公开(公告)号：US08039409B2

公开(公告)日：2011-10-18

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/06 ,  C03C3/076

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率，T400-3,000，70％以上。

公开(公告)号：US20110179827A1

公开(公告)日：2011-07-28

申请号：US13080704

申请日：2011-04-06

Applicant: Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

Inventor： Chikaya TAMITSUJI ,  Kunio Watanabe ,  Akio Koike

IPC: C03B8/04 ,  C03B20/00

CPC classification number: C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/42

Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Abstract translation: 本发明涉及一种氟浓度为1000质量ppm以上的合成石英玻璃的制造方法，其特征在于，包括：（a）沉积和生长通过玻璃成形的火焰水解得到的石英玻璃微粒子的工序 原料在基板上，从而形成多孔玻璃体; （b）将多孔玻璃体保持在填充有元素氟（F2）的反应容器或包含用惰性气体稀释的元素氟（F2）的混合气体并含有固体金属氟化物的步骤，从而获得 含氟多孔玻璃体; 和（c）将含氟多孔质玻璃体加热至透明玻璃化温度的步骤，得到含氟透明玻璃体。

公开(公告)号：US20110107794A1

公开(公告)日：2011-05-12

申请号：US13001920

申请日：2008-06-30

Applicant: Tomomi Ichinose ,  Toru Achiwa

Inventor： Tomomi Ichinose ,  Toru Achiwa

IPC: B29D11/00 ,  C03B8/00

CPC classification number: C03B37/016 ,  C03B19/12 ,  C03B37/027 ,  C03B2203/26 ,  C03C1/006 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26

Abstract: [Object] In manufacturing a GRIN lens by a sol-gel method, an operation for preparing a wet gel is facilitated and cracking in a base material during sintering and foaming during drawing are prevented.[Solution] The object is achieved by obtaining a GRIN lens by producing a wet gel from an alcohol solution containing a silicon alkoxide, a dopant alkoxide, and a boron alkoxide as the main ingredients, leaching the same, drying the same to form a dry gel, and sintering and drawing the same.

Abstract translation: 在通过溶胶 - 凝胶法制造GRIN透镜时，促进制备湿凝胶的操作，并且防止了在烧结期间的基材中的裂纹和拉伸期间的发泡。 [解决方案]通过从含有硅醇盐，掺杂剂醇盐和硼醇盐的醇溶液中生产湿凝胶作为主要成分，通过获得GRIN透镜获得GRIN透镜，浸出，干燥，​​形成干燥 凝胶，烧结和拉丝。

公开(公告)号：US20110028299A1

公开(公告)日：2011-02-03

申请号：US12904236

申请日：2010-10-14

Applicant: Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

Inventor： Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

IPC: C03C3/04

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率为T400〜3000，为70％以上。

公开(公告)号：US20100179047A1

公开(公告)日：2010-07-15

申请号：US12718776

申请日：2010-03-05

Applicant: Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

Inventor： Akio KOIKE ,  Chikaya Tamitsuji ,  Kunio Watanabe ,  Tomonori Ogawa

IPC: C03C3/06 ,  C03C10/00

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1461 ,  C03B25/02 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/36 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ΔTi3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract translation: 本发明涉及一种含有TiO2含量为3〜10质量％的含TiO 2的二氧化硅玻璃的光学构件， Ti3 +浓度为100重量ppm以下; 0-100℃的热膨胀系数，CTE0-100，为0±150ppb /℃。 并且在400〜700nm的波长范围内的内部透射率，每1mm厚度，T400〜700，为80％以上，其中光学部件具有Ti 3+浓度的变化比与Ti 3+的平均值的比值， 在光学用表面上的浓度＆Dgr; Ti 3+ / Ti 3+为0.2以下。

公开(公告)号：US07585598B2

公开(公告)日：2009-09-08

申请号：US11634270

申请日：2006-12-06

Applicant: Shigeru Maida ,  Motoyuki Yamada

Inventor： Shigeru Maida ,  Motoyuki Yamada

IPC: G03F1/00 ,  C03C3/06 ,  G02B1/00

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US20090017257A1

公开(公告)日：2009-01-15

申请号：US12233884

申请日：2008-09-19

Applicant: Koji OTSUKA ,  Hiroshi Kojima ,  Masabumi Ito

Inventor： Koji OTSUKA ,  Hiroshi Kojima ,  Masabumi Ito

IPC: B32B17/00 ,  C03B8/00

CPC classification number: C03C15/02 ,  B24B7/242 ,  B24B37/08 ,  C03C3/06 ,  C03C19/00 ,  C03C23/005 ,  C03C23/006 ,  C03C2201/42 ,  C03C2204/08 ,  Y10T428/24355

