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    Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof
    221.
    发明授权
    Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof 有权
    用于EUV光刻中的用于镜面基板的二氧化硅含量高的钛掺杂玻璃空白及其制造方法

    公开(公告)号：US08931307B2

    公开(公告)日：2015-01-13

    申请号：US13499352

    申请日：2010-09-28

    Applicant: Bodo Kuehn

    Inventor： Bodo Kuehn

    IPC: B32B17/00 ,  C03B23/13 ,  C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06

    CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

    Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

    Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

    VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS
    222.
    发明申请
    VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS 有权
    非常低的CTE斜率DOPED SILICA-TITANIA玻璃

    公开(公告)号：US20140155246A1

    公开(公告)日：2014-06-05

    申请号：US13835039

    申请日：2013-03-15

    Applicant: CORNING INCORPORATED

    Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

    IPC: G03F1/22

    CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

    Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

    Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

    Low expansivity, high transmission titania doped silica glass
    224.
    发明授权
    Low expansivity, high transmission titania doped silica glass 有权
    低膨胀性，高透射二氧化钛掺杂石英玻璃

    公开(公告)号：US08541325B2

    公开(公告)日：2013-09-24

    申请号：US13028472

    申请日：2011-02-16

    Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

    Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

    IPC: C03C3/06

    CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G03F1/60 ,  G03F7/0002 ,  G03F7/70958

    Abstract: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

    Abstract translation: 在一个实施方案中，本公开涉及在340nm至840nm的波长下具有> 90％/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中，在340nm至840nm的波长下，内透射率> 93％/ cm。 在另一个实施方案中，在340nm至840nm的波长下，内透射率> 95％/ cm。 在另一个实施方案中，本发明涉及一种二氧化硅 - 二氧化钛玻璃，其透射率通过玻璃制成的光学透镜在340nm至840nm的波长处> 84％。 在另一个实施例中，通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86％。 在另一实施例中，通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88％。 在另一个实施方案中，二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

    Process for producing porous quartz glass object, and optical member for EUV lithography
    226.
    发明授权
    Process for producing porous quartz glass object, and optical member for EUV lithography 失效
    用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件

    公开(公告)号：US08356494B2

    公开(公告)日：2013-01-22

    申请号：US13210673

    申请日：2011-08-16

    Applicant: Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    Inventor： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

    IPC: C03B37/018 ,  C03C3/06

    CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

    Abstract: A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

    Abstract translation: 一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有 至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体： 一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

    PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
    230.
    发明申请
    PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
    用于生产多孔石英玻璃物体的工艺和用于EUV光刻的光学部件

    公开(公告)号：US20110301015A1

    公开(公告)日：2011-12-08

    申请号：US13210673

    申请日：2011-08-16

    Applicant: Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

    Inventor： Takahiro MITSUMORI ,  Yasutomi Iwahashi ,  Akio Koike

    IPC: C03C3/04 ,  C03B20/00

    CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

    Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

    Abstract translation: 本发明涉及一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积和生长在基材上， 其中燃烧器具有至少两个喷嘴，其中包含（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体和（D）一种或 选自稀土气体，N 2，CO 2，卤化氢和H 2 O的更多气体，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

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