公开(公告)号：KR20070111354A

公开(公告)日：2007-11-21

申请号：KR20070047005

申请日：2007-05-15

Applicant: JSR CORP

Inventor： KUMAGAI TSUTOMU ,  FUKUMA SATOSHI ,  NISHIKAWA MICHINORI

IPC: C09K19/56

CPC classification number: C09K19/56 ,  C08G73/1003 ,  C08L79/08 ,  G02F1/133723

Abstract: A vertical type liquid crystal aligning agent is provided to ensure excellent voltage maintenance characteristics in a vertical type liquid crystal device while exhibiting good coatability on a substrate. A vertical type liquid crystal aligning agent comprises a polymer having at least one of amic acid repeating units represented by the following formula 1a and imide repeating units represented by the following formula 2, wherein Q1 in formula 1a and Q2 in formula 1b contains at least one divalent organic group represented by the following formulae 2a and 2b, and at least one divalent organic group represented by the formula of -X2-3-X2. In formulae 1a and 1b, each of P1 and P2 represents a tetravalent organic group forming a tetracarboxylic acid, and each of Q1 and Q2 represents a divalent organic group forming a diamine. In formulae 2a and 2b, X1 is a single bond, -O-, -CO-, -COO-, -OCO-, -NHCO-, -CONH-, -S-, methylene, C2-C6 alkylene or phenylene; R1 is a C10-20 alkyl, C4-C40 alicyclic monovalent organic group or C6-C20 fluorine-containing monovalent organic group; and R2 is a C4-C40 alicyclic divalent organic group or C5-C30 fluorine-containing divalent organic group. In the formula of -X2-3-X2, X2 independently represents methylene or a C2-C20 alkylene; and R3 is an aromatic ring-containing backbone, organosiloxane backbone, divalent organic group represented by the formula of -R-(O-C2H4)n-O-R- (wherein R is a C2-C5 alkylene and n is 1-100), a divalent organic group represented by the formula of -R-(O-C2H4)n-O-R- (wherein R is a C2-C5 alkylene, and n is 1-50), C4-C40 alicyclic ring backbone-containing divalent organic group.

Abstract translation: 提供了垂直型液晶取向剂，以确保在垂直型液晶装置中优异的电压维持特性，同时在基板上表现出良好的涂布性。 垂直型液晶取向剂包括具有由下式1a表示的至少一种酰胺酸重复单元和由下式2表示的酰亚胺重复单元的聚合物，其中式1a中的Q1和式1b中的Q2包含至少一个 由下式2a和2b表示的二价有机基团和由式-X2-3-X2表示的至少一种二价有机基团。 在式1a和1b中，P1和P2各自表示形成四羧酸的四价有机基团，Q1和Q2各自表示形成二胺的二价有机基团。 在式2a和2b中，X 1是单键，-O - ， - CO - ， - COO - ， - OCO - ， - NHCO - ， - CONH - ， - S-，亚甲基，C 2 -C 6亚烷基或亚苯基; R1是C10-20烷基，C4-C40脂环族一价有机基团或C6-C20含氟一价有机基团; R2为C4-C40脂环族二价有机基团或C5-C30含氟二价有机基团。 在-X2-3-X2的式中，X2独立地表示亚甲基或C2-C20亚烷基; R3为含芳香环的骨架，有机硅氧烷骨架，由式-R-（O-C 2 H 4）nOR-表示的二价有机基团（其中R为C2-C5亚烷基且n为1-100），二价 由式-R-（O-C 2 H 4）nOR-（其中R为C 2 -C 5亚烷基，n为1-50）表示的有机基团，含有C 4 -C 40脂环族骨架的二价有机基团。

公开(公告)号：KR20070080578A

公开(公告)日：2007-08-10

申请号：KR20070012480

申请日：2007-02-07

Applicant: JSR CORP

Inventor： KUMAGAI TSUTOMU ,  NISHIKAWA MICHINORI

IPC: C09K19/56 ,  C09K19/00

CPC classification number: C09K19/56 ,  C08G73/10 ,  C08L79/08 ,  G02F1/133723

Abstract: Provided are a vertical alignment liquid crystal aligning agent which has a volume intrinsic resistance of 1x10^13 Ф.cm or less after sintering at a high temperature, and a vertical alignment liquid crystal display device containing the liquid crystal aligning agent. The vertical alignment liquid crystal aligning agent comprises a poly(amide acid) polymer and/or a polyimide having a volume intrinsic resistance of a film of 1x10^12 Ф.cm after sintering at a high temperature. Preferably the vertical alignment liquid crystal aligning agent contains a divalent organic group of 8 mol% or more derived from a diamine represented by a formula I-1 or I-2 to the total divalent organic group, wherein X is a single bond, -O-, -CO-, -COO-, -OCO-, -NHCO-, -CONH-, -S-, a methylene group, a C2-C6 alkylene group, or a phenylene group; A1 is a divalent organic group having a C10-C20 alkyl group or a C4-C40 alicyclic structure, or a C6-C20 divalent organic group having a fluorine atom; and A2 is a monovalent organic group having a C4-C40 alicyclic structure.

