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    11.
    发明专利
    未知

    公开(公告)号：DE60123512D1

    公开(公告)日：2006-11-16

    申请号：DE60123512

    申请日：2001-04-11

    Applicant: JSR CORP

    Inventor： HAYASHI EIJI ,  NISHIKAWA MICHINORI ,  YAMADA KINJI

    IPC: C09D183/04 ,  C08G77/06 ,  C08G77/08 ,  C08G77/34 ,  C08G77/50 ,  C08K3/00 ,  C08K5/09 ,  C09D183/14 ,  H01B3/46 ,  H01L21/312 ,  H01L21/316

    Abstract: A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR )4-a (A-2) compounds represented by the following formula (2) Si(OR )4 and (A-3) compounds represented by the following formula (3) R  b (R O) 3-bSi-(R )d-Si (OR )3-cR  c (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.

    12.
    发明专利
    未知

    公开(公告)号：DE60112481D1

    公开(公告)日：2005-09-15

    申请号：DE60112481

    申请日：2001-01-16

    Applicant: JSR CORP

    Inventor： SUZUKI HIDENORI ,  KAKINOKI KATSUYUKI ,  NAKASE YOSHIHISA ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C08K13/02 ,  C08G77/34 ,  H01B3/42 ,  H01B3/44 ,  H01B3/46 ,  C08G85/00

    Abstract: A method of manufacturing an insulating film-forming material comprising a curable composition comprisING (A) an inorganic polymer compound or an organic polymer compound and (B) an organic solvent, which comprises treating the curable composition with a zeta potential-producing filter material. Because the curable composition has a very small content of alkali metals and heavy metals, the composition is suitably used for the manufacture of materials for forming insulating films which have a wide variety of applications in the electronic field.

    13.
    发明专利
    未知

    公开(公告)号：DE69631851T2

    公开(公告)日：2005-01-05

    申请号：DE69631851

    申请日：1996-03-27

    Applicant: JSR CORP

    Inventor： NISHIKAWA MICHINORI ,  MIYAMOTO TSUYOSHI ,  KAWAMURA SHIGEO ,  YASUDA KYOUYU ,  MUTSUGA YASUAKI ,  MATSUKI YASUO

    IPC: C09K19/56 ,  G02F1/1337

    Abstract: A liquid crystal aligning agent contains (1) at least one polymer selected from the group consisting of a polyamic acid obtainable by a reaction between a tetracarboxylic acid dianhydride and a diamine compound and an imidized polymer obtainable by cyclization with dehydration of the polyamic acid; (2) at least one first solvent selected from the group consisting of N-alkyl-2-pyrrolidones, lactones, and 1,3-dialkyl-2-imidazolidinones; (3) at least one second solvent selected from the group consisting of: (a) a first compound represented by general formula (I) wherein R is an alkylene group having 2 or 3 carbon atoms; R is an alkyl group having 1 to 4 carbon atoms an acetyl group or a propionyl group; R is an alkyl group having 1 to 3 carbon atoms, an alkoxyl group having 1 to 3 carbon atoms, or a halogen atom; a is 1 or 2; and b is 0 or integers of from 1 to 5; and (b) a second compound represented by general formula (II) wherein R is an alkyl group having 1 to 4 carbon atoms; R is an alkylene group having 2 or 3 carbon atoms; R is an alkyl group having 1 to 3 carbon atoms; and c is 1 or 2.

    16.
    发明专利
    未知

    公开(公告)号：DE60130953T2

    公开(公告)日：2008-07-17

    申请号：DE60130953

    申请日：2001-08-27

    Applicant: JSR CORP

    Inventor： NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C09D171/00 ,  H01L21/304 ,  B24B37/04 ,  C08G65/40 ,  C08L71/00 ,  H01L21/32 ,  H01L21/321 ,  H01L21/768

    Abstract: A chemical mechanical polishing stopper film comprising at least one organic polymer, said film having a dielectric constant of 4 or lower, and a chemical mechanical polishing method. The chemical mechanical polishing method comprises forming a chemical mechanical polishing stopper film comprising at least one organic polymer on an insulating film so that the stopper film is interposed between the insulating film and a metal film to be removed by chemical mechanical polishing, and then removing the metal film with a chemical mechanical polishing slurry.

    17.
    发明专利
    未知

    公开(公告)号：DE60216682T2

    公开(公告)日：2007-10-04

    申请号：DE60216682

    申请日：2002-09-24

    Applicant: JSR CORP

    Inventor： NISHIKAWA MICHINORI ,  SEKIGUCHI MANABU ,  SHIOTA ATSUSHI ,  YAMADA KINJI

    IPC: B32B7/02 ,  C09D183/04 ,  B05D7/00 ,  B05D7/24 ,  C08G77/04 ,  C08G77/50 ,  C09D183/02 ,  C09D183/06 ,  C09D183/14 ,  H01L21/31 ,  H01L21/312 ,  H01L21/316 ,  H01L21/768 ,  H01L23/522

    Abstract: A stacked film, a method for the production of the stacked film, an insulating film comprising the stacked film, and a substrate for semiconductor, using the insulating film. The stacked film comprises films of two or more kinds of alkoxysilane hydrolysis condensates having 5 nm or more difference in a mean radius of gyration, or films of alkoxysilane hydrolysis condensate having 0.3 or more difference in the dielectric constant. The stacked film is obtained by applying a coating solution comprising (B) a compound having a mean radius of gyration of less than 10 nm, and then applying a coating solution comprising (A) a compound having a mean radius of gyration of from 10 to 30 nm, followed by heating. The stacked film provides a dielectric film (substrate for semiconductor) having superior adhesion to a CVD film.

    19.
    发明专利
    未知

    公开(公告)号：DE69732949D1

    公开(公告)日：2005-05-12

    申请号：DE69732949

    申请日：1997-05-15

    Applicant: JSR CORP

    Inventor： NISHIKAWA MICHINORI ,  YASUDA KYOUYU ,  KAWAMURA SHIGEO ,  TOYOSHIMA TSUKASA ,  MATSUKI YASUO ,  WAKABAYASHI KENGO

    IPC: C08G73/10 ,  G02F1/1337

    Abstract: A liquid crystal alignment agent containing at least two kinds of polymers selected from the group consisting of polyamic acids and imidized polymers and having a structure obtained by dehydration and ring closure of polyamic acid. In the at least two kinds of polymers contained in the liquid crystal alignment agent, the polymer of higher imidization degree has a smaller surface free energy. The liquid crystal alignment agent gives a liquid crystal display device having less stuck image and high pretilt angle.

    20.
    发明专利
    未知

    公开(公告)号：DE60105670D1

    公开(公告)日：2004-10-28

    申请号：DE60105670

    申请日：2001-02-01

    Applicant: JSR CORP

    Inventor： OKADA TAKASHI ,  NISHIKAWA MICHINORI ,  YAMADA KINJI

    IPC: C09D5/25 ,  C08G65/40 ,  C08J5/18 ,  C08L71/00 ,  H01B3/30 ,  H05K3/46

    Abstract: A composition for film formation comprising a polymer having repeating structural units represented by the formula (1) , the structural unit having one or more alkyl groups therein, and an insulating film obtained by applying the composition for film formation to a substrate and heating the coating film.

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