Abstract: The present invention is to provide a processing method for manufacturing a highly flat and highly smooth glass substrate with good productivity. A highly flat and highly smooth glass substrate is obtained with good productivity by processing of a glass substrate, which comprises a step of measuring the surface shape of the glass substrate prior to processing, a step of processing the surface of the substrate by changing a processing condition for each site (first processing step), and a step of finish-polishing the surface of the glass substrate that has been subjected to the first processing step (second processing step). At that time, the processing condition for each site within the surface of the substrate in the first processing step is determined from a processing amount that is determined from the concave-convex shape of the surface of the glass substrate prior to processing and the in-plane distribution of a processing amount by the second processing step separately measured by using a similar substrate.

Abstract translation: 本发明提供一种以高生产率制造高度平坦且高度光滑的玻璃基板的加工方法。 通过处理玻璃基板，通过加工玻璃基板，以高生产率获得高度平坦且高度平滑的玻璃基板，其包括在处理之前测量玻璃基板的表面形状的步骤，通过改变处理来处理基板的表面的步骤 （第一处理步骤），以及对经过第一处理步骤（第二处理步骤）的玻璃基板的表面进行精抛光的步骤。 此时，根据从处理前的玻璃基板的表面的凹凸形状确定的处理量来确定第一处理工序中的基板的表面内的每个部位的处理条件， 通过使用相似的基板分别测量的第二处理步骤的处理量的平面分布。

公开(公告)号：US07429546B2

公开(公告)日：2008-09-30

申请号：US11172950

申请日：2005-07-05

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/076 ,  C03C3/11 ,  C03C3/112 ,  C03B19/06 ,  C03B37/018

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其具有至多1200℃的假想温度，至少100ppm的F浓度和0±200ppb /℃的热膨胀系数。 0至100℃。一种制备含有TiO 2的石英玻璃的方法，其包括在通过玻璃形成材料的火焰水解获得的目标石英玻璃颗粒上形成多孔玻璃体的步骤 ，获得含氟多​​孔玻璃体的步骤，获得含氟玻璃化玻璃体的步骤，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20080153930A1

公开(公告)日：2008-06-26

申请号：US11951777

申请日：2007-12-06

Applicant: Guang-Way Jang ,  Ya-Hui Lin ,  Mei-Chih Hung ,  Pei Tien

Inventor： Guang-Way Jang ,  Ya-Hui Lin ,  Mei-Chih Hung ,  Pei Tien

IPC: B01F3/12

CPC classification number: C04B35/624 ,  C03C1/006 ,  C03C1/008 ,  C03C2201/31 ,  C03C2201/3423 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26 ,  C03C2203/27 ,  C03C2203/28 ,  C04B2235/3229 ,  C04B2235/3232 ,  C04B2235/3244 ,  C04B2235/3287 ,  C04B2235/3293 ,  C04B2235/3418 ,  C04B2235/441

Abstract: A method of preparing a sol-gel material is described. A M(OR)x and an organically modified Si-alkoxide having a predetermined functional group are dissolved in a first solvent and a second solvent to form a first solution and a second solution, respectively. The first solution and the second solution are then mixed and heated. As a result, the M(OR)x reacts with the organically modified Si-alkoxide to form a functionalized sol-gel material. Furthermore, the solid content of the functionalized sol-gel material is increased by transferring the same into another solvent. Therefore, a thick sol-gel film is fabricated by means of the transferred functionalized sol-gel material.

Abstract translation: 描述了制备溶胶 - 凝胶材料的方法。 将具有预定官能团的M（OR）x和有机改性的Si-醇盐溶解在第一溶剂和第二溶剂中以分别形成第一溶液和第二溶液。 然后将第一溶液和第二溶液混合并加热。 结果，M（OR）x与有机改性的Si-醇盐反应形成官能化的溶胶 - 凝胶材料。 此外，通过将官能化溶胶 - 凝胶材料的固体含量转移到另一种溶剂中而增加。 因此，通过转移的官能化溶胶 - 凝胶材料制造厚溶胶 - 凝胶膜。

公开(公告)号：US20080103038A1

公开(公告)日：2008-05-01

申请号：US11962936

申请日：2007-12-21

Applicant: Mitsuhiro Kawata ,  Akira Takada ,  Hideaki Hayashi ,  Naoki Sugimoto ,  Shinya Kikugawa

Inventor： Mitsuhiro Kawata ,  Akira Takada ,  Hideaki Hayashi ,  Naoki Sugimoto ,  Shinya Kikugawa

