公开(公告)号：JP2002069547A

公开(公告)日：2002-03-08

申请号：JP2000256062

申请日：2000-08-25

Applicant: TOSHIBA CORP

Inventor： SHIOZAWA HITOSHI ,  NIKAIDO MASARU ,  TAJIMA YOSHIHIRO

IPC: C22C1/05 ,  C22C1/10 ,  C23C14/24 ,  H01J9/22 ,  H04N9/16

Abstract: PROBLEM TO BE SOLVED: To provide a composite material for vapor deposition having stable vapor deposition characteristics and capable of depositing a metal back film having high heat absorbability at a low cost. SOLUTION: This composite material for vapor deposition has a bar-shaped core material composed of a mixture of metal powder of aluminum or the like and carbon powder and an external material composed of metal such as aluminum provided so as to cover the core material and be adhered thereto. By subjecting the composite material for vapor deposition to vacuum deposition, a metal back film having a first vapor deposited layer of pure aluminum and a co-vapor deposited layer of aluminum and carbon formed thereon can be obtained. Then, the doming of a shadow mask in a color cathode ray tube can remarkably be suppressed.

公开(公告)号：JPH11204030A

公开(公告)日：1999-07-30

申请号：JP240698

申请日：1998-01-08

Applicant: TOSHIBA CORP

Inventor： SHIOZAWA HITOSHI ,  TAJIMA YOSHIHIRO ,  NIKAIDO MASARU

IPC: G02B5/22 ,  H01J9/227

Abstract: PROBLEM TO BE SOLVED: To provide a light quantity correcting filter capable of eliminating shortage in exposure M, and easily obtaining a light absorption layer gap or a phosphor layer of a desired size, as well as an exposure device equipped with the filter. SOLUTION: A light quantity correcting filter 30 for forming a phosphor screen has shading parts 36 made of many small cells on a transparent substrate 32, and light transmission parts 38 formed between the shading parts 36. In this case, the area ratio of the shading parts 36 to the light transmission parts 38 is made to change, thereby providing a desired distribution regarding a transmitted light quantity. The transparent substrate 32 is formed out of synthetic quartz glass or molten quartz glass of high purity, and has a transmission factor equal to or more than 90% in the ultraviolet wavelength range of 310 nm to 379 nm.

公开(公告)号：JPH11133587A

公开(公告)日：1999-05-21

申请号：JP29804497

申请日：1997-10-30

Applicant: TOSHIBA CORP

Inventor： TAJIMA YOSHIHIRO ,  NIKAIDO MASARU ,  OTAKE YASUHISA ,  SHIOZAWA HITOSHI ,  YAMAZAKI MITSUAKI ,  TAKASHIMA MASAO

IPC: G03F1/54 ,  H01J9/14 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To obtain a hard mask as a photomask for the production of a shadow mask instead of an emulsion plate. SOLUTION: A metal layer 12 is formed by electroless plating on both surfaces of a substrate 11 which is transparent for UV rays. Then a resist pattern 13 is formed on the metal layer formed on at least one surface of the substrate. Then the metal layer 12 is patterned by using the resist pattern 13. Therefore, a metal film of a desired pattern can be formed without causing warpage of the glass substrate. and therefore, a good hard mask for the production of a shadow mask can be obtd.

公开(公告)号：JPH0831320A

公开(公告)日：1996-02-02

申请号：JP16258694

申请日：1994-07-15

Applicant: TOSHIBA CORP

Inventor： TSUKAGOSHI HATSUO ,  UBUKATA TOKUO ,  SHIOZAWA HITOSHI ,  KUROBUCHI MITSUO ,  SUGITA KAZUO

IPC: H01J9/227

Abstract: PURPOSE:To stably form a lacquer coating film having a specified thickness as the underlay for a metal evaporative film when lacquer is sprayed on a phosphor layer formed on the inner surface of the panel by restricting the relationship between the panel rotating speed and the lacquer viscosity. CONSTITUTION:Phosphor layers 10R, 10B, 10G (9 is light absorbing layer) are formed over the inner surface of a panel 1 and wetted, and lacquer is sprayed to the wetted phosphor layers while the panel 1 is rotated. The rotation of the panel 1 is continued even after application of lacquer so that the coating thickness is made uniform, followed by a drying process to form a lacquer coating film 30. A metal evaporative film 11 is formed over this lacquer coating film 30. The relationship between the panel rotating speed and lacquer viscosity at 25 deg.C at the time of lacquer spraying should be 82-115rpm for 0.4-0.65mpa.s, 116-198rpm for 0.66-1.20mpa.s, 199-270rpm for 1.21-4.50mpa.s, and 271-330rpm for 4.51-7.50mpa.s.

公开(公告)号：JPH07335127A

公开(公告)日：1995-12-22

申请号：JP12486894

申请日：1994-06-07

Applicant: TOSHIBA CORP

Inventor： KOIKE NORIO ,  UBUKATA TOKUO ,  SHIOZAWA HITOSHI

IPC: H01J9/22 ,  H01J9/227

Abstract: PURPOSE:To form a metal film with no coming off on a fluorescent screen and high evenness. CONSTITUTION:A fluorescent screen forming method for a color cathode ray tube is provided in such a way that a resin film 30 whose main component is acrylic resin is formed on fluorescent layers 9B, 9G, 9R formed on the inner surface of a panel 2, a metal film 32 is formed on the resin film 30, then a black heat absorbing layer 11 is formed on the metal film 32. The resin film 30 is formed by applying a solution prepared by dissolving 1.0-3.2wt% acrylic resin in a solvent mainly comprising toluene.

