Abstract:
PURPOSE: An apparatus of digital MAC for IEEE 802.15.4 system and a system thereof are provided to perform a MAC(Media Access Control) operation without control from the processor. CONSTITUTION: A frame generating unit(410) generates and outputs a frame based on received data, and a frame analyzing unit(420) analyzes the input frame received through a data bus. The frame analyzing unit generates and outputs a control signal and the transceiving data, and a control unit activates the frame generating unit and/or the frame analyzing unit according to the generated control signal. The control unit transmits the outputted frame or data to a processor according to the operation.
Abstract:
PURPOSE: A distance measurement system and a method are provided to minimize a distance error by calculating a separation distance in consideration of an RSSI value. CONSTITUTION: A distance measurement system comprises one or more target node(10) and a reference node(20). The target node transmits a distance measurement acknowledge message according to a received ranging require-message. According to the strength of a radio signal about the distance measurement acknowledge message, the reference node checks whether the separation distance from the target node is lower than a fixed critical short distance or not. The reference node decides the error correction in a CSS mode in consideration of the radio signal strength and measures the separation distance.
Abstract:
A thermosetting paste for thick film resistor, manufacturing method thereof, and thick film resistor are provided to maintain high electric conductance by using filler having negative temperature coefficient of resistance or low coefficient of thermal expansion along with carbon black. A manufacturing method of thermosetting paste for thick film resistor comprises the following steps: a step for preparing for an organic resin(S210); a step for first-mixing the organic resin(S220); a step for second-mixing the organic resin(S230); and a step for performing three roll milling about the organic resin(S240). A carbon black is injected into a first-mixed organic resin. A deaeration and filtering processes are performed about a second-mixed organic resin.
Abstract:
An array guide for a probe pin for testing an LCD panel and a method for manufacturing the same are provided to inspect a pixel fault precisely corresponds to the probe pin with the pixel of the LCD panel. A pad(100) is plated with a conductive film(110) at one side, and formed in the nonconducting substance. A lower slit(200) coats the parylene in order to reduce impact with the probe pin and forms the protective film. A supporter(300) of the nonconducting substance is positioned in one side of the top side of the low slit without the interference with etching hole. An upper slit(400) is formed on the supporter and arranged along the etching hole of the lower slit. The upper slit includes a protective layer by coating parylene to reduce the impact with the probe pin.
Abstract:
A manufacturing method of an AFM(Atomic Force Microscopy) cantilever having a FET(Field Effect Transistor) is provided to easily perform simulation for manufacturing the AFM cantilever having the FET by finely controlling length of an effective channel, and to improve yield of a manufacturing process by using low cost photolithography equipment. A manufacturing method of an AFM cantilever having a FET comprises the steps of forming multilayer insulating film in an upper part of a substrate formed sequentially in an order of a first semiconductor substrate, interlayer insulating film and a second semiconductor substrate, sequentially etching the multilayer insulating film, injecting ions having different type from the second semiconductor substrate and forming a source/drain and a channel, etching the second semiconductor substrate and forming a probe(220) and a probe portion(210), forming the insulating film in a region except the probe and the probe portion, and forming a metal electrode in an upper part of a region of the source/drain and the channel, sequentially etching the multilayer insulating film, the second semiconductor substrate, the insulating film and the first semiconductor substrate, and forming a cantilever portion(230), and etching a rear surface of the first semiconductor substrate and forming a handling portion(240).
Abstract:
A rotary actuating device having a unit for compensating a friction force is provided to control actuating force to rotate a rotary plate by increasing or decreasing an amount of the friction force of each micro moving unit for the rotary plate. A rotary actuating device having a unit for compensating a friction force includes a base(100), a rotary plate(110), a plurality of micro moving units(120), a variable supporting unit(130), and a supporting plate(131). The base(100) is a plate type, supports other components, and forms a lower part of the rotary actuating device. The rotary plate(110) is rotatably installed on an upper part of the base(100). The plurality of micro moving units(120) are installed on a lower plane of the rotary plate(110). The variable supporting unit(130) supports the plurality of micro moving units(120) and controls for each micro moving unit to have uniform friction force for the rotary plate(110). The supporting plate(131) has an upper plane where the plurality of micro moving units(120) are installed and includes through holes(131a) upward and downward on at least three points thereof.