公开(公告)号：AT287082T

公开(公告)日：2005-01-15

申请号：AT99914933

申请日：1999-03-17

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G01N23/20 ,  G01N23/207

Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

公开(公告)号：DE60015346D1

公开(公告)日：2004-12-02

申请号：DE60015346

申请日：2000-08-01

Applicant: OSMIC INC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28 ,  G21K1/06

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

公开(公告)号：DE69908311D1

公开(公告)日：2003-07-03

申请号：DE69908311

申请日：1999-02-18

Applicant: OSMIC INC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G21K1/06

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

公开(公告)号：CZ2002791A3

公开(公告)日：2002-11-13

申请号：CZ2002791

申请日：2000-08-01

Applicant: OSMIC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28 ,  G21K1/06 ,  G21K1/00

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

公开(公告)号：CZ20003042A3

公开(公告)日：2001-05-16

申请号：CZ20003042

申请日：1999-02-18

Applicant: OSMIC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G02B17/00 ,  G21K1/06

Abstract: An x-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg x-ray reflective surfaces.

公开(公告)号：EP1464061A4

公开(公告)日：2008-02-20

申请号：EP02784361

申请日：2002-10-31

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JOENSEN KARSTEN ,  PLATONOV YURIY ,  SESHADRI SRIVATSAN

IPC: G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062

Abstract: An optical element for diffracting x-rays that includes a substrate (4), a diffraction structure (6) applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer (14) applied to the exterior surface.

公开(公告)号：CA2380922C

公开(公告)日：2008-12-09

申请号：CA2380922

申请日：2000-08-01

Applicant: OSMIC INC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G21K1/06 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

公开(公告)号：CA2366801A1

公开(公告)日：2000-10-19

申请号：CA2366801

申请日：2000-04-07

Applicant: OSMIC INC

Inventor： JOENSEN KARSTEN DAN ,  BONGLEA KIM ,  VERMAN BORIS ,  JIANG LICAI

IPC: G21K1/06 ,  G21K5/02

Abstract: A modular x-ray lens system for use is directing x-rays comprising a radiati on source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

公开(公告)号：AU3356999A

公开(公告)日：1999-10-25

申请号：AU3356999

申请日：1999-03-17

Applicant: OSMIC INC

Inventor： VERMAN BORIS ,  JIANG LICAI

IPC: G01N23/20 ,  G01N23/207

Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.

公开(公告)号：AU3295099A

公开(公告)日：1999-09-06

申请号：AU3295099

申请日：1999-02-18

Applicant: OSMIC INC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G21K1/06

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.