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11.ION BEAM MODIFICATION OF RESIDUAL STRESS GRADIENTS IN THIN FILM POLYCRYSTALLINE SILICON MEMBRANES 审中-公开
Title translation: 薄膜多晶硅膜中残留应力梯度的离子束修饰公开(公告)号:WO0146489A9
公开(公告)日:2002-05-30
申请号:PCT/US0034800
申请日:2000-12-20
Applicant: UNIV BOSTON , BIFANO THOMAS
Inventor: BIFANO THOMAS
IPC: B81B3/00 , B81C1/00 , G02B26/08 , G03F1/20 , H01J37/305 , H01L21/302 , C23C14/34 , C23F1/00 , G01L1/22
CPC classification number: H01J37/3056 , B81C1/00666 , B81C2201/0166 , G02B26/0841 , G03F1/20 , H01L21/302
Abstract: Method and apparatus for reducing the curvature of a micromachined structure having lamella (12). Surface treatment by an ion beam (30) of the lamella (12) such as by sputtering removes regions of stress allowing the lamella (12) to return to a planar condition. The resulting outer surface is made suitable for use as a reflector and other purposes needing a substantially planar surface.
Abstract translation: 用于减小具有薄片(12)的微加工结构的曲率的方法和装置。 通过薄片(12)的离子束(30)进行表面处理,例如通过溅射去除使得薄片(12)返回到平面状态的应力区域。 所得的外表面适于用作反射器和需要基本平坦的表面的其它目的。
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公开(公告)号:KR20180002519A
公开(公告)日:2018-01-08
申请号:KR20170080381
申请日:2017-06-26
IPC: B81B3/00
CPC classification number: B81C1/00658 , B81B3/007 , B81B2201/0257 , B81B2201/0264 , B81B2201/12 , B81B2203/0118 , B81B2203/0127 , B81C2201/0166 , G01L1/00 , G01Q60/24 , G01Q70/14 , H04R19/02 , H04R19/04 , H04R2201/003
Abstract: 다양한실시양태에따른초소형기계구조체는기판및 기판에배열되는기능성구조체를포함할수 있으며, 이때 상기기능성구조체는, 기능성영역에작용하는힘에응답하여기판에대해휘어질수 있는기능성영역을포함하고, 상기기능성영역의하나이상의구역은약 5GPa 내지약 70GPa의탄성모듈러스를갖는다.
Abstract translation: 根据各种实施例的微机械结构可以包括:衬底; 以及布置在基板处的功能结构; 其中所述功能结构包括响应于作用在所述功能区上的力而相对于所述衬底可偏转的功能区; 并且其中功能区的至少一部分具有在约5GPa至约70GPa范围内的弹性模量。
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