Abstract:
A method for high resolution patterming using low-energy electron beam and a method for manufacturing a nano device using the high resolution pattern are provided. The method involves forming an aromatic imine molecular layer having a substituted or unsubstituted terminal ring on a substrate; selectively changing imine bonds structurally in the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
Abstract:
A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
Abstract:
A method for high resolution patterming using low-energy electron beam and a method for manufacturing a nano device using the high resolution pattern are provided. The method involves forming an aromatic imine molecular layer having a substituted or unsubstituted terminal ring on a substrate; selectively changing imine bonds structurally in the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
Abstract:
A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer