公开(公告)号：US20170031318A1

公开(公告)日：2017-02-02

申请号：US15039549

申请日：2014-12-02

Applicant: IMEC VZW

Inventor： Richard Stahl ,  Murali Jayapala ,  Andy Lambrechts ,  Geert Vanmeerbeeck

IPC: G03H1/04 ,  H04N5/33 ,  H04N9/04

CPC classification number: G03H1/0443 ,  G01N15/1429 ,  G01N15/1434 ,  G01N15/147 ,  G01N2015/1454 ,  G03H1/0404 ,  G03H1/0465 ,  G03H1/0486 ,  G03H1/0493 ,  G03H1/0866 ,  G03H2001/0212 ,  G03H2001/0428 ,  G03H2001/0447 ,  G03H2001/0452 ,  G03H2001/0497 ,  G03H2001/266 ,  G03H2210/12 ,  G03H2210/13 ,  G03H2222/14 ,  G03H2226/11 ,  G03H2240/62 ,  H04N5/332 ,  H04N9/045

Abstract: The present disclosure relates to apparatuses and methods for performing in-line lens-free digital holography of objects. At least one embodiment relates to an apparatus for performing in-line lens-free digital holography of an object. The apparatus includes a point light source adapted for emitting coherent light. The apparatus also includes an image sensing device adapted and arranged for recording interference patterns resulting from interference from light waves directly originating from the point light source and object light waves. The object light waves originate from light waves from the point light source that are scattered or reflected by the object. The image sensing device comprises a plurality of pixels. The point light source comprises a broad wavelength spectrum light source and a pinhole structure. The image sensing device comprises a respective narrow band wavelength filter positioned above each pixel that filters within a broad wavelength spectrum of the point light source.

Abstract translation: 本公开涉及用于执行物体的无线透镜数字全息术的装置和方法。 至少一个实施例涉及一种用于执行物体的直线无镜头数字全息术的装置。 该装置包括适于发射相干光的点光源。 该装置还包括适于和布置用于记录由直接源自点光源和物体光波的光波的干扰引起的干涉图案的图像感测装置。 物体光波源自被物体散射或反射的点光源的光波。 图像感测装置包括多个像素。 点光源包括宽波长光谱光源和针孔结构。 图像感测装置包括位于每个像素上方的相应的窄带波长滤波器，其在点光源的宽波长光谱内进行滤波。

公开(公告)号：US20130187669A1

公开(公告)日：2013-07-25

申请号：US13746149

申请日：2013-01-21

Applicant: IMEC

Inventor： Murali Jayapala ,  Geert Van Der Plas ,  Veronique Rochus ,  Xavier Rottenberg ,  Simone Severi ,  Stéphane Donnay

IPC: G02B27/00

CPC classification number: G02B27/00 ,  G02B1/00 ,  G02B6/352 ,  G02B6/359 ,  G02B26/0825 ,  G02B26/0841 ,  G02B2207/00 ,  H04N1/00

Abstract: A built-in self-calibration system and method for a micro-mirror array device, for example, operating as a variable focal length lens is described. The calibration method comprises determining a capacitance value for each micro-mirror element in the array device at a number of predetermined reference angles to provide a capacitance-reference angle relationship. From the capacitance values, an interpolation step is carried to determine intermediate tilt angles for each micro-mirror element in the array. A voltage sweep is applied to the micro-mirror array and capacitance values, for each micro-mirror element in the array, are measured. For a capacitance value that matches one of the values in the capacitance-reference angle relationship, the corresponding voltage is linked to the associated tilt angle to provide a voltage-tilt angle characteristic which then stored in a memory for subsequent use.

Abstract translation: 描述了用作微反射镜阵列器件的内置自校准系统和方法，例如作为可变焦距透镜操作。 校准方法包括以多个预定参考角度确定阵列器件中的每个微镜元件的电容值，以提供电容参考角度关系。 根据电容值，进行插值步骤以确定阵列中的每个微镜元件的中间倾斜角度。 对微镜阵列施加电压扫描，并测量阵列中每个微镜元件的电容值。 对于与电容参考角度关系中的一个值匹配的电容值，相应的电压与相关联的倾斜角度相关联，以提供电压倾斜角特性，然后将其存储在存储器中用于随后的使用。

