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    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE
    12.
    发明申请
    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE 审中-公开
    用于电子束源的图形化导热光电阴极

    公开(公告)号：WO0109913A3

    公开(公告)日：2001-10-04

    申请号：PCT/US0020260

    申请日：2000-07-21

    Applicant: ETEC SYSTEMS INC

    Inventor： FERNANDEZ ANDRES ,  MANKOS MARIAN ,  CHANG TAI-HON PHILIP ,  LEE KIM ,  COYLE STEVEN T

    IPC: H01J9/12 ,  H01J1/34 ,  H01J37/073 ,  H01L21/027

    CPC classification number: B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

    Abstract: A photocathode emitter (500) as a source of electron beams (504), having an optically transmissive substrate (501) patterned to define a protrusion, heat conducting material (506) occupying the space surrounding the protrusion, and a photoemitter layer (502) over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region (505) at the contact with the top of the protrusion patterned on the substrate, and an emission region (508) opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode. The thermal conductivity of heat-conducting materials such as gold, copper, and platinum is at least 200 times greater than that of fused silica, which is a substrate material typically used in photocathodes. This efficiently conducts heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This in turn, permits higher throughput rates in applications including electron beam lithography.

    Abstract translation: 一种作为电子束源（504）的光电阴极发射器（500），具有图案化以限定突起的光学透射衬底（501），占据突起周围的空间的导热材料（506）以及光电发射器层（502） 在突起上方。 发光体位于基板的与照明入射的面相反的一侧，具有与在基板上被图案化的凸部的顶部接触的照射区域（505）和与发光区域 照射区域，这些区域由照明路径限定。 突起周围的导热材料将热量从光电阴极上的这个聚焦照明区域传导走。 诸如金，铜和铂之类的导热材料的导热率比作为光电阴极中通常使用的衬底材料的熔融二氧化硅的导热率高至少200倍。 这有效地将热量从照射区域/发射区域界面传导走，并因此允许从光阴极获得更高的电流。 这反过来又允许在包括电子束光刻的应用中获得更高的吞吐速率。

    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE
    13.
    发明申请
    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE 审中-公开
    用于电子束源的图形热导光电离层

    公开(公告)号：WO01009913A2

    公开(公告)日：2001-02-08

    申请号：PCT/US2000/020260

    申请日：2000-07-21

    IPC: H01J9/12 ,  H01J1/34 ,  H01J37/073 ,  H01L21/027 ,  H01J1/00

    CPC classification number: B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

    Abstract: A photocathode emitter (500) as a source of electron beams (504), having an optically transmissive substrate (501) patterned to define a protrusion, heat conducting material (506) occupying the space surrounding the protrusion, and a photoemitter layer (502) over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region (505) at the contact with the top of the protrusion patterned on the substrate, and an emission region (508) opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode. The thermal conductivity of heat-conducting materials such as gold, copper, and platinum is at least 200 times greater than that of fused silica, which is a substrate material typically used in photocathodes. This efficiently conducts heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This in turn, permits higher throughput rates in applications including electron beam lithography.

    Abstract translation: 一种作为电子束源（504）的光电阴极发射器（500），具有图案化以限定突起的光学透射基底（501），占据突起周围空间的导热材料（506）和光电发射器层（502） 突出。 光发射器位于与照射入射的表面相对的一侧上，并且具有与图案化在基板上的突起的顶部接触的照射区域（505）和与基板上图案化的发光区域（508）相对的发射区域 照射区域，这些区域由照明路径限定。 突起周围的导热材料将热量远离该聚光照射区域在光电阴极上传导。 诸如金，铜和铂的导热材料的导热率比通常用于光电阴极的基底材料的熔融石英的至少高200倍。 这有效地将热量从照射区域/发射区域界面传导出去，从而允许从光电阴极获得更高的电流。 这反过来，允许在包括电子束光刻的应用中更高的吞吐率。

    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE
    15.
    发明公开
    PATTERNED HEAT CONDUCTING PHOTOCATHODE FOR ELECTRON BEAM SOURCE 审中-公开
    EYED导热PHOTO阴极电子源

    公开(公告)号：EP1200977A2

    公开(公告)日：2002-05-02

    申请号：EP00948963.4

    申请日：2000-07-21

    Applicant: Applied Materials, Inc.

    Inventor： FERNANDEZ, Andres ,  MANKOS, Marian ,  CHANG, Tai-Hon, Philip ,  LEE, Kim ,  COYLE, Steven, T.

    IPC: H01J37/073 ,  H01J1/34

    CPC classification number: B82Y10/00 ,  H01J1/34 ,  H01J37/073 ,  H01J2201/02 ,  H01J2237/31779

    Abstract: A photocathode emitter (500) as a source of electron beams (504), having an optically transmissive substrate (501) patterned to define a protrusion, heat conducting material (506) occupying the space surrounding the protrusion, and a photoemitter layer (502) over the protrusion. The photoemitter is positioned on the side of the substrate opposite the surface on which the illumination is incident, and has an irradiation region (505) at the contact with the top of the protrusion patterned on the substrate, and an emission region (508) opposite the irradiation region, these regions being defined by the path of the illumination. The heat conducting material around the protrusion conducts heat away from this focused region of illumination on the photocathode. The thermal conductivity of heat-conducting materials such as gold, copper, and platinum is at least 200 times greater than that of fused silica, which is a substrate material typically used in photocathodes. This efficiently conducts heat away from the irradiation region/emission region interface, and therefore allows higher currents to be achieved from the photocathode. This in turn, permits higher throughput rates in applications including electron beam lithography.

    ブラインド通気性電極
    16.
    发明专利
    ブラインド通気性電極 审中-公开

    公开(公告)号：JP2018125271A

    公开(公告)日：2018-08-09

    申请号：JP2017036809

    申请日：2017-02-28

    Applicant: プランゼージャパン株式会社

    Inventor： 白水 昇

    IPC: G21K5/04 ,  H01J37/08 ,  H01J37/317 ,  H01J27/08

    CPC classification number: G21K1/087 ,  H01J27/024 ,  H01J2201/02

    Abstract: 【課題】イオン源引き出し電極の電極間ギャップにおいて電気絶縁破壊(グリッチ)が発生するのを大幅に減少させることができる電極を提供する。 【解決手段】引き出し電極(抑制電極、接地電極)の電極間のポンピングを改善してガス圧を減少させることによりグリッチ発生率を減少させる。そのために電極プレートに複数のブラインド通気孔220を有する片面ブラインド通気性インサート200を取り付ける。そして、通気孔は電極プレートの少なくとも一方の側から他方の側への直接見通し線が存在しない、つまり、イオン、X線、二次電子等が通過できないようにすることにより、グリッチの発生率を減少させる。抽出された正イオンはウェル222に衝突して二次粒子が発生するが、分析サイド側への見通し線は存在しない。分析サイドから入射するイオン又はX線によって通気チャネル224に生じた二次電子230に対しては開口228への直接見通し線を持つ。 【選択図】図5

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