公开(公告)号：JPH08213614A

公开(公告)日：1996-08-20

申请号：JP19759695

申请日：1995-08-02

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L21/60 ,  H01L21/768 ,  H01L23/12 ,  H01L23/482 ,  H01L23/495 ,  H01L23/522 ,  H01L29/417 ,  H01L29/78

Abstract: PROBLEM TO BE SOLVED: To reduce a parasitic resistance value and inductance of wire and pin by separating units comprising a plurality of function units with such a region of a semiconductor layer as no function unit is formed. SOLUTION: A semiconductor material layer 5 is selectively coated with an insulated gate layer 11 extending on a first doped region 7, and the gate layer 11 is made to contact gate metal meshes 101 and 102 connected to at least one gate metal pad, while surrounding a source metal plate 100. By connecting the gate metal pad to each pin P8 of a package with each bonding wire W8, all MOSFET units among all the MOSEFT units are connected in parallel. Thus, the maximum current capacity of the power device can be re- established, while each source electrode pin can be electrically speared according to individual purposes, resulting in significantly improved freedom in design.

公开(公告)号：JPH0817848A

公开(公告)日：1996-01-19

申请号：JP15598295

申请日：1995-06-22

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L29/78 ,  H01L21/336 ,  H01L29/10 ,  H01L29/739

Abstract: PURPOSE: To ignore the base series resistance of a parasitic perpendicular bipolar transistor by adjusting an ion implantation energy so that the peak of the dopant concentration of a heavily doped part of a body region is located on the lower side of a source region than the surface of a semiconductor layer. CONSTITUTION: With an insulation gate layer 10 on the surface of a semiconductor layer 3 as a mask, a first impurity is ion-implanted with an energy in a specific thickness from the surface of the semiconductor layer 3 and is thermally diffused, thus forming a body region 2 consisting of a first greatly doped part 5 that is nearly aligned to both edges of the insulation layer 10 and a horizontal diffusion part 6 at the lower side of the insulation layer 10. The second impurity is ion-implanted selectively into the body region 2 in a pair, thus forming an annular source 7 that is aligned to both edges of the insulation layer 10, thus forming the greatly doped part 5 of the first impurity so that it is located at the lower side of the annular source region 7 and ignoring the base series resistance of a parasitic perpendicular bipolar transistor.

公开(公告)号：DE69518653D1

公开(公告)日：2000-10-05

申请号：DE69518653

申请日：1995-12-28

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： GRIMALDI ANTONIO ,  SCHILLACI ANTONINO ,  FRISINA FERRUCCIO ,  FERLA GIUSEPPE

IPC: H01L21/336 ,  H01L23/482 ,  H01L29/06 ,  H01L29/10 ,  H01L29/417 ,  H01L29/423 ,  H01L29/78 ,  H01L29/739

公开(公告)号：DE69229927D1

公开(公告)日：1999-10-14

申请号：DE69229927

申请日：1992-03-17

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FRISINA FERRUCCIO FRISINA FERR ,  FERLA GIUSEPPE

IPC: H01L21/22 ,  H01L21/322 ,  H01L29/73 ,  H01L21/331 ,  H01L21/8222 ,  H01L27/07 ,  H01L27/082 ,  H01L29/732 ,  H01L29/861

Abstract: The structure consists of a single chip (1) of semiconductor material, which comprises an area (32) having a high lifetime of the minority carriers, which constitutes a bipolar power device with high current density, and at least one area (20, 21; 20', 21') with a reduced lifetime of the minority carriers, which constitutes a fast diode.

公开(公告)号：DE69418037D1

公开(公告)日：1999-05-27

申请号：DE69418037

申请日：1994-08-02

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L21/768 ,  H01L23/12 ,  H01L23/482 ,  H01L21/60 ,  H01L23/495 ,  H01L23/522 ,  H01L29/417 ,  H01L29/78 ,  H01L29/72

Abstract: In a MOS-technology power device chip and package assembly, the MOS-technology power device chip (1) comprises a semiconductor material layer (4,5) in which a plurality of elementary functional units (6) is integrated, each elementary functional unit (6) contributing for a respective fraction to an overall current and comprising a first doped region (7) of a first conductivity type formed in said semiconductor layer (4,5), and a second doped region (10) of a second conductivity type formed inside said first doped region (7); the package (2) comprises a plurality of pins (P1-P10) for the external electrical and mechanical connection; said plurality of elementary functional units (6) is composed of sub-pluralities of elementary functional units (6), the second doped regions (10) of all the elementary functional units (6) of each sub-plurality being contacted by a same respective metal plate (100) electrically insulated from the metal plates (100) contacting the second doped regions (10) of all the elementary functional units (6) of the other sub-pluralities; each of said metal plate (100) is connected, through a respective bonding wire (W1-W5), to a respective pin (P1-P5) of the package (2).

