公开(公告)号：DE19544493A1

公开(公告)日：1997-06-05

申请号：DE19544493

申请日：1995-11-29

Applicant: BASF AG

Inventor： HAEUSSLING LUKAS ,  BERNHARD LUDWIG ,  REICH WOLFGANG ,  SCHWALM REINHOLD ,  BECK ERICH ,  HARTMANN GABRIELE

IPC: C08F2/46 ,  C08F2/54 ,  C08F10/14 ,  C08F20/10 ,  C08F210/14 ,  C08F290/00 ,  C08F290/06 ,  C09D4/02 ,  C08F220/20 ,  C09D133/04 ,  C09D167/07 ,  C09D175/16 ,  C08L33/04 ,  C08L67/07 ,  C08L63/10 ,  C08L75/16

Abstract: A radiation-hardenable compsn. based on radiation-hardenable radically-polymerisable cpds. contains alpha -olefins with more than 8 C.

公开(公告)号：CA1335338C

公开(公告)日：1995-04-25

申请号：CA607987

申请日：1989-08-10

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BINDER HORST

IPC: G03F7/32

Abstract: An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) (I) where R1 to R5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl. It is suitable for developing positive-working photoresists.

公开(公告)号：CA1334898C

公开(公告)日：1995-03-28

申请号：CA597191

申请日：1989-04-19

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  FISCHER MARTIN ,  BINDER HORST

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: A radiation sensitive mixture useful for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, and in addition (c) a nonphotosensitive organic compound which contains at least one acid cleavable bond and the solubility of which in an aqueous alkaline developer is increased by the action of acid, or (d) a nonphotosensitive organic compound which contains at least one acid cleavable bond and which by the action of acid decomposes in such a way as to be completely removable by treatment at from 60 to 120.degree.C

公开(公告)号：DE3775188D1

公开(公告)日：1992-01-23

申请号：DE3775188

申请日：1987-12-04

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BINDER HORST

IPC: C08F12/00 ,  C08F20/34 ,  C08F22/32 ,  C08F212/14 ,  C08F220/36 ,  C08F222/00 ,  C08F222/22 ,  C08F222/32 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039

Abstract: Copolymer (I) contains units derived from (a) 5-50 (mole) % o-nitro(het)arylalkyl unsatd. carboxylate ester (II), (b) 95-50% p-hydroxy- or O-substd. p-hydroxy-styrene or -alpha-methyl-styrene cpd. (III) of the given formulae and (c) 0-30% other olefinically unsatd. organic comonomer(s) forming homopolymers which are transparent in the 250-400 nm range. In (I) and (II) A = an opt. substd. aromatic or heteroaromatic ring system with 5-14 ring members; X = H, 1-8C alkyl or an opt. substd. aryl or aralkyl gp., Y = a 2-6C ethylenically unsatd. gp., R1 = H or Me; R2 = H, halogen or 1-6C alkyl; R3 = H, 1-6C alkyl, acetyl, benzoyl, 1-6C alkylsilyl, 1-6C alkoxysilyl or tert.-butoxycarbonyl.

公开(公告)号：AU607780B2

公开(公告)日：1991-03-14

申请号：AU1861388

申请日：1988-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26 ,  C07C149/46

Abstract: Sulphonium salts of the formula … … in which R , R and R are identical to or different from one another and represent aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R to R are linked to one another to form a ring, with the proviso that at least one of the radicals R to R contains at least one grouping cleavable by acid or one of the radicals R to R is linked to one or more further sulphonium salt radicals, if desired via groupings cleavable by acid, and X denotes a non-nucleophilic counterion… are suitable as photoinitiators for cationic polymerisation.