Abstract translation: 本发明提供一种垂直取向液晶取向剂，其在高温烧结后的体积固有电阻为1×10 13 cm -3以下，以及含有液晶取向剂的垂直取向液晶显示装置。 垂直取向液晶取向剂包括在高温烧结后具有1×10 12 12 cm cm的膜的体积固有电阻的聚酰胺酸聚合物和/或聚酰亚胺。 优选地，垂直取向液晶取向剂含有衍生自由式I-1或I-2表示的二胺与总二价有机基团的8摩尔％以上的二价有机基团，其中X为单键，-O - ， - CO - ， - COO - ， - OCO - ， - NHCO - ， - CONH-，-S-，亚甲基，C2-C6亚烷基或亚苯基; A1是具有C10-C20烷基或C4-C40脂环结构的二价有机基团或具有氟原子的C6-C20二价有机基团; A2是具有C4-C40脂环结构的一价有机基团。

公开(公告)号：DE60217247T2

公开(公告)日：2007-10-04

申请号：DE60217247

申请日：2002-09-25

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  SEKIGUCHI MANABU ,  PATZ MATTHIAS ,  SHIOTA ATSUSHI ,  YAMADA KINJI

IPC: C09D183/04 ,  H01L21/31 ,  B05D3/02 ,  B32B9/04 ,  C08G65/40 ,  C09D165/00 ,  C09D171/00 ,  C09D183/14 ,  H01L21/312

Abstract: A stacked film for semiconductor having superior adhesion to a coating film formed by a CVD process in, for example, semiconductor devices, an insulating film having the stacked film and a substrate for semiconductor using the insulating film are disclosed. The stacked film comprises (A) a film of an organic compound having a carbon content of 60 % by weight or more and (B) a film prepared by heating a hydrolytic condensate obtained by hydrolysis and condensation of at least one compound selected from the group consisting of specific compounds represented by the general formulae (51) to (54) described hereinabove.

公开(公告)号：DE60032997D1

公开(公告)日：2007-03-08

申请号：DE60032997

申请日：2000-11-08

Applicant: JSR CORP

Inventor： AKIIKE TOSHIYUKI ,  PATZ MATTHIAS ,  TAKAHASHI MASAYUKI ,  GOTO KOHEI ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

IPC: C08G61/02 ,  H01L21/312 ,  C08F38/00 ,  C08G61/00 ,  C08J5/18 ,  C09D165/00

Abstract: A diyne-containing (co)polymer which is soluble in organic solvents, has excellent processability, and gives a cured coating film excellent in heat resistance, solvent resistance, low-dielectric characteristics, and mechanical strength; processes for producing the same; and a cured film. The diyne-containing (co)polymer contains at least 10 mol% repeating units represented by the following formula (1) and has a weight-average molecular weight of from 500 to 1,000,000: wherein Y represents a specific bivalent organic group; Ar represents a bivalent organic group; and n represents 0 or 1.

公开(公告)号：DE60026635D1

公开(公告)日：2006-05-11

申请号：DE60026635

申请日：2000-04-11

Applicant: JSR CORP

Inventor： SUGITA HIKARU ,  SAITO AKIO ,  YAMADA KINJI ,  NISHIKAWA MICHINORI ,  OHTA YOSHIHISA ,  YUUMOTO YOSHIJI

IPC: G03F7/09 ,  H01L21/027 ,  C08K5/54 ,  C08L83/04 ,  C08L83/14 ,  G03F7/075 ,  G03F7/11

Abstract: Disclosed are a composition for a resist underlayer film excellent in reproducibility of a resist pattern, excellent in adhesion to a resist, excellent in resistance to a developing solution used after exposure of the resist and decreased in film loss in oxygen ashing of the resist; and a method for producing the same, the composition comprising: both or either of a hydrolysate and a condensate of (A) at least one compound selected from the group consisting of (A-1) a compound represented by the following general formula (1): R aSi(OR )4-a wherein R represents a hydrogen atom, a fluorine atom or a univalent organic group, R represents a univalent organic group, and a represents an integer of 0 to 2, and (A-2) a compound represented by the following general formula (2): R b(R O)3-bSi-(R )d-Si(OR )3-cR c wherein R , R , R and R , which may be the same or different, each represent univalent organic groups, b and c, which may be the same or different, each represent integers of 0 to 2, R represents an oxygen atom or -(CH2)n-, d represents 0 or 1, and n represents an integer of 1 to 6; and (B) a compound generating an acid by ultraviolet irradiation and/or heating.

