Abstract:
Synthetic quartz glass is prepared by subjecting a silicon-providing feedstock to flame hydrolysis in oxyhydrogen flame, depositing silica fine particles on a rotating quartz glass target while concurrently melting and vitrifying them, thereby forming a synthetic quartz glass ingot, shaping, annealing, and effecting dehydrogenation treatment at a temperature of at least 600° C. and a pressure of up to 5 Pa for a holding time of at least 12 hours. The synthetic quartz glass has a high helium gas permeability and is suited for forming nanoimprint molds.
Abstract:
An easily producible optical fiber preform which is drawn to an optical fiber having a core containing a sufficient concentration of alkali metal is provided. An optical fiber preform 10 is composed of silica-based glass and includes a core portion 20 and a cladding portion 30. The core portion 20 includes a first core portion 21 including a central axis and a second core portion 22 disposed on the perimeter of the first core portion 21. The cladding portion 30 includes a first cladding portion 31 disposed on the perimeter of the second core portion 22 and a second cladding portion 32 disposed on the perimeter of the first cladding portion 31. The core portion 20 contains an alkali metal at an average concentration of 5 atomic ppm or more. The concentration of the OH group in the perimeter portion of the first cladding portion 31 is 200 mol ppm or more.
Abstract:
An easily producible optical fiber preform which is drawn to an optical fiber having a core containing a sufficient concentration of alkali metal is provided. An optical fiber preform 10 is composed of silica-based glass and includes a core portion 20 and a cladding portion 30. The core portion 20 includes a first core portion 21 including a central axis and a second core portion 22 disposed on the perimeter of the first core portion 21. The cladding portion 30 includes a first cladding portion 31 disposed on the perimeter of the second core portion 22 and a second cladding portion 32 disposed on the perimeter of the first cladding portion 31. The core portion 20 contains an alkali metal at an average concentration of 5 atomic ppm or more. The concentration of the OH group in the perimeter portion of the first cladding portion 31 is 200 mol ppm or more.
Abstract:
Provided is a method for producing an optical fiber having low attenuation and including a core that contains an alkali metal element. An optical fiber preform that includes a core part and a cladding part is drawn with a drawing apparatus 1 to form an optical fiber 30, the core part having an average concentration of an alkali metal element of 5 atomic ppm or more and the cladding part containing fluorine and chlorine. The optical fiber includes a glass portion and resin coating portion and the glass portion is under residual stress that is a compressive stress of 130 MPa or less. During the drawing, the time during which an individual position of the optical fiber preform is maintained at 1500° C. or higher is 110 minutes or less.
Abstract:
A method for producing a silica container having a rotational symmetry includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.
Abstract:
It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
Abstract:
A fused silica glass having a refractive index homogeneity of less or equal to about 5 ppm over an aperture area of at least about 50 cm2. The fused silica glass is also substantially free of halogens and has an adsorption edge of less than about 160 nm. The glass is dried by exposing a silica soot blank to carbon monoxide before consolidation, reducing the combined concentration of hydroxyl (i.e., OH, where H is protium (11H) and deuteroxyl (OD), where D is deuterium (12H)) of less than about 20 ppm by weight in one embodiment, less than about 5 ppm by weight in another embodiment, and less than about 1 ppm by weight in a third embodiment.
Abstract:
A method for producing an optical fiber preform according to the present invention includes a collapse step of collapsing a silica-based glass tube by heating with a heat source continuously traversed in the longitudinal direction of the glass tube to form a first glass rod to be formed into a core part or part of a core part of an optical fiber, the glass tube having an inner surface doped with an alkali metal, in which the glass tube has a maximum alkali metal concentration of 500 to 20,000 atomic ppm, a maximum chlorine concentration of 0 to 1000 atomic ppm, and a maximum fluorine concentration of 0 to 10,000 atomic ppm, and in which in the collapse step, the maximum temperature of the outer surface of the glass tube is 2000° C. to 2250° C., and the traverse speed of the heat source is 30 mm/min to 100 mm/min.
Abstract:
A method for manufacturing at least one lens of synthetic quartz glass with increased H2 content for an optical system with an operating wavelength of less than 250 nm. The method involves: (1) providing at least one precursor product of synthetic quartz glass with a first H2 content, the precursor product having a circumferential border surface and two mutually opposed base surfaces, wherein at least one partial surface of at least one of the base surfaces has a curvature; (2) determining at least one target value for at least one treatment parameter for treating the precursor product in an H2-containing inert gas atmosphere; (3) treating the precursor product in the H2-containing atmosphere in accordance with the target value of the treatment parameter, thereby producing at least one precursor product of synthetic quartz glass with a second H2 content that is greater than the first H2 content; and (4) working at least part of at least one of the base surfaces of the treated precursor product, thereby producing at least one final lens shape.
Abstract:
First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.