公开(公告)号：US12196942B2

公开(公告)日：2025-01-14

申请号：US17555792

申请日：2021-12-20

Applicant: IMEC VZW

Inventor： Ziduo Lin ,  Murali Jayapala ,  Geert Vanmeerbeeck ,  Abdulkadir Yurt

IPC: G02B21/36 ,  G02B21/06 ,  H01L27/146 ,  H01L31/0304 ,  H01L31/0352

Abstract: According to an aspect of the present inventive concept there is provided a device for imaging of a microscopic object, the device comprising: an array of light sensitive areas sensitive to detect light spanning a wavelength range of at least 400-1200 nm; at least one light source comprising at least a first point of operation in which the at least one light source is configured to generate visible light, and a second point of operation in which the at least one light source is configured to generate infrared light, and being arranged to illuminate the microscopic object such that light is scattered by the microscopic object; wherein the array of light sensitive areas is configured to detect an interference pattern formed between the scattered light and non-scattered light; the device being configured to be set in a selected point of operation from the at least first and second points of operation, for detecting the interference pattern for imaging the microscopic object at a wavelength defined by the selected point of operation.

公开(公告)号：US12117342B2

公开(公告)日：2024-10-15

申请号：US17555785

申请日：2021-12-20

Applicant: IMEC VZW

Inventor： Geert Vanmeerbeeck ,  Ziduo Lin ,  Murali Jayapala ,  Abdulkadir Yurt

IPC: G01J3/28

CPC classification number: G01J3/2823 ,  G01J3/2803 ,  G01J2003/2826

Abstract: According to an aspect of the present inventive concept there is provided a device for imaging of a microscopic object, the device comprising:



an array of light sensitive areas, each being sensitive to detect light spanning a wavelength range of at least 400-1200 nm;
at least one light source configured to generate light at a plurality of wavelengths within the wavelength range, comprising at least one wavelength in a visible part of the wavelength range and at least one wavelength in a short-wave infrared, SWIR, part of the wavelength range, and arranged to illuminate the microscopic object with the generated light such that at least part of the light is scattered by the microscopic object;
wherein the device is configured to transmit the scattered light and non-scattered light, from the same light source, to the array of light sensitive areas configured to detect an interference pattern formed between the scattered light and the non-scattered light, for each wavelength.

公开(公告)号：US12025567B2

公开(公告)日：2024-07-02

申请号：US17725871

申请日：2022-04-21

Applicant: IMEC VZW

Inventor： Ziduo Lin ,  Abdulkadir Yurt ,  Murali Jayapala ,  Geert Vanmeerbeeck

IPC: G01N21/90 ,  G01N21/88

CPC classification number: G01N21/90 ,  G01N2021/8845

Abstract: An illumination system and method for illumination of a sample in a container is described herein. In some embodiments, the container includes a defined volume for receiving the sample. The illumination system includes, in some embodiments, at least one light source, a mask comprising an opaque portion, preventing light from passing through the mask, and an at least partially transparent portion, allowing light to pass through the mask. The illumination system can be adapted to be positioned such that the light generated by the light source, passing through the mask, illuminates the sample in the container. The light source and the mask are configured such that a shape, a size, and a position of a projection of the light passing through the mask, onto a plane of a bottom surface of the container, match a shape, a size, and a position of the bottom surface.

公开(公告)号：US20220350040A1

公开(公告)日：2022-11-03

申请号：US17661251

申请日：2022-04-28

Applicant: IMEC vzw

Inventor： Jiwon Lee ,  Xavier Rottenberg ,  Murali Jayapala

IPC: G01T1/24 ,  G02B6/42

Abstract: In one aspect, an optical system is disclosed. In some embodiments, the optical system includes an optical waveguide, and at least two coupling means forming at least one confocal point being located within the optical waveguide, where a first coupling means of the at least two coupling means has a first focal length, and a second coupling means of the at least two coupling means has a second focal length. In some examples, the first coupling means is configured to couple and/or focus incident light to the optical waveguide, and the second coupling means is configured to emit and/or collimate light conveyed by the optical waveguide.

