衍生物的聚合物。 制造复合膜的方法包括将包含POSS化合物，亲水性共聚单体和光引发剂的光聚合性组合物施加到过滤膜的表面的步骤。 固化组合物以在过滤膜上形成亲水层。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011082510A

公开(公告)日：2011-04-21

申请号：JP2010211611

申请日：2010-09-22

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： SOORIYAKUMARAN RATNAM ,  HART MARK WHITNEY ,  ALLEN ROBERT DAVID

IPC: H01L21/027 ,  C08G77/38 ,  C08L83/04

CPC classification number: G03F7/0752 ,  C09D7/1233 ,  C09D7/63 ,  G03F7/094

Abstract: PROBLEM TO BE SOLVED: To provide a method of flattening on a topography using molecular glass materials. SOLUTION: A flattened composition using molecular glass as a base for lithographic processing is disclosed. A process generally includes the steps of casting a planarizing composition containing at least one molecular glass and at least one solvent on a surface containing a lithographic structure and heating the flattened composition to a temperature higher than the glass transition temperature of at least one molecular glass. Exemplary molecular glass includes a polyhedral oligomeric silsesquioxane derivative, calixarene, a cyclodextrin derivative, and the other non-polymer macromolecules. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供使用分子玻璃材料在地形上平坦化的方法。 解决方案：公开了使用分子玻璃作为光刻加工的基底的扁平组合物。 方法通常包括以下步骤：将含有至少一种分子玻璃和至少一种溶剂的平面化组合物浇铸在含有平版印刷结构的表面上并将扁平化组合物加热至高于至少一种分子玻璃的玻璃化转变温度的温度。 示例性分子玻璃包括多面体低聚倍半硅氧烷衍生物，杯芳烃，环糊精衍生物和其它非聚合物大分子。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2012020281A

公开(公告)日：2012-02-02

申请号：JP2011116591

申请日：2011-05-25

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NA YOUNG-HYE ,  ALLEN ROBERT DAVID ,  SOORIYAKUMARAN RATNAM

IPC: B01D71/56 ,  B01D69/10 ,  B01D69/12 ,  B01D71/82 ,  C08G69/42

CPC classification number: B01D69/125 ,  B01D61/00 ,  B01D61/002 ,  B01D61/025 ,  B01D61/027 ,  B01D69/02 ,  B01D69/12 ,  B01D71/56 ,  B01D71/68 ,  B01D2323/30 ,  C02F1/44 ,  C02F1/441 ,  C02F1/444 ,  C02F2101/103 ,  C02F2101/108 ,  C02F2101/12 ,  C02F2101/20 ,  C02F2103/08

Abstract: PROBLEM TO BE SOLVED: To provide a construction and a forming method of a composite semipermeable membrane including a multi-layered active layer having high salt rejection rate and mechanical strength.SOLUTION: A polymeric semipermeable membrane includes an active layer on a support. The active layer includes at least two chemically distinct crosslinked polyamide films, and the films are crosslinked with each other at an interface.

Abstract translation: 待解决的问题：提供一种复合半透膜的结构和形成方法，所述复合半透膜包括具有高的脱盐率和机械强度的多层活性层。 解决方案：聚合物半透膜在载体上包括活性层。 活性层包括至少两种化学上不同的交联聚酰胺膜，并且膜在界面处彼此交联。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011110553A

公开(公告)日：2011-06-09

申请号：JP2010247450

申请日：2010-11-04

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NA YOUNG-HYE ,  ALLEN ROBERT DAVID ,  SOORIYAKUMARAN RATNAM ,  JAMES LUPTON HEDRICK ,  ALSHAKIM NELSON

IPC: B01D69/12 ,  B01D61/00 ,  B01D61/02 ,  B01D61/14 ,  B01D71/40 ,  B01D71/52 ,  B01D71/82 ,  C08J9/40

CPC classification number: B01D71/52 ,  B01D65/08 ,  B01D67/0006 ,  B01D69/02 ,  B01D69/12 ,  B01D2321/168 ,  B01D2323/30 ,  B01D2323/345 ,  B01D2325/16 ,  B01D2325/48

Abstract: PROBLEM TO BE SOLVED: To provide a composite membrane with a performance enhancing layer, in which resistance to fouling is greatly enhanced in comparison with that of an non-coated membrane.
SOLUTION: The composite membrane includes a filtration membrane with a surface and a layer on the surface of the filtration membrane. The layer includes a polymer including a poly(ethylene glycol) moiety cross-linked with ammonium salt or a precursor of the ammonium salt.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：与非涂膜相比，提供具有性能增强层的复合膜，其中耐污垢性大大提高。 解决方案：复合膜包括在过滤膜的表面上具有表面和层的过滤膜。 该层包括聚合物，其包括与铵盐交联的聚（乙二醇）部分或铵盐的前体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2004046098A

公开(公告)日：2004-02-12

申请号：JP2003128938

申请日：2003-05-07

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： ALLEN ROBERT DAVID ,  GREGORY BUREITA ,  BROCK PHILLIP ,  DIPIETRO RICHARD A ,  FENZEL-ALEXANDER DEBRA ,  LARSON CARL ,  MEDEIROS DAVID ,  PFEIFFER DIRK ,  SOORIYAKUMARAN RATNAM ,  TRUONG HOA D ,  WALLRAFF GREGORY M

IPC: C08F20/22 ,  C08F220/28 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/22 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition containing a polymer having at least one methacrylate monomer and to provide a method of pattering a substrate using the photoresist composition. SOLUTION: The photoresist composition contains a methacrylate monomer of formula 1 where R 1 represents hydrogen (H), a linear or branched 1-20C alkyl group or a semi- or perfluorinated linear or branched 1-20C alkyl group; where R 2 represents an unsubstituted aliphatic group or a substituted aliphatic group having zero or one trifluoromethyl (CF 3 ) group bonded to each carbon of the substituted aliphatic group or a substituted or unsubstituted aromatic group; and where R 3 represents hydrogen (H), methyl (CH 3 ), trifluoromethyl (CF 3 ), difluoromethyl (CHF 2 ) or fluoromethyl (CH 2 F). COPYRIGHT: (C)2004,JPO

公开(公告)号：WO2006091648A2

公开(公告)日：2006-08-31

申请号：PCT/US2006006225

申请日：2006-02-22

Applicant: IBM ,  ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/76

CPC classification number: G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

Abstract translation: 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000A /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：（I）其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料10优选不溶于水，因此特别适用于使用水作为成像介质的浸没式光刻技术。

公开(公告)号：GB2485283A

公开(公告)日：2012-05-09

申请号：GB201119451

申请日：2010-08-23

Applicant: IBM

Inventor： NELSON ALSHAKIM ,  BROCK PHILLIP JOE ,  SOORIYAKUMARAN RATNAM ,  DAVIS BLAKE ,  MILLER ROBERT DENNIS ,  ALLEN ROBERT DAVID ,  LIN QINGHUANG

IPC: C09D183/04 ,  C08G77/04 ,  C08L83/04 ,  C09D183/14 ,  H01L21/312

Abstract: Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.