Abstract:
Una película de un semiconductor compuesto del grupo II - VI de por lo menos uno de los elementos que pertenecen al grupo II de la tabla periodica, y por lo menos uno de los elementos que pertenecen al grupo VI de la tabla periodica se deposita sobre un substrato. Cuando la película se deposita sobre el substrato, se aplica un plasma de nitrogeno en estado excitado al substrato mientras que se remueven las partículas cargadas del plasma mediante un medio de remocion de partícula cargada. La película depositada del semiconductor compuesto del grupo II - VI adulterado con nitrogeno tiene un porcentaje aumentado de átomos de nitrogeno activados y cristalinidad mejorada.
Abstract:
81DETERMINING APPARATUS AND DETERMINING METHOD Abstract[Abstract][Object] To provide a determining apparatus capable of5 safely determining a contact state of the tip portion of a catheter with respect to a tissue in real time.[Solving Means] A photodynamic therapy apparatus 1 as a determining apparatus is the photodynamic therapy apparatus 1 for irradiating a tissue having absorbed10 photo-sensitive pharmaceutical, the photo-sensitivepharmaceutical absorbing an excitation light and emitting fluorescence, or a tissue absorbing the excitation light and emitting fluorescence, with the excitation light emitted from a tip portion of a laser15 catheter 300, including a connector 210, a light source 110, and a light detection unit 130. The laser catheter 300 is capable of being attached/detached to/from the connector 210. The light source 110 outputs the excitation light to the laser catheter 300 via the20 connector 210. The light detection unit 130 detectsintensity or a spectrum of the fluorescence, the fluorescence being entered from the laser catheter 300 via the connector 210, to determine whether the tip portion of the laser catheter 300 contacts the tissue25 or not.Fig. 3
Abstract:
When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.
Abstract:
When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.
Abstract:
A molecular beam epitaxy system having a plurality of chambers which contain at least a first chamber and a second chamber. The first chamber is used to form II-V column compound semiconductor layers not containing Te. The second chamber is used to form II-V column compound semiconductor layers containing at least Te. A semiconductor device having an ohmic characteristics can be fabricated without mixing Te into other layers.
Abstract:
When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III-V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III-V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III-V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions.
Abstract:
A film of a II - VI group compound semiconductor of at least one of elements belonging to the II group of the periodic table and at least one of elements belonging to the VI group of the periodic table is deposited on a substrate. When the film is deposited on the substrate, a plasma of nitrogen in an excited state is applied to the substrate while removing charged particles from said plasma by a charged particle removing means. The deposited film of a nitrogen-doped II - VI group compound semiconductor has an increased percentage of activated nitrogen atoms and improved crystallinity.
Abstract:
A fluorescence life measuring apparatus, a fluorescence life measuring method and a program that can obtain fluorescence life using a simple configuration are proposed. The apparatus moves a stage on which a fluorescent material to be measured is placed, irradiates with excitation light the fluorescent material placed on the stage moved at a constant speed, images afterglow of emitted fluorescence caused by the excitation light, and uses an imaged image to detect the elapsed time from a fluorescence position and afterglow strength at a target afterglow position and calculate the fluorescence life.