11.
    发明专利
    未知

    公开(公告)号:FR2817629A1

    公开(公告)日:2002-06-07

    申请号:FR0015625

    申请日:2000-12-01

    Applicant: MEMSCAP

    Abstract: The invention concerns a method for making an optical switch (1) comprising: an alignment structure (2) comprising several grooves (3, 4) produced on the surface (10) of a silicon-on-insulator substrate (9), each groove (3, 4) being designed to receive an optical fibre adapted to emit a light beam; a reflecting structure (6) adapted to move between two positions, namely: a reflecting position, wherein the reflecting structure (6) is designed to redirect the optical beam derived from a first optical fibre (45) towards a second optical fibre (46); a transmitting position, wherein the reflecting structure (6) is designed to enable the beam (45) of the first optical fibre (45) to continue its propagation in its initial direction. The invention is characterised in that it comprises two successive etching steps, namely: a step which consists in dry anisotropic etching of the substrate to define the general shape (17) of the reflecting structure (6); a subsequent wet etching step which enables both to define the final shape of the reflecting structure (6) and to define an alignment structure (2); an etching step carried out on the surface of the substrate opposite the reflecting structure, enabling to define the shape of deformable zones connecting the reflecting structure to the rest of the substrate; a final step which consists in eliminating the silicon dioxide layer enabling to release the reflecting structure.

    Matrix of optical switches
    15.
    发明专利

    公开(公告)号:FR2838527A1

    公开(公告)日:2003-10-17

    申请号:FR0204514

    申请日:2002-04-11

    Applicant: MEMSCAP

    Abstract: The matrix comprises a set of cells each having a reflecting structure (12,14) so that it can reflect a beam issued from one side (20) of the matrix in the direction of an adjacent side. The reflecting structures have different orientations within the matrix, and each reflecting structure is orientated in parallel to the bisector (11) of a corner (16) of the matrix nearer the relevant mirror. The matrix is designed to accommodate a set of input fibres and a set of output fibres, for functioning as an optical mixer, that is an optical cross connect (OXC). The matrix is designed so to accommodate two sets of input fibres and two sets of output fibres, for functioning as an extraction/insertion multiplexer, that is an odd-drop multiplexer (ADM). The matrix comprises four rows and four columns, and 16 differently orientated mirrors in groups. The four mirrors situated near the corner (16) are parallel to the bisector (11), and the orientations of other mirrors are determined with respect to the bisectors of other corners, that is the common bisector (11) of corners (16,17) and the common bisector (12) of corners (18,19). Two input fibres (E1, E2) are placed on the side (20) and the other two input fibres (E3, E4) are placed on the opposite side (21). Two output fibres (S1, S2) are placed on the side (22), and the other two output fibres (S3, S4) are placed on the opposite side. The matrix has a symmetry with respect to the midpoint (25). In the case of a beam (28) the optical path is substantially equal to 3 times the step (p) of each cell, and for a beam (29) it is substantially equal to 5 times the step (p). The difference between the maximum and the minimum optical paths is 2 times the step, compared to the value of 6 for the prior art matrix.

    PROCEDE DE FABRICATION D'UN COMPOSANT OPTIQUE MICROELECTROMECANIQUE

    公开(公告)号:CA2394108A1

    公开(公告)日:2003-01-31

    申请号:CA2394108

    申请日:2002-07-18

    Applicant: MEMSCAP

    Inventor: HELIN PHILIPPE

    Abstract: Procédé de fabrication d'un composant optique microélectromécanique (1), réalisé à partir d'un de substrat de silicium, comprenant : .cndot. des guides de propagation optique (2-5); .cndot. une paroi mobile (6) par rapport aux guides de propagation (2-5); .cndot. un actionneur électrostatique (10) associé à des moyens de rappel formés par au moins une poutre (15, 16), apte à provoquer le déplacement de la paro i mobile (6) par rapport au reste du substrat Conformément à l'invention, .cndot. le substrat utilisé est en silicium monocristallin dont les plans cristallographiques (111) sont parallèles au plan du substrat ; .cndot..cndot. le procédé comporte une première série d'étapes de gravure ionique réactive profonde pendant lesquelles, sont définies, avec des valeurs différentes, le s hauteurs de la paroi mobile (6), des électrodes de l'actionneur (11, 12), et des poutres ( 15, 16) des moyens de rappel de l'actionneur; .cndot. le procédé comporte une seconde étape de gravure humide, permettant de libérer la paroi mobile (6), les électrodes (11, 12) et les poutres (15, 16) du reste du substrat.

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