11.
    发明专利
    未知

    公开(公告)号:FR2800913B1

    公开(公告)日:2004-09-03

    申请号:FR9914105

    申请日:1999-11-10

    Abstract: The invention concerns a method which consists in forming on a substrate ( 1 ) coated with a dielectric material layer ( 3 ) provided with a window ( 3 a), a stack of successive layers alternately of germanium or SiGe alloy ( 4, 6, 8 ) and polycrystalline silicon ( 5, 7, 9 ); selective partial elimination of the germanium or SiGe alloy layers, to form an tree-like structure; forming a thin layer of dielectric material ( 10 ) on the tree-like structure; and coating the tree-like structure with polycrystalline silicon ( 11 ). The invention is useful for making dynamic random-access memories.

    12.
    发明专利
    未知

    公开(公告)号:FR2802705B1

    公开(公告)日:2002-08-09

    申请号:FR9915902

    申请日:1999-12-16

    Abstract: The process for fabricating a network of nanometric lines made of single-crystal silicon on an isolating substrate includes the production of a substrate comprising a silicon body having a lateral isolation defining a central part in the body. A recess is formed in the central part having a bottom wall made of dielectric material, a first pair of opposed parallel sidewalls made of dielectric material, and a second pair of opposed parallel sidewalls. At least one of the opposed parallel sidewalls of the second pair being formed from single-crystal silicon. The method further includes the epitaxial growth in the recess, from the sidewall made of single-crystal silicon of the recess, of an alternating network of parallel lines made of single-crystal SiGe alloy and of single-crystal silicon. Also, the lines made of single-crystal SiGe alloy are etched to form in the recess a network of parallel lines made of single-crystal silicon insulated from each other.

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