公开(公告)号：US20200285194A1

公开(公告)日：2020-09-10

申请号：US16648987

申请日：2018-09-19

Applicant: IMEC VZW

Inventor： Abdulkadir Yurt ,  Richard Stahl ,  Murali Jayapala ,  Geert Vanmeerbeeck

IPC: G03H1/04

Abstract: Example embodiments relate to imaging devices for in-line holographic imaging of objects. One embodiment includes an imaging device for in-line holographic imaging of an object. The imaging device includes a set of light sources configured to output light in confined illumination cones. The imaging device also includes an image sensor that includes a set of light-detecting elements. The set of light sources are configured to output light such that the confined illumination cones are arranged side-by-side and illuminate a specific part of the object. The image sensor is arranged such that the light-detecting elements detect a plurality of interference patterns. Each interference pattern is formed by diffracted light from the object originating from a single light source and undiffracted light from the same single light source. At least a subset of the set of light-detecting elements is arranged to detect light relating to not more than one interference pattern.

公开(公告)号：US10126709B2

公开(公告)日：2018-11-13

申请号：US15727832

申请日：2017-10-09

Applicant: IMEC VZW

Inventor： Richard Stahl ,  Murali Jayapala ,  Andy Lambrechts ,  Geert Vanmeerbeeck

IPC: G03H1/04 ,  G03H1/26 ,  G01N15/14 ,  G01N15/10

Abstract: Embodiments described herein relate to lens-free imaging. One example embodiment may include a lens-free imaging device for imaging a moving sample. The lens-free imaging device may include a radiation source configured to emit a set of at least two different wavelengths towards the moving sample. The lens-free imaging device is configured to image samples for which a spectral response does not substantially vary for a set of at least two different wavelengths. The lens-free imaging device may also include a line scanner configured to obtain a line scan per wavelength emitted by the radiation source and reflected by, scattered by, or transmitted through the moving sample. The line scanner is configured to regularly obtain a line scan per wavelength. Either the radiation source or the line scanner is configured to isolate data of the at least two different wavelengths.

公开(公告)号：US20170005018A1

公开(公告)日：2017-01-05

申请号：US15193383

申请日：2016-06-27

Applicant: IMEC vzw

Inventor： Ingrid De Wolf ,  Murali Jayapala ,  Arnita Podpod ,  John Slabbekoorn ,  Carolina Blanch Perez del Notario

IPC: H01L21/66 ,  G05B19/418 ,  H01L21/677 ,  H01L21/683 ,  H01L21/02 ,  H01L21/56 ,  G06T7/00 ,  H01L21/67

CPC classification number: H01L22/20 ,  G01N21/00 ,  G01N21/31 ,  G05B19/418 ,  G05B2219/45031 ,  G06T7/001 ,  G06T2207/20081 ,  G06T2207/30148 ,  H01L21/02076 ,  H01L21/6835 ,  H01L21/6836 ,  H01L22/12 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2224/1181 ,  H01L2224/73104 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81203 ,  H01L2224/83193 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2924/00014 ,  H01L2224/27 ,  H01L2224/11

Abstract: A method for inspection of a semiconductor device is disclosed. In one aspect, the method includes performing a processing step in manufacturing of the semiconductor device, wherein a compound is at least in contact with the semiconductor device. The method also includes capturing an image on a two-dimensional image sensor of an area of at least part of the semiconductor device, wherein the captured image comprises spectral information for a plurality of positions in the area, and wherein the spectral information comprises intensity of incident electro-magnetic radiation for a plurality of different wavelength bands across a spectrum of wavelengths. The method also includes processing the spectral information of the captured image for each of the plurality of positions to determine whether residue of the compound is present in the position. The method also includes outputting information indicating positions for which residue of the compound is present for controlling a subsequent processing step in manufacturing of the semiconductor device.

Abstract translation: 公开了一种用于检查半导体器件的方法。 一方面，该方法包括在半导体器件的制造中执行处理步骤，其中化合物至少与半导体器件接触。 该方法还包括在半导体器件的至少一部分的区域的二维图像传感器上捕获图像，其中所捕获的图像包括用于该区域中的多个位置的光谱信息，并且其中光谱信息包括 在波长范围内的多个不同波长带的入射电磁辐射。 该方法还包括处理多个位置中的每一个的捕获图像的光谱信息，以确定化合物的残留物是否存在于该位置。 该方法还包括输出指示化合物的残留物的位置的信息，以控制半导体器件的制造中的后续处理步骤。