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    MEMBRANE-ELECTRODE ASSEMBLY FOR DIRECT METHANOL TYPE FUEL CELL AND PROTON CONDUCTIVE MEMBRANE
    1.
    发明专利
    MEMBRANE-ELECTRODE ASSEMBLY FOR DIRECT METHANOL TYPE FUEL CELL AND PROTON CONDUCTIVE MEMBRANE 未知

    公开(公告)号：CA2467613C

    公开(公告)日：2009-07-28

    申请号：CA2467613

    申请日：2004-05-18

    Applicant: JSR CORP

    Inventor： OKADA TAKASHI ,  GOTO KOHEI

    IPC: C08G61/10 ,  H01M8/02 ,  B01D71/72 ,  B01D71/82 ,  C08G61/02 ,  C08G61/12 ,  C08J5/22 ,  C08L101/02 ,  H01M2/16 ,  H01M4/86 ,  H01M8/10

    Abstract: A membrane-electrode assembly for direct methanol type fuel cell and a prot on conductive membrane for direct methanol type fuel cell are disclosed. The membrane-electrode assembly comprises a negative electrode and a positive electrode assembled via a proton conductive membrane, the negative electrode being provided with a negative electrode-side separator having a mechanism for feeding a methanol aqueous solution as a fuel, the positive electrode being provided with a positive electrode-side separator having a mechanism for feeding an oxidizing agent gas, and the proton conductive membrane comprising a polymer containing 0.05-99.95 mol% o f a repeating constitutional unit represented by the formula (A), and 0.05-99.95 mol% of a repeating constitutional unit represented by the formula (B).

    2.
    发明专利
    未知

    公开(公告)号：DE60032997D1

    公开(公告)日：2007-03-08

    申请号：DE60032997

    申请日：2000-11-08

    Applicant: JSR CORP

    Inventor： AKIIKE TOSHIYUKI ,  PATZ MATTHIAS ,  TAKAHASHI MASAYUKI ,  GOTO KOHEI ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C08G61/02 ,  H01L21/312 ,  C08F38/00 ,  C08G61/00 ,  C08J5/18 ,  C09D165/00

    Abstract: A diyne-containing (co)polymer which is soluble in organic solvents, has excellent processability, and gives a cured coating film excellent in heat resistance, solvent resistance, low-dielectric characteristics, and mechanical strength; processes for producing the same; and a cured film. The diyne-containing (co)polymer contains at least 10 mol% repeating units represented by the following formula (1) and has a weight-average molecular weight of from 500 to 1,000,000: wherein Y represents a specific bivalent organic group; Ar represents a bivalent organic group; and n represents 0 or 1.

    SULFONIC GROUP-CONTAINING POLYARYLENE BLOCK COPOLYMER, PROCESS FOR PRODUCTION THEREOF, SOLID POLYMER ELECTROLYTE AND PROTON CONDUCTIVE MEMBRANE
    4.
    发明专利
    SULFONIC GROUP-CONTAINING POLYARYLENE BLOCK COPOLYMER, PROCESS FOR PRODUCTION THEREOF, SOLID POLYMER ELECTROLYTE AND PROTON CONDUCTIVE MEMBRANE 未知

    公开(公告)号：CA2517484C

    公开(公告)日：2009-07-07

    申请号：CA2517484

    申请日：2005-08-29

    Applicant: JSR CORP

    Inventor： OKADA TAKASHI ,  GOTO KOHEI ,  SHINODA MAYUMI ,  OTSUKI TOSHIHIRO ,  YOSHII KIMIHIKO ,  KONNO YOUSUKE

    IPC: C08G61/12 ,  C08F287/00 ,  C08J5/22

    Abstract: The present invention provides a sulfonic group-containing polyarylene block copolymer superior to the perfluoroalkylsulfonic acid polymers in cost, conductive properties and processability, a process for producing the copolymer, a solid polymer electrolyte and a proton conductive membrane. The sulfonic group-containing polyarylene block copolymer includes a polymer segment with an ion conductive component represented by the formula (A) and at least one polymer segment without an ion conductive component represented by the formulae (B-1), (B-3) and the like and containing an aromatic ring bonded at the meta-positions or ortho-positions: (see formula A) (see formula B-1) (see formula B-3) wherein X is a single bond, -CO-, -SO2- or the like; W is a single bond, -CO-, -SO2- or the like; Q is a single bond, -O-, -S- or the like; J is a single bond, -CO-, -SO2- or the like; and R1 to R24 are each a hydrogen atom, a fluorine atom, an alkyl group or the like.