公开(公告)号：JPH07235262A

公开(公告)日：1995-09-05

申请号：JP2387694

申请日：1994-02-22

Applicant: TOSHIBA CORP

Inventor： SHIOZAWA HITOSHI

IPC: H01J9/227

Abstract: PURPOSE:To form a light absorbing layer without defects. CONSTITUTION:In a method of cleaning the panel for a color picture tube consisting of glass, the inner face of the panel is processed in mixed solution between hydrogen peroxide water and ammonium water for washing, and then is processed in fluoric acid. To be more concrete, it is processed in fluoric acid after being processed and washed in the mixed solution between 5vol.%-30 vol.% hydrogen peroxide water and 0.1vol.%-5vol.% ammonium water.

公开(公告)号：JP2011070710A

公开(公告)日：2011-04-07

申请号：JP2009218561

申请日：2009-09-24

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： SHIOZAWA HITOSHI ,  TAKEUCHI YUJI

IPC: G11C16/02

Abstract: PROBLEM TO BE SOLVED: To determine a corrected rewrite condition to an excessively written memory cell in a nonvolatile semiconductor memory. SOLUTION: Each memory cell transistor is subjected to write operation on a first write condition to discriminate memory cell transistors having thresholds larger than a first threshold value verification voltage and ones larger than a second threshold value verification voltage larger than the first threshold value verification voltage. Data in a memory cell transistor having a threshold larger than the first threshold verification voltage are erased. A memory cell transistor having a threshold larger than the first threshold value verification voltage but smaller than the second threshold value verification voltage is subjected to write operation on a second write condition wherein the initial voltage is lower than that in the first condition. A memory cell transistor having a threshold larger than the second threshold value verification voltage is subjected to write operation on a third write condition wherein the initial voltage is lower than that in the second condition. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：确定对非易失性半导体存储器中过度写入的存储单元的校正重写条件。 解决方案：每个存储单元晶体管在第一写入条件下进行写入操作，以区分具有大于第一阈值验证电压的阈值的存储单元晶体管，并且大于大于第一阈值验证电压的第二阈值验证电压 验证电压。 具有大于第一阈值验证电压的阈值的存储单元晶体管中的数据被擦除。 具有大于第一阈值验证电压但小于第二阈值验证电压的阈值的存储单元晶体管在初始电压低于第一条件的第二写入条件下进行写入操作。 具有大于第二阈值验证电压的阈值的存储单元晶体管在初始电压低于第二条件的第三写入条件下进行写入操作。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2005063915A

公开(公告)日：2005-03-10

申请号：JP2003296190

申请日：2003-08-20

Applicant: Jsr Corp ,  Jsr株式会社 ,  Toshiba Corp ,  株式会社東芝

Inventor： NIKAIDO MASARU ,  SHIOZAWA HITOSHI

IPC: H01J9/14 ,  H01J29/07

Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a focus mask type shadow mask in which the reduction of manufacturing costs is realized, and manufacturing yield can be improved, and further, stable focus performance can be obtained.
SOLUTION: The manufacturing method of a shadow mask for selecting electron beams from an electron gun structure comprises: a process of arranging a transfer film 100 formed by laminating at least a low resistance layer 102 and a dielectric layer 103 on one principal face opposed to the electron gun structure of a shadow mask substrate 52 having a plurality of apertures 34 opened regularly; a process of exposing the transfer film 100 through a photo mask PM having a prescribed pattern, a process of developing the transfer film 100; and a process of baking the low resistance layer 102 and the dielectric layer 103 remaining on the shadow mask substrate 52.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供实现制造成本降低的聚焦掩模型荫罩的制造方法，并且可以提高制造成品率，并且还可以获得稳定的聚焦性能。 解决方案：用于从电子枪结构中选择电子束的荫罩的制造方法包括：将在至少一个低电阻层102和电介质层103上层叠的转印膜100配置在一个主面上的工序 与具有规则打开的多个孔34的荫罩基板52的电子枪结构相反; 通过具有规定图案的光掩模PM曝光转印膜100的工序，显影转印膜100的工序; 以及烘烤保留在荫罩基板52上的低电阻层102和电介质层103的工艺。（C）2005，JPO＆NCIPI

公开(公告)号：JPH07335125A

公开(公告)日：1995-12-22

申请号：JP12721594

申请日：1994-06-09

Applicant: TOSHIBA CORP

Inventor： TSUKAGOSHI HATSUO ,  SUGITA KAZUO ,  SHIOZAWA HITOSHI

IPC: H01J9/227

Abstract: PURPOSE:To provide a method for easily forming a fluorescent screen with high quality. CONSTITUTION:In a fluorescent screen forming method for a color cathode ray tube, in which sensitive fluorescent material slurry containing at least a fluorescent material, polyvinyl alcohol, ammonium dichromate, and resin is applied to the inner surface of a panel 2, dried to form a sensitive fluorescent material slurry layer 10, a fluorescent material layer is formed from the sensitive fluorescent material slurry layer in a photoprinting process, and three color fluorescent material layers 12B, 12G, 12R are formed by repeating this fluorescent material layer forming method regarding three color fluorescent materials in order, the minimum film forming temperature of the resin in the sensitive fluorescent material slurry is raised in the order of the first color, the second color, and the third color. A fluorescent screen with no color mixing is obtained, and the freedom of fluorescent material layer forming operation is widened.