公开(公告)号：IT9022237A1

公开(公告)日：1992-05-30

申请号：IT2223790

申请日：1990-11-29

Applicant: CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  RASPAGLIESI MARIO ,  TAVOLO NELLA

IPC: H01L21/322 ,  H01L20060101 ,  H01L21/22 ,  H01L21/265 ,  H01L21/336 ,  H01L29/78

公开(公告)号：DE69434937D1

公开(公告)日：2007-04-19

申请号：DE69434937

申请日：1994-06-23

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L21/265 ,  H01L21/336 ,  H01L29/10 ,  H01L29/78

Abstract: A zero thermal budget process for the manufacturing of a MOS-technology vertical power device (such as a MOSFET or a IGBT) comprises the steps of: forming a conductive Insulated gate layer (8) on a surface of a lightly doped semiconductor material layer (3) of a first conductivity type; selectively removing the insulated gate layer (8) from selected portions of the semiconductor material layer (3) surface; selectively implanting a first dopant of a second conductivity type into said selected portions of the semiconductor material layer (3), the insulated gate layer (8) acting as a mask, in a dose and with an implantation energy suitable to obtain, directly after the implantation, heavily doped regions (5) substantially aligned with the edges of the insulated gate layer (8); selectively implanting a second dopant of the second conductivity type along directions tilted of prescribed angles ( alpha 1, alpha 2) with respect to a direction orthogonal to the semiconductor material layer (3) surface, the insulated gate layer (8) acting as a mask, in a dose and with an implantation energy suitable to obtain, directly after the implantation, lightly doped channel regions (6) extending under the insulated gate layer (8); selectively implanting a heavy dose of a third dopant of a first conductivity type into the heavily doped regions (5), to form source regions (7) substantially aligned with the edges of the insulated gate layer (8).

公开(公告)号：DE69429915D1

公开(公告)日：2002-03-28

申请号：DE69429915

申请日：1994-07-04

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L21/265 ,  H01L21/336 ,  H01L29/06 ,  H01L29/10 ,  H01L29/739 ,  H01L29/78

公开(公告)号：DE69434268T2

公开(公告)日：2006-01-12

申请号：DE69434268

申请日：1994-07-14

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： FERLA GIUSEPPE ,  FRISINA FERRUCCIO

IPC: H01L29/74 ,  H01L21/265 ,  H01L21/336 ,  H01L29/423 ,  H01L29/49 ,  H01L29/739 ,  H01L29/749 ,  H01L29/78

Abstract: A high-speed MOS-technology power device integrated structure comprises a plurality of elementary functional units formed in a lightly doped semiconductor layer (1) of a first conductivity type, the elementary functional units comprising channel regions (6) of a second conductivity type covered by a conductive insulated gate layer (8) comprising a polysilicon layer (5); the conductive insulated gate layer (8) also comprises a highly conductive layer (9) superimposed over said polysilicon (5) layer and having a resistivity much lower than the resistivity of the polysilicon layer (5), so that a resistance introduced by the polysilicon layer (5) is shunted with a resistance introduced by said highly conductive layer (9) and the overall resistivity of the conductive insulated gate (8) layer is lowered.

公开(公告)号：DE69533134T2

公开(公告)日：2005-07-07

申请号：DE69533134

申请日：1995-10-30

Applicant: ST MICROELECTRONICS SRL ,  CONS RIC MICROELETTRONICA

Inventor： MAGRI ANGELO ,  FRISINA FERRUCCIO ,  FERLA GIUSEPPE

IPC: H01L21/336 ,  H01L29/06 ,  H01L29/08 ,  H01L29/10 ,  H01L29/78 ,  H01L29/739

Abstract: A MOS technology power device comprises a plurality of elementary functional units which contribute for respective fractions to an overall current of the power device and which are formed in a semiconductor material layer (2) of a first conductivity type. Each elementary functional unit comprises a body region (3) of a second conductivity type formed in the semiconductor material layer (2), the body region (3) having the form of a body stripe (3) elongated in a longitudinal direction on a surface of the semiconductor material layer (2). Each body stripe (3) includes at least one source portion (60) doped with dopants of the first conductivity type which is intercalated with a body portion (40) of the body stripe (3) wherein no dopants of the first conductivity type are provided.