COATED CARBON NANOFLAKES
    12.
    发明申请
    COATED CARBON NANOFLAKES 审中-公开
    涂层碳纳米管

    公开(公告)号:US20110175038A1

    公开(公告)日:2011-07-21

    申请号:US12359435

    申请日:2009-01-26

    Abstract: Compositions of carbon nanoflakes are coated with a low Z compound, where an effective electron emission of the carbon nanoflakes coated with the low Z compound is improved compared to an effective electron emission of the same carbon nanoflakes that are not coated with the low Z compound or of the low Z compound that is not coated onto the carbon nanoflakes. Compositions of chromium oxide and molybdenum carbide-coated carbon nanoflakes are also described, as well as applications of these compositions. Carbon nanoflakes are formed and a low Z compound coating, such as a chromium oxide or molybdenum carbide coating, is formed on the surfaces of carbon nanoflakes. The coated carbon nanoflakes have excellent field emission properties.

    Abstract translation: 碳纳米片的组合物涂覆有低Z化合物,其中涂覆有低Z化合物的碳纳米片的有效电子发射与未涂覆低Z化合物的相同碳纳米片的有效电子发射相比有所改善,或 的未涂覆在碳纳米片上的低Z化合物。 还描述了氧化铬和碳化钼包覆的碳纳米片的组成以及这些组合物的应用。 形成碳纳米片,并且在碳纳米片的表面上形成低Z化合物涂层,例如氧化铬或碳化钼涂层。 涂覆的碳纳米片具有优异的场致发射特性。

    УГЛЕРОДСОДЕРЖАЩИЙ НАНОМАТЕРИАЛ С НИЗКИМ ПОРОГО ПОЛЕВОЙ ЭМИССИИ ЭЛЕКТРОНОВ И СПОСОБ ЕГО ПОЛУЧЕНИЯ (ВАРИАНТЫ)

    公开(公告)号:WO2009002212A2

    公开(公告)日:2008-12-31

    申请号:PCT/RU2008/000181

    申请日:2008-03-24

    CPC classification number: H01J9/025 H01J1/304 H01J2201/30453

    Abstract: Изобретение относится к углеродо содержащему наноматериалу (УГНМ) и методам его получения для устройств полевой эмиссии электронов. Техническим результатом изобретения является получение материалов с низким порогом эмиссии электронов и упрощение методов их изготовления. УГНМ представляет собой дисперсный порошок с размером частиц менее 50 мкм, состоящих из ядра и поверхностного слоя, при этом ядро сформировано из диэлектрического или полупроводникового материала, а поверхностный слой образован rрафитоподобным материалом. Слой имеет толщину 0,5-50 нм. Способы получения УГНМ включают в себя термическое осаждение слоя углерода на поверхности ядра из диэлектрического или полупроводникового материала, в качестве которого используют алмаз, нитриды и карбиды бора и кремния, а также оксид кремния и кремний, причем упомянутое осаждение осуществляют в среде углеводорода или хлора или в инертной или вакуумной среде при соответствующих значениях температур и времени.

    Abstract translation: 本发明涉及一种含碳纳米材料及其制备用于场电子发射器件的方法。 所述发明使得可以制备具有低场电子发射阈值的材料并简化其制备方法。 本发明的含碳纳米材料以分散粉末的形式制成,其颗粒的尺寸小于50mkm,由芯和表面层组成,芯由电介质或半导体材料制成,表面层为 由石墨状材料制成。 该层的厚度为0.5-50nm。 用于制造含碳纳米材料的方法包括在由电介质或半导体材料制成的芯的表面上热沉积碳层,其中金刚石,硼或氮化硅和碳化物,氧化硅和硅可以被使用 其中上述沉积在各自的温度和时间值下在烃或氯或惰性或真空介质中进行。

    CARBON-CONTAINING NANOMATERIAL HAVING A LOW FIELD ELECTRON EMISSION THRESHOLD AND A METHOD FOR THE PRODUCTION THEREOF
    15.
    发明申请
    CARBON-CONTAINING NANOMATERIAL HAVING A LOW FIELD ELECTRON EMISSION THRESHOLD AND A METHOD FOR THE PRODUCTION THEREOF 审中-公开
    具有低场电子发射阈值的含碳纳米管及其生产方法