    6.
    发明专利
    未知

    公开(公告)号：DE602005006914D1

    公开(公告)日：2008-07-03

    申请号：DE602005006914

    申请日：2005-08-25

    Applicant: JSR CORP

    Inventor： OKADA TAKASHI ,  SHINODA MAYUMI ,  YOSHII KIMIHIKO ,  KONNO YOUSUKE ,  OTSUKI TOSHIHIRO ,  GOTO KOHEI

    IPC: C08G61/12 ,  B01D71/80 ,  C08J5/22 ,  C08L65/00 ,  H01M8/10

    Abstract: The present invention provides a sulfonic group-containing polyarylene block copolymer superior to the perfluoroalkylsulfonic acid polymers in cost, conductive properties and processability, a process for producing the copolymer, a solid polymer electrolyte and a proton conductive membrane. The sulfonic group-containing polyarylene block copolymer includes a polymer segment with an ion conductive component represented by the formula (A) and at least one polymer segment without an ion conductive component represented by the formulae (B-1), (B-3) and the like and containing an aromatic ring bonded at the meta-positions or ortho-positions: wherein X is a single bond, -CO-, -SO 2 - or the like; W is a single bond, -CO-, -SO 2 - or the like; Q is a single bond, -O-, -S- or the like; J is a single bond, -CO-, -SO 2 - or the like; and R 1 to R 24 are each a hydrogen atom, a fluorine atom, an alkyl group or the like.

    7.
    发明专利
    未知

    公开(公告)号：DE60130953D1

    公开(公告)日：2007-11-29

    申请号：DE60130953

    申请日：2001-08-27

    Applicant: JSR CORP

    Inventor： NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C09D171/00 ,  H01L21/304 ,  B24B37/04 ,  C08G65/40 ,  C08L71/00 ,  H01L21/32 ,  H01L21/321 ,  H01L21/768

    Abstract: A chemical mechanical polishing stopper film comprising at least one organic polymer, said film having a dielectric constant of 4 or lower, and a chemical mechanical polishing method. The chemical mechanical polishing method comprises forming a chemical mechanical polishing stopper film comprising at least one organic polymer on an insulating film so that the stopper film is interposed between the insulating film and a metal film to be removed by chemical mechanical polishing, and then removing the metal film with a chemical mechanical polishing slurry.

    8.
    发明专利
    未知

    公开(公告)号：DE60112481D1

    公开(公告)日：2005-09-15

    申请号：DE60112481

    申请日：2001-01-16

    Applicant: JSR CORP

    Inventor： SUZUKI HIDENORI ,  KAKINOKI KATSUYUKI ,  NAKASE YOSHIHISA ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C08K13/02 ,  C08G77/34 ,  H01B3/42 ,  H01B3/44 ,  H01B3/46 ,  C08G85/00

    Abstract: A method of manufacturing an insulating film-forming material comprising a curable composition comprisING (A) an inorganic polymer compound or an organic polymer compound and (B) an organic solvent, which comprises treating the curable composition with a zeta potential-producing filter material. Because the curable composition has a very small content of alkali metals and heavy metals, the composition is suitably used for the manufacture of materials for forming insulating films which have a wide variety of applications in the electronic field.

    10.
    发明专利
    未知

    公开(公告)号：DE60032997T2

    公开(公告)日：2007-11-08

    申请号：DE60032997

    申请日：2000-11-08

    Applicant: JSR CORP

    Inventor： AKIIKE TOSHIYUKI ,  PATZ MATTHIAS ,  TAKAHASHI MASAYUKI ,  GOTO KOHEI ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

    IPC: C08G61/02 ,  H01L21/312 ,  C08F38/00 ,  C08G61/00 ,  C08J5/18 ,  C09D165/00

    Abstract: A diyne-containing (co)polymer which is soluble in organic solvents, has excellent processability, and gives a cured coating film excellent in heat resistance, solvent resistance, low-dielectric characteristics, and mechanical strength; processes for producing the same; and a cured film. The diyne-containing (co)polymer contains at least 10 mol% repeating units represented by the following formula (1) and has a weight-average molecular weight of from 500 to 1,000,000: wherein Y represents a specific bivalent organic group; Ar represents a bivalent organic group; and n represents 0 or 1.

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