Abstract:
An object of the present invention is to provide a nanotube-nanohorn complex having a high aspect ratio, also having high dispersibility, having controlled diameter, and having high durability at a low cost. According to the present invention, a carbon target containing a catalyst is evaporated with a laser ablation method to synthesize a structure including both of a carbon nanohorn aggregate and a carbon nanotube.
Abstract:
Compositions of carbon nanoflakes are coated with a low Z compound, where an effective electron emission of the carbon nanoflakes coated with the low Z compound is improved compared to an effective electron emission of the same carbon nanoflakes that are not coated with the low Z compound or of the low Z compound that is not coated onto the carbon nanoflakes. Compositions of chromium oxide and molybdenum carbide-coated carbon nanoflakes are also described, as well as applications of these compositions. Carbon nanoflakes are formed and a low Z compound coating, such as a chromium oxide or molybdenum carbide coating, is formed on the surfaces of carbon nanoflakes. The coated carbon nanoflakes have excellent field emission properties.
Abstract:
A carbon film (703) used for field emission cathode is a layer of thin carbon film on a substrate (803). The carbon film has a UV Raman band in range of 1578 cm-1 to 1620 cm-1 with full width at half maximum from 25 to 165 cm-1.
Abstract:
Изобретение относится к углеродо содержащему наноматериалу (УГНМ) и методам его получения для устройств полевой эмиссии электронов. Техническим результатом изобретения является получение материалов с низким порогом эмиссии электронов и упрощение методов их изготовления. УГНМ представляет собой дисперсный порошок с размером частиц менее 50 мкм, состоящих из ядра и поверхностного слоя, при этом ядро сформировано из диэлектрического или полупроводникового материала, а поверхностный слой образован rрафитоподобным материалом. Слой имеет толщину 0,5-50 нм. Способы получения УГНМ включают в себя термическое осаждение слоя углерода на поверхности ядра из диэлектрического или полупроводникового материала, в качестве которого используют алмаз, нитриды и карбиды бора и кремния, а также оксид кремния и кремний, причем упомянутое осаждение осуществляют в среде углеводорода или хлора или в инертной или вакуумной среде при соответствующих значениях температур и времени.
Abstract:
The invention relates to a carbon-containing nanomaterial and to methods for the production thereof for field electron emitting devices. Said invention makes it possible to produce materials having a low field electron emission threshold and to simplify the methods for the production thereof. The inventive carbon-containing nanomaterial is made in the form of a dispersed powder, the particles of which have size less than 50 mkm and consist of a core and a surface layer, the core being made of dielectric or semiconductor material and the surface layer being made of a graphite-like material. The thickness of the layer is of 0.5-50 nm. The methods for producing the carbon-containing nanomaterial consist in thermally deposing a carbon layer on the surface of the core made of the dielectric or semiconductor material in the capacity of which diamond, boron or silicon nitrides and carbides, silicon oxide and silicon can be used, wherein the above-mentioned deposition is carried out in a hydrocarbon or chlorine or inert or vacuum medium at respective temperature and time values.
Abstract:
A manufacturing method of an electron-emitting device including the steps of: preparing a base substrate provided with an insulating or semi-conducting layer in advance and exposing the layer to an atmosphere which contains neutral radical containing hydrogen. It is preferable that the insulating or semi-conducting layer contains metal particles; the insulating or semi-conducting layer is a film containing carbon as a main component; the neutral radical containing hydrogen contains any of H., CH3., C2H5., and C2H. or mixture gas thereof; compared with a density of a charged particle in the atmosphere, a density of the neutral radical containing hydrogen in the atmosphere is more than 1,000 times; and a step of exposing the insulating or semi-conducting layer to the atmosphere is a step of making a hydrogen termination by using a plasma apparatus provided with a bias grid.
Abstract:
A manufacturing method of an electron-emitting device including the steps of: preparing a base substrate provided with an insulating or semi-conducting layer in advance and exposing the layer to an atmosphere which contains neutral radical containing hydrogen. It is preferable that the insulating or semi-conducting layer contains metal particles; the insulating or semi-conducting layer is a film containing carbon as a main component; the neutral radical containing hydrogen contains any of H., CH3., C2H5., and C2H. or mixture gas thereof; compared with a density of a charged particle in the atmosphere, a density of the neutral radical containing hydrogen in the atmosphere is more than 1,000 times; and a step of exposing the insulating or semi-conducting layer to the atmosphere is a step of making a hydrogen termination by using a plasma apparatus provided with a bias grid.
Abstract:
A method of manufacturing a field emission electrode includes humidification processing to absorb water at a surface of an electron emission film emitting electrons as a result of application of a voltage, and voltage application processing to apply an aging voltage between the humidified electron emission film and an electrode provided facing the electron emission film.
Abstract:
A method is provided for fabricating an electron emission source which can attain improved electron emission efficiency and has simplified manufacturing processes. Also provided are an electron emission display device and an electron emission display device fabricated using the method of fabricating an electron emission source. The method includes forming an electrode, forming a carbide compound thin film on the electrode and forming a carbide-induced carbon thin film layer from the carbide compound thin film using an etching gas. The electron emission device and the electron emission display device each include a first electrode, a second electrode disposed to face the first electrode, and a carbide-induced carbon thin film layer formed to be electrically connected to f the first electrode or the second electrode.