    公开(公告)号:WO2009002212A3

    公开(公告)日:2009-03-05

    申请号:PCT/RU2008000181

    申请日:2008-03-24

    CPC classification number: H01J9/025 H01J1/304 H01J2201/30453

    Abstract: The invention relates to a carbon-containing nanomaterial and to methods for the production thereof for field electron emitting devices. Said invention makes it possible to produce materials having a low field electron emission threshold and to simplify the methods for the production thereof. The inventive carbon-containing nanomaterial is made in the form of a dispersed powder, the particles of which have size less than 50 mkm and consist of a core and a surface layer, the core being made of dielectric or semiconductor material and the surface layer being made of a graphite-like material. The thickness of the layer is of 0.5-50 nm. The methods for producing the carbon-containing nanomaterial consist in thermally deposing a carbon layer on the surface of the core made of the dielectric or semiconductor material in the capacity of which diamond, boron or silicon nitrides and carbides, silicon oxide and silicon can be used, wherein the above-mentioned deposition is carried out in a hydrocarbon or chlorine or inert or vacuum medium at respective temperature and time values.

    Abstract translation: 本发明涉及一种含碳纳米材料及其制备用于场电子发射器件的方法。 所述发明使得可以制备具有低场电子发射阈值的材料并简化其制备方法。 本发明的含碳纳米材料以分散粉末的形式制成,其颗粒的尺寸小于50mkm,由芯和表面层组成,芯由电介质或半导体材料制成,表面层为 由石墨状材料制成。 该层的厚度为0.5-50nm。 用于制造含碳纳米材料的方法包括在由电介质或半导体材料制成的芯的表面上热沉积碳层,其中金刚石,硼或氮化硅和碳化物,氧化硅和硅可以被使用 其中上述沉积在各自的温度和时间值下在烃或氯或惰性或真空介质中进行。

    電界放出型電子源の製造方法
    16.
    发明申请
    電界放出型電子源の製造方法 审中-公开
    用于制造场发射电子源的方法

    公开(公告)号:WO2009008305A1

    公开(公告)日:2009-01-15

    申请号:PCT/JP2008/061986

    申请日:2008-07-02

    Abstract:  電界放出型電子源の製造方法は、シリコンを主成分とするエミッタ(18)の形成後に少なくともエミッタ(18)の先端部に炭素イオン(40)を注入するイオン注入工程を備えている。この炭素イオン(40)のエネルギー(単位はkeV)を一方の軸、注入量(単位は×10 17 ions/cm 2  )を他方の軸とする直交座標上の点P 1  ~P 6  の座標を(エネルギー,注入量)でそれぞれ表すと、P 1  (5,0.8)、P 2  (5,1.5)、P 3  (10,2.5)、P 4  (15,3.0)、P 5  (15,2.0)およびP 6  (10,1.6)の6点間を直線で結んで囲まれる範囲内にある条件で炭素イオン(40)を注入する。

    Abstract translation: 用于制造场发射电子源的方法包括离子注入步骤,用于在主要由硅形成发射极(18)之后至少在发射极(18)的尖端部分中注入碳离子(40)。 当将具有碳离子(40)的能量(单位:keV))作为一个轴的正交坐标上的点P1-P6的坐标分别表示为(能量,注入量)和注入量(单位:×1017 离子/ cm 2)作为另一个轴,碳离子(40)被注入在通过连接六个点(即P1(5,0.8),P2(5,1.5),P3(10,2.5),P4 (15,3.0),P5(15,2.0)和P6(10,1.6)。

    Electron-emitting device, electron source, image display apparatus, and manufacturing method of electron-emitting device
    17.
    发明授权
    Electron-emitting device, electron source, image display apparatus, and manufacturing method of electron-emitting device 失效
    电子发射器件,电子源,图像显示装置和电子发射器件的制造方法

    公开(公告)号:US08075360B2

    公开(公告)日:2011-12-13

    申请号:US12253668

    申请日:2008-10-17

    CPC classification number: H01J9/025 H01J31/127 H01J2201/30453 H01J2329/0444

    Abstract: A manufacturing method of an electron-emitting device including the steps of: preparing a base substrate provided with an insulating or semi-conducting layer in advance and exposing the layer to an atmosphere which contains neutral radical containing hydrogen. It is preferable that the insulating or semi-conducting layer contains metal particles; the insulating or semi-conducting layer is a film containing carbon as a main component; the neutral radical containing hydrogen contains any of H., CH3., C2H5., and C2H. or mixture gas thereof; compared with a density of a charged particle in the atmosphere, a density of the neutral radical containing hydrogen in the atmosphere is more than 1,000 times; and a step of exposing the insulating or semi-conducting layer to the atmosphere is a step of making a hydrogen termination by using a plasma apparatus provided with a bias grid.