公开(公告)号：DE60200679T2

公开(公告)日：2005-08-25

申请号：DE60200679

申请日：2002-04-25

Applicant: JSR CORP

Inventor： OKADA TAKASHI ,  SINOHARA NORIYASU ,  SHIRATO KAORI ,  EBISAWA MASAHIKO ,  NISHIKAWA MICHINORI ,  YAMADA KINJI

IPC: C08J5/18 ,  C08F38/02 ,  C08G61/00 ,  C08G61/02 ,  C08G61/12 ,  C09D165/00 ,  C09D201/00 ,  C08F38/00 ,  C08F238/00

Abstract: a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1): wherein Z and Y are as defined hereinabove.t

公开(公告)号：DE60230830D1

公开(公告)日：2009-03-05

申请号：DE60230830

申请日：2002-03-25

Applicant: JSR CORP

Inventor： SHINOHARA NORIYASU ,  SHIRATO KAORI ,  NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

IPC: C08L65/00 ,  C09D165/00 ,  C08G61/02 ,  C08G61/12 ,  C08L71/12 ,  C09D171/00 ,  C09D171/12 ,  C09D183/07 ,  H01L21/312 ,  H05K1/00

Abstract: A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly (arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.

公开(公告)号：DE60130953D1

公开(公告)日：2007-11-29

申请号：DE60130953

申请日：2001-08-27

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  OKADA TAKASHI ,  YAMADA KINJI

IPC: C09D171/00 ,  H01L21/304 ,  B24B37/04 ,  C08G65/40 ,  C08L71/00 ,  H01L21/32 ,  H01L21/321 ,  H01L21/768

Abstract: A chemical mechanical polishing stopper film comprising at least one organic polymer, said film having a dielectric constant of 4 or lower, and a chemical mechanical polishing method. The chemical mechanical polishing method comprises forming a chemical mechanical polishing stopper film comprising at least one organic polymer on an insulating film so that the stopper film is interposed between the insulating film and a metal film to be removed by chemical mechanical polishing, and then removing the metal film with a chemical mechanical polishing slurry.

公开(公告)号：DE60217247D1

公开(公告)日：2007-02-15

申请号：DE60217247

申请日：2002-09-25

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  SEKIGUCHI MANABU ,  PATZ MATTHIAS ,  SHIOTA ATSUSHI ,  YAMADA KINJI

IPC: C09D183/04 ,  H01L21/31 ,  B05D3/02 ,  B32B9/04 ,  C08G65/40 ,  C09D165/00 ,  C09D171/00 ,  C09D183/14 ,  H01L21/312

Abstract: A stacked film for semiconductor having superior adhesion to a coating film formed by a CVD process in, for example, semiconductor devices, an insulating film having the stacked film and a substrate for semiconductor using the insulating film are disclosed. The stacked film comprises (A) a film of an organic compound having a carbon content of 60 % by weight or more and (B) a film prepared by heating a hydrolytic condensate obtained by hydrolysis and condensation of at least one compound selected from the group consisting of specific compounds represented by the general formulae (51) to (54) described hereinabove.

公开(公告)号：DE60216682D1

公开(公告)日：2007-01-25

申请号：DE60216682

申请日：2002-09-24

Applicant: JSR CORP

Inventor： NISHIKAWA MICHINORI ,  SEKIGUCHI MANABU ,  SHIOTA ATSUSHI ,  YAMADA KINJI

IPC: B32B7/02 ,  C09D183/04 ,  B05D7/00 ,  B05D7/24 ,  C08G77/04 ,  C08G77/50 ,  C09D183/02 ,  C09D183/06 ,  C09D183/14 ,  H01L21/31 ,  H01L21/312 ,  H01L21/316 ,  H01L21/768 ,  H01L23/522

Abstract: A stacked film, a method for the production of the stacked film, an insulating film comprising the stacked film, and a substrate for semiconductor, using the insulating film. The stacked film comprises films of two or more kinds of alkoxysilane hydrolysis condensates having 5 nm or more difference in a mean radius of gyration, or films of alkoxysilane hydrolysis condensate having 0.3 or more difference in the dielectric constant. The stacked film is obtained by applying a coating solution comprising (B) a compound having a mean radius of gyration of less than 10 nm, and then applying a coating solution comprising (A) a compound having a mean radius of gyration of from 10 to 30 nm, followed by heating. The stacked film provides a dielectric film (substrate for semiconductor) having superior adhesion to a CVD film.