2.
    发明专利
    未知

    公开(公告)号:DE69324439T2

    公开(公告)日:1999-11-25

    申请号:DE69324439

    申请日:1993-10-29

    Applicant: IBM

    Abstract: A lithographic imaging process is provided for use in the manufacture of integrated circuits. A substrate is coated with a polymeric film comprising a vinyl polymer, a photosensitive acid generator, and acid labile groups. It is then heated to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. The film is then expose imagewise to radiation to generate free acid, and the film is once more heated, again to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. Finally the image is developed. The process provides protection to the photoresist film from airborne chemical contaminants.

    10.
    发明专利
    未知

    公开(公告)号:IT8026720D0

    公开(公告)日:1980-12-18

    申请号:IT2672080

    申请日:1980-12-18

    Applicant: IBM

    Abstract: A method and an apparatus for line narrowing in nuclear magnetic resonance (NMR) studies in solids is described. The method employs quasi-continuous amplitude modulation of an rf field (10) wherein the field is eliminated at intervals (18) for short periods of time at or about the time when the amplitude for both the maximum and minimum approach zero, these intervals creating windows where the NMR signal can be observed.

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