    Abstract translation: 一种电子发射器件的制造方法,包括以下步骤:预先制备设置有绝缘或半导体层的基底衬底,并将该层暴露于包含含有中性自由基的氢的气氛中。 优选绝缘或半导电层含有金属颗粒; 绝缘或半导体层是以碳为主要成分的膜; 含氢的中性基团含有H.,CH 3,C 2 H 5和C 2 H中的任何一种。 或其混合气体; 与大气中的带电粒子的密度相比,气氛中含有氢的中性基团的密度大于1000倍; 并且将绝缘或半导体层暴露于大气的步骤是通过使用具有偏置栅格的等离子体装置进行氢终止的步骤。

    ELECTRON-EMITTING DEVICE, ELECTRON SOURCE, IMAGE DISPLAY APPARATUS, AND MANUFACTURING METHOD OF ELECTRON-EMITTING DEVICE
    18.
    发明申请
    ELECTRON-EMITTING DEVICE, ELECTRON SOURCE, IMAGE DISPLAY APPARATUS, AND MANUFACTURING METHOD OF ELECTRON-EMITTING DEVICE 失效
    电子发射装置,电子源,图像显示装置和电子发射装置的制造方法

    公开(公告)号:US20090111350A1

    公开(公告)日:2009-04-30

    申请号:US12253668

    申请日:2008-10-17

    CPC classification number: H01J9/025 H01J31/127 H01J2201/30453 H01J2329/0444

    Abstract: A manufacturing method of an electron-emitting device including the steps of: preparing a base substrate provided with an insulating or semi-conducting layer in advance and exposing the layer to an atmosphere which contains neutral radical containing hydrogen. It is preferable that the insulating or semi-conducting layer contains metal particles; the insulating or semi-conducting layer is a film containing carbon as a main component; the neutral radical containing hydrogen contains any of H., CH3., C2H5., and C2H. or mixture gas thereof; compared with a density of a charged particle in the atmosphere, a density of the neutral radical containing hydrogen in the atmosphere is more than 1,000 times; and a step of exposing the insulating or semi-conducting layer to the atmosphere is a step of making a hydrogen termination by using a plasma apparatus provided with a bias grid.

    Abstract translation: 一种电子发射器件的制造方法,包括以下步骤:预先制备设置有绝缘或半导体层的基底衬底,并将该层暴露于含有含有中性基团的氢的气氛中。 优选绝缘或半导电层含有金属颗粒; 绝缘或半导体层是以碳为主要成分的膜; 含氢的中性基团含有H.,CH 3,C 2 H 5和C 2 H中的任何一种。 或其混合气体; 与大气中的带电粒子的密度相比,气氛中含有氢的中性基团的密度大于1000倍; 并且将绝缘或半导体层暴露于大气的步骤是通过使用具有偏置栅格的等离子体装置进行氢终止的步骤。

    METHOD OF FABRICATING ELECTRON EMISSION SOURCE, ELECTRON EMISSION DEVICE, AND ELECTRON EMISSION DISPLAY DEVICE INCLUDING THE ELECTRON EMISSION DEVICE
    20.
    发明申请
    METHOD OF FABRICATING ELECTRON EMISSION SOURCE, ELECTRON EMISSION DEVICE, AND ELECTRON EMISSION DISPLAY DEVICE INCLUDING THE ELECTRON EMISSION DEVICE 审中-公开
    制造电子发射源的方法,电子发射装置和包括电子发射装置的电子发射显示装置

    公开(公告)号:US20080278062A1

    公开(公告)日:2008-11-13

    申请号:US11865208

    申请日:2007-10-01

    Abstract: A method is provided for fabricating an electron emission source which can attain improved electron emission efficiency and has simplified manufacturing processes. Also provided are an electron emission display device and an electron emission display device fabricated using the method of fabricating an electron emission source. The method includes forming an electrode, forming a carbide compound thin film on the electrode and forming a carbide-induced carbon thin film layer from the carbide compound thin film using an etching gas. The electron emission device and the electron emission display device each include a first electrode, a second electrode disposed to face the first electrode, and a carbide-induced carbon thin film layer formed to be electrically connected to f the first electrode or the second electrode.

    Abstract translation: 提供了一种用于制造能够获得改善的电子发射效率和简化制造工艺的电子发射源的方法。 还提供了使用制造电子发射源的方法制造的电子发射显示装置和电子发射显示装置。 该方法包括形成电极,在电极上形成碳化物化合物薄膜,并使用蚀刻气体从碳化物化合物薄膜形成碳化物诱导的碳薄膜层。 电子发射装置和电子发射显示装置各自包括第一电极,与第一电极相对设置的第二电极和形成为与第一电极或第二电极电连接的碳化物诱导碳薄膜层。

Patent Agency Ranking