公开(公告)号：JP2008162880A

公开(公告)日：2008-07-17

申请号：JP2007310052

申请日：2007-11-30

Applicant: Corning Inc ,  コーニング インコーポレイテッド

Inventor： BOOKBINDER DANA C ,  GENIER MICHAEL L ,  MOORE LISA A

IPC: C03C3/06 ,  G03F1/14

CPC classification number: G03F7/70958 ,  C03C3/06 ,  C03C13/047 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2201/50

Abstract: PROBLEM TO BE SOLVED: To provide an optical member which exhibits high transmittance at a short wavelength, especially, at 193 nm or shorter and has other desired characteristics. SOLUTION: The optical member has an optical incident axis and is comprised of OD-doped silica glass having an absorption limit λ (limit) at 165 nm or shorter. In a certain embodiment, the OD-doped silica glass further contains fluorine. In another embodiment, the OD-doped silica glass contains fluorine of less than about 5,000 mass ppm. Furthermore, in another embodiment, the OD-doped silica glass contains Na of less than about 50 mass ppb. In an embodiment, the optical member is a photomask substrate to be used at a wavelength of shorter than 190 nm. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在短波长，特别是在193nm或更短波长下表现出高透射率并且具有其它所需特性的光学部件。 光学构件具有光入射轴，并且由在165nm以下的吸收极限λ（极限）的OD掺杂石英玻璃构成。 在一个实施方案中，掺杂OD的石英玻璃还含有氟。 在另一个实施方案中，掺杂OD的石英玻璃含有小于约5,000质量ppm的氟。 此外，在另一个实施方案中，掺杂OD的石英玻璃含有小于约50质量ppm的Na。 在一个实施例中，光学构件是在短于190nm的波长下使用的光掩模衬底。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP3672592B2

公开(公告)日：2005-07-20

申请号：JP16086394

申请日：1994-07-13

Applicant: 信越化学工業株式会社

Inventor： 久利 大塚 ,  武 青山

IPC: C01B33/12 ,  C03B19/09 ,  C03B20/00

CPC classification number: C03B19/09 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/10

公开(公告)号：EP3390304A1

公开(公告)日：2018-10-24

申请号：EP16819513.9

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  WITTRIN, Mirko ,  WILDE, Markus

IPC: C03B20/00 ,  C03B37/012 ,  C03C3/06 ,  C03B17/04 ,  C03B19/10 ,  F26B3/12

CPC classification number: C03B19/108 ,  C03B17/04 ,  C03B19/106 ,  C03B37/0128 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/10 ,  F26B3/12

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, step i.) comprising step I. providing a silica powder and step II. processing the powder to obtain a silica granulate, the processing involving spray drying a silica suspension using a nozzle. The nozzle has a contact surface to the suspension composed of glass, plastic or a combination thereof. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to the production of a silica granulate. The invention finally relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP3390303A2

公开(公告)日：2018-10-24

申请号：EP16816656.9

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  SÖHN, Matthias

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012 ,  F27D7/02 ,  C03B17/04 ,  C03B5/06 ,  C03B19/10

CPC classification number: C03B20/00 ,  C03B5/06 ,  C03B17/04 ,  C03B19/108 ,  C03B37/01211 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/40

Abstract: The invention relates to a method for producing a silica glass body, comprising the method steps: i.) providing silicon dioxide particles ii.) forming a glass melt from the silicon dioxide particles in a furnace and iii.) forming a silica glass body from at least one portion of the glass melt, wherein the furnace has a gas outlet, through which gas can be removed from the furnace and the dew point of the gas exiting the furnace through the gas outlet is less than 0°C. The invention also relates to a silica glass body that can be obtained by this method. In addition, the invention relates to a light guide, a lighting means and a shaped body, each of which can be obtained by subsequent processing of the silica glass body.

公开(公告)号：EP3390296A2

公开(公告)日：2018-10-24

申请号：EP16809881.2

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  SÖHN, Matthias

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012 ,  C03B19/10 ,  C03B17/04

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/106 ,  C03B19/1095 ,  C03B37/01211 ,  C03C1/022 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate which is made from pyrogenic silica powder and has a BET surface area ranging from 20 to 40 m2/g, ii.) forming a glass melt from the silica granulate in a furnace, and iii.) forming a silica glass article from at least some of the glass melt, the furnace including at least a first chamber and another chamber which are connected to one another by a passage, the temperature in the first chamber being lower than the temperature in the other chamber. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP3040749B1

公开(公告)日：2017-07-19

申请号：EP15194929.4

申请日：2015-11-17

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： TAMURA, Yoshiaki ,  HARUNA, Tetsuya ,  SAITO, Yoshihiro ,  KAWAGUCHI, Yuki ,  HIRANO, Masaaki

IPC: G02B6/02 ,  C03C3/06 ,  C03B37/018 ,  C03B37/012 ,  C03B37/014

CPC classification number: G02B6/02 ,  C03B37/01211 ,  C03B37/014 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/06 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50 ,  C03B2203/22 ,  C03B2203/26 ,  C03B2205/40 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/50 ,  C03C2203/40

公开(公告)号：EP3148947A1

公开(公告)日：2017-04-05

申请号：EP15725858.3

申请日：2015-05-21

Applicant: Fibercore Limited

Inventor： EMSLIE, Christopher ,  MATON, Peter ,  COOPER, Laurence ,  BERGONZO, Aurélien

IPC: C03B37/018 ,  G02B6/02

CPC classification number: G02B6/02 ,  C03B37/01853 ,  C03B37/01869 ,  C03B37/025 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03C2201/11 ,  G02B6/028

Abstract: An optical fiber package is described comprising a light transmitting core having a core diameter, a coating layer surrounding the core, and wherein the amount of chlorine in the light transmitting core region is homogeneous and comprises at least 3000 ppm. The fiber package is such that the optical fiber core exhibits a reduction in the hydrogen induced attenuation losses. A method for fabricating the optical fiber package is also disclosed.

Abstract translation: 描述了一种光纤封装，其包括具有芯直径的透光芯，围绕芯的涂层，并且其中透光芯区中的氯的量是均匀的，并且包括至少3000ppm。 光纤封装使得光纤芯显示出氢诱导的衰减损耗的降低。 芯可以包括SiO 2。 还公开了一种制造光纤封装的方法。

公开(公告)号：EP1154294B1

公开(公告)日：2012-08-29

申请号：EP99959842.8

申请日：1999-12-16

Applicant: Sumitomo Electric Industries, Ltd.

Inventor： SASAOKA, Eisuke,

IPC: G02B6/00 ,  C03B37/018

CPC classification number: C03C13/046 ,  C03B37/01446 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2203/22 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  G02B6/02019 ,  G02B6/02257 ,  G02B6/02266 ,  G02B6/03627

公开(公告)号：EP1580170A4

公开(公告)日：2011-12-28

申请号：EP03775963

申请日：2003-11-28

Applicant: SHINETSU QUARTZ PROD

Inventor： SATO TATSUHIRO ,  KAITOU TAKAHIRO ,  FUJINOKI AKIRA ,  KATO TOSHIYUKI ,  SEGAWA TOHRU; ,  YOSHIDA NOBUMASA

IPC: C03C3/06 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

公开(公告)号：EP1394127A4

公开(公告)日：2008-04-30

申请号：EP02720535

申请日：2002-04-19

Applicant: NIPPON KOGAKU KK

Inventor： KOMINE NORIO ,  YOSHIDA AKIKO ,  JINBO HIROKI ,  FUJIWARA SEISHI

IPC: C03C3/06 ,  C03B19/14 ,  C03C4/00 ,  C03C23/00 ,  G02B1/00 ,  G02B1/02 ,  G02B13/14 ,  G03F7/20 ,  H01L21/027

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1x10 molecules/cm nor more than 5x10 molecules/cm , and wherein a difference A-B between an absorption coefficient A immediately before an end of irradiation with 1x10 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm . When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.