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公开(公告)号：EP2089418A2
公开(公告)日：2009-08-19
申请号：EP07827468.5
申请日：2007-12-04
Applicant: Ramot at Tel-Aviv University Ltd.
Inventor： GAZIT, Ehud , RECHES, Meital
CPC classification number: B01J19/0046 , B01J2219/00596 , B01J2219/00709 , B01J2219/00725 , B81B2203/0361 , B81C1/00031 , B81C2201/0149 , B82Y5/00 , B82Y15/00 , B82Y25/00 , B82Y30/00 , B82Y40/00 , C07K5/06078 , C07K17/14 , Y10S977/793 , Y10S977/896
Abstract: A nanostructure array is disclosed. The nanostructure array comprises a plurality of elongated organic nanostructures arranged generally perpendicularly to a plane.
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192.发明公开METHOD FOR HIGH RESOLUTION PATTERNING USING SOFT X-RAY, PROCESS FOR PREPARING NANO DEVICE USING THE METHOD 审中-公开法与软X射线高分辨率结构，工艺用于制造部件nano采用的程序
公开(公告)号：EP1428074A4
公开(公告)日：2008-02-13
申请号：EP02798054
申请日：2002-09-12
Applicant: POSTECH FOUNDATION
Inventor： PARK JOON WON , LA YOUNG-HYE , MOON JOONG HO , KIM BONGSOO , KANG TAI-HEE , KIM KI-JEONG
IPC: G03F7/075 , G03F7/00 , G03F7/004 , G03F7/16 , G03F7/20 , H01L21/027 , H01L21/033 , G01N33/00
CPC classification number: G03F7/0755 , B81B2201/0214 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , B82Y10/00 , B82Y30/00 , G03F7/0045 , G03F7/165 , G03F7/2039 , H01L21/0337 , H01L21/312 , Y10S430/168 , Y10T428/261
Abstract: A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer
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193.发明公开METHOD FOR HIGH RESOLUTION PATTERNING USING SOFT X-RAY, PROCESS FOR PREPARING NANO DEVICE USING THE METHOD 审中-公开法与软X射线高分辨率结构，工艺用于制造部件nano采用的程序
公开(公告)号：EP1428074A1
公开(公告)日：2004-06-16
申请号：EP02798054.9
申请日：2002-09-12
Applicant: Postech Foundation
Inventor： PARK, Joon Won , LA, Young-Hye , MOON, Joong Ho , KIM, Bongsoo , KANG, Tai-Hee , KIM, Ki-Jeong
IPC: G03F7/00
CPC classification number: G03F7/0045 , B81B2201/0214 , B81C1/00031 , B81C2201/0149 , B81C2201/0198 , B82Y10/00 , B82Y30/00 , G03F7/0755 , G03F7/165 , G03F7/2039 , H01L21/0337 , H01L21/312 , Y10S430/168 , Y10T428/261
Abstract: A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer
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公开(公告)号：EP3347769A1
公开(公告)日：2018-07-18
申请号：EP16763794.1
申请日：2016-09-09
Inventor： POSSEME, Nicolas , SARRAZIN, Aurélien
IPC: G03F7/00
CPC classification number: H01L21/31138 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , H01L21/02115 , H01L21/0337 , H01L21/3065 , H01L21/3086
Abstract: The invention relates to a method for etching an assembled block copolymer layer comprising first and second polymer phases, in which the etching method includes exposing the assembled block copolymer layer to a plasma so as to etch the first polymer phase and simultaneously to deposit a carbon layer on the second polymer phase, the etching method being characterised in that the plasma is formed from a gas mixture comprising a depolymerising gas (Z) and an etching gas selected among the hydrocarbons (C
x H
y ).-
公开(公告)号：EP3225641A1
公开(公告)日：2017-10-04
申请号：EP15847536.8
申请日：2015-09-30
Applicant: LG Chem, Ltd.
Inventor： LEE, Jeong Kyu , LEE, Je Gwon , SONG, In Young , OH, Sung Joon , KANG, Yeon Joo , YOON, Sung Soo , KIM, Jung Keun
IPC: C08F297/00 , C08F299/00 , C08F212/08 , C08F220/10 , C08J5/18 , G03F7/00
CPC classification number: C08L53/005 , B05D1/005 , B05D3/007 , B81C1/00428 , B81C2201/0149 , B82Y40/00 , C01P2002/70 , C07B2200/00 , C08F2/14 , C08F32/06 , C08F212/08 , C08F216/12 , C08F220/10 , C08F220/26 , C08F220/30 , C08F293/00 , C08F293/005 , C08F299/024 , C08F2220/301 , C08F2438/03 , C08G61/08 , C08G61/128 , C08G2261/1424 , C08G2261/1426 , C08G2261/332 , C08G2261/3324 , C08G2261/40 , C08G2261/418 , C08J5/18 , C08J7/123 , C08J2353/00 , C08L53/00 , C08L53/02 , C09D153/00 , G03F7/0002 , G03F7/0046 , G03F7/039 , G03F7/091 , G03F7/16 , G03F7/162 , G03F7/2004 , G03F7/30 , C08F214/182
Abstract: The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.
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Patent Agency Ranking
公开(公告)号：EP3202799A1
公开(公告)日：2017-08-09
申请号：EP15846832.2
申请日：2015-09-30
Applicant: LG Chem, Ltd.
Inventor： LEE, Mi Sook , KIM, Jung Keun , KU, Se Jin , PARK, No Jin , LEE, Je Gwon , CHOI, Eun Young , YOON, Sung Soo , RYU, Hyung Ju
IPC: C08F297/00 , C08F299/00 , C08F212/08 , C08F220/10 , C08L53/00 , C08J5/18
CPC classification number: C08L53/005 , B05D1/005 , B05D3/007 , B81C1/00428 , B81C2201/0149 , B82Y40/00 , C01P2002/70 , C07B2200/00 , C08F2/14 , C08F32/06 , C08F212/08 , C08F216/12 , C08F220/10 , C08F220/26 , C08F220/30 , C08F293/00 , C08F293/005 , C08F299/024 , C08F2220/301 , C08F2438/03 , C08G61/08 , C08G61/128 , C08G2261/1424 , C08G2261/1426 , C08G2261/332 , C08G2261/3324 , C08G2261/40 , C08G2261/418 , C08J5/18 , C08J7/123 , C08J2353/00 , C08L53/00 , C08L53/02 , C09D153/00 , G03F7/0002 , G03F7/0046 , G03F7/039 , G03F7/091 , G03F7/16 , G03F7/162 , G03F7/2004 , G03F7/30 , C08F214/182
Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.
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公开(公告)号：EP3202798A1
公开(公告)日：2017-08-09
申请号：EP15846656.5
申请日：2015-09-30
Applicant: LG Chem, Ltd.
Inventor： PARK, No Jin , KIM, Jung Keun , LEE, Je Gwon , YOON, Sung Soo , KU, Se Jin , LEE, Mi Sook , CHOI, Eun Young , RYU, Hyung Ju
IPC: C08F297/00 , C08F299/00 , C08F212/08 , C08F220/10 , C08L53/00 , C08J5/18
CPC classification number: C08L53/005 , B05D1/005 , B05D3/007 , B81C1/00428 , B81C2201/0149 , B82Y40/00 , C01P2002/70 , C07B2200/00 , C08F2/14 , C08F32/06 , C08F212/08 , C08F216/12 , C08F220/10 , C08F220/26 , C08F220/30 , C08F293/00 , C08F293/005 , C08F299/024 , C08F2220/301 , C08F2438/03 , C08G61/08 , C08G61/128 , C08G2261/1424 , C08G2261/1426 , C08G2261/332 , C08G2261/3324 , C08G2261/40 , C08G2261/418 , C08J5/18 , C08J7/123 , C08J2353/00 , C08L53/00 , C08L53/02 , C09D153/00 , G03F7/0002 , G03F7/0046 , G03F7/039 , G03F7/091 , G03F7/16 , G03F7/162 , G03F7/2004 , G03F7/30 , C08F214/182
Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.
Abstract translation: 本申请涉及单体，用于制备嵌段共聚物的方法，嵌段共聚物及其用途。 本申请的各单体显示出优异的自组装性，并且能够形成根据需要无限制地赋予各种所需功能的嵌段共聚物。
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公开(公告)号：EP3078688A4
公开(公告)日：2017-07-26
申请号：EP14867721
申请日：2014-12-08
Applicant: LG CHEMICAL LTD
Inventor： LEE JE GWON , KIM JUNG KEUN , PARK NO JIN , LEE MI SOOK , KU SE JIN , CHOI EUN YOUNG , YOON SUNG SOO
IPC: C08F212/14 , B82Y40/00 , C08F216/12 , C08F220/10 , C08F220/12 , C08F220/30 , C08F293/00 , C08J5/00 , C08J7/04 , C08L53/00
CPC classification number: C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1852 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
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公开(公告)号：EP3078695A4
公开(公告)日：2017-07-12
申请号：EP14868686
申请日：2014-12-08
Applicant: LG CHEMICAL LTD
Inventor： KIM JUNG KEUN , LEE JE GWON , PARK NO JIN , YOON SUNG SOO
IPC: C08F297/00 , C08F212/12 , C08F212/14 , C08F216/12 , C08F220/10 , C08F220/30 , C08F299/00 , C08J5/00 , C08J7/04 , C08L55/00
CPC classification number: C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1852 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
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公开(公告)号：EP3078691A4
公开(公告)日：2017-07-05
申请号：EP14868190
申请日：2014-12-08
Applicant: LG CHEMICAL LTD
Inventor： LEE MI SOOK , KIM JUNG KEUN , LEE JE GWON , PARK NO JIN , KU SE JIN , CHOI EUN YOUNG , YOON SUNG SOO
IPC: C08F297/00 , C08F212/12 , C08F212/14 , C08F216/12 , C08F220/10 , C08F220/30 , C08F299/00 , C08J5/00 , C08J7/04 , C08L55/00
CPC classification number: C08F293/005 , B81C1/00428 , B81C1/00531 , B81C2201/0149 , B82Y40/00 , C07C35/48 , C07C43/215 , C07C43/225 , C07C217/84 , C07C2601/16 , C07D209/48 , C07F7/1852 , C08F12/20 , C08F12/22 , C08F12/26 , C08F12/32 , C08F212/14 , C08F220/10 , C08F220/30 , C08F2438/03 , C08J5/18 , C08J7/123 , C08J7/14 , C08J2353/00 , C09D153/00 , G03F7/0002 , G03F7/038 , G03F7/039 , G03F7/162
Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.
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