OPTICAL SWITCHING MATRIX AND ITS MANUFACTURING METHOD

    公开(公告)号:JP2004004713A

    公开(公告)日:2004-01-08

    申请号:JP2003100764

    申请日:2003-04-03

    Applicant: MEMSCAP

    Abstract: PROBLEM TO BE SOLVED: To provide an optical switching matrix in which the insertion loss with respect to a propagating beam is reduced. SOLUTION: The optical switching matrix includes at least one set of input optical fibers (12) and at least one set of output optical fibers (14), which are arranged so as to be perpendicular each other, a set of movable mirrors (5, 13), which are arranged at the cross points of the directions defined by a plurality of optical fibers, and a set of channels and a set of channels formed between the mirrors. Another set of mirrors are formed on a first wafer (2); the first wafer is covered with a second wafer (21); a plurality of channels (38) are formed between protruded parts (34) under the second substrate wafer; and the protruded parts are provided with housings (33), in which the movable mirrors can be moved. COPYRIGHT: (C)2004,JPO

    ARTICLE COMPRISING AN INTEGRATED MARKING DEVICE, AND MARK-DETECTION APPARATUS
    2.
    发明申请
    ARTICLE COMPRISING AN INTEGRATED MARKING DEVICE, AND MARK-DETECTION APPARATUS 审中-公开
    包括集成标记装置的文章和标记检测装置

    公开(公告)号:WO2005022452A2

    公开(公告)日:2005-03-10

    申请号:PCT/FR2004050384

    申请日:2004-08-19

    CPC classification number: G06K19/063 G06K19/14 G06K19/16

    Abstract: The invention relates to a marking device (1) comprising an element which is made from a semi-conductor material having patterns (2-4, 12-14) which are hollowed out of the face thereof, the arrangement of said patterns being representative of at least one piece of information. The depth of the patterns (2-4, 12-14) can vary from one pattern to another and can adopt a plurality of different values which are representative of an additional piece of information. The invention also relates to an apparatus which is used to detect such marks and to articles having a marking device of said type integrated into the material forming same.

    Abstract translation: 本发明涉及一种标记装置(1),其包括由半导体材料制成的元件,所述元件具有从其表面挖空的图案(2-4,12-14),所述图案的布置代表 至少有一条信息。 图案(2-4,12-14)的深度可以从一个图案到另一个图案变化,并且可以采用表示附加信息的多个不同值。 本发明还涉及用于检测这种标记的设备以及具有集成到形成该标记的材料的所述类型的标记设备的物品。

    METHOD OF MANUFACTURING MICROELECTROMECHANICAL OPTICAL COMPONENT

    公开(公告)号:JP2003149568A

    公开(公告)日:2003-05-21

    申请号:JP2002222091

    申请日:2002-07-30

    Applicant: MEMSCAP

    Inventor: HELIN PHILIPPE

    Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a microelectromechanical optical component that is equipped with two optical transmission lines, a moving wall part, and an electrostatic actuator which is equipped with a plurality of electrodes made relatively movable and has one electrode mechanically connected to the moving wall part and the other electrode fixed to the remaining part of a substrate and further equipped with a return means formed of a beam part. SOLUTION: The (111) surface of single-crystal silicon forming the substrate is made parallel to a surface 20 of the substrate, the heights of the moving wall part 6, electrodes 11 and 12, and beam parts 15 and 16 are defined with different height values through a series of 1st deep reactive ion etching processes, and the moving wall part 6, electrodes 11 and 12, and beam parts 15 and 16 can be made free from the remaining part of the substrate through a 2nd wet etching process.

    6.
    发明专利
    未知

    公开(公告)号:FR2828185A1

    公开(公告)日:2003-02-07

    申请号:FR0110228

    申请日:2001-07-31

    Applicant: MEMSCAP

    Inventor: HELIN PHILIPPE

    Abstract: A method for fabricating of an optical micro-electromechanical component from a monocrystalline silicon substrate whose crystallographic planes (111) are parallel to the plane of the substrate involves deep reactive ionic engraving and wet engraving stages to realize a control mobile element. A method for the fabrication of an optical micro-electromechanical component (1) from a silicon substrate incorporating optical propagation guides (2 - 5), a mobile partition (6) and an electrostatic driver (10) associated with a return mechanism formed by at least one strut (15, 16) able to displace the mobile partition with respect to the substrate, is characterized in that: (a) the substrate used is of monocrystalline silicon of which the crystallographic planes (111) are parallel to the plane of the substrate; (b) the method incorporates a first series of stages of deep reactive ionic engraving during which the heights, with different values, of the mobile partition, the electrodes (11, 12) of the driver and the struts of the return mechanism are defined; (c) the method incorporates a second stage of wet engraving, allowing the liberation of the mobile partition, the electrodes and the return mechanism struts from the rest of the substrate. An Independent claim is also included for a micro-electromechanical optical component made from a silicon substrate chip by this method.

    Variable optical attenuator (VOA), comprises shutters laid out in thickness of mobile part of an actuator which is displaced rotationally by interaction with matching stationary parts

    公开(公告)号:FR2841995A1

    公开(公告)日:2004-01-09

    申请号:FR0208373

    申请日:2002-07-04

    Applicant: MEMSCAP

    Abstract: The variable optical attenuator (1) comprises a microelectromechanical structure implemented on a substrate (2), including at least one shutter (31,33,34) whose position can be varied by an actuator with a mobile part (10) combined with the shutters in the form of beams with notches so that the shutter (31) interacts with a light beam (6) propagating from an input optical fibre (3) towards an output optical fibre (4). The mobile part (10) of the actuator can be displaced rotationally around an axis (11) perpendicular to the plane of the substrate, and the axis (11) is also an axis of rotational symmetry of the mobile part. The shutters are laid out in the thickness of the mobile part so to interact with the light beam (6) which propagates substantially in parallel with the rotational axis of the mobile part. The mobile part (10) of the actuator comprises several, in particular 3, zones (27) which cooperate with complementary zones (28) stationary with respect to the substrate, and the zones are distributed in angle around the rotational axis (11). In particular, the zones (27) are of electrostatic combs matching complementary combs of the stationary zones (28). The mobile part (10) is linked to a fixed central platform (24) situated at the center of gravity of the mobile part, and an application of a polarization voltage to the pairs of combs (27,28) causes a rotational motion including slight bending of beams (23) so that the shutter (31) intercepts the light beam (6) at the level of angular notch section. The middle beams (23) joined to the central platform (24) also serve to return the mobile part to its stationary position. The attenuator (claimed) functions by transmission, or by reflection when the shutter (31) comprises a reflecting part.

    MATRICE DE COMMUTATEURS OPTIQUES ET PROCEDE DE FABRICATION D'UNE TELLE MATRICE

    公开(公告)号:CA2423210A1

    公开(公告)日:2003-10-11

    申请号:CA2423210

    申请日:2003-03-20

    Applicant: MEMSCAP

    Abstract: Matrice de commutateurs optiques, réalisée à partir d'un substrat à base de matériau semi-conducteur ou diélectrique, comportant : - au moins un ensemble de fibres optiques d'entrée (12) et au moins un ensemble de fibres optiques de sortie (14) orientés sensiblement perpendiculairement l'un par rapport à l'autre, - un ensemble de miroirs mobiles (5,13) disposés aux intersections des directions définies par les différentes fibres optiques, chaque miroir (13) étant apte à se déplacer pour assurer la réflexion d'un faisceau issu d'une fibre optique d'entrée à destination d'une fibre optique de sortie, - un ensemble de canaux définis entre les miroirs, et à l'intérieur desquels se propagent les différents faisceaux avant et après avoir rencontré les miroirs, caractérisée en ce que : - l'ensemble de miroirs est réalisé sur une première galette de substrat (2), ladite première galette étant recouverte d'une seconde galette de substrat (20), - les différents canaux (38) sont formés entre des zones en excroissance (34) présentes sous la seconde galette de substrat, lesdites zones en excroissance comportant des logements (33) à l'intérieur desquels peuvent se déplacer les miroirs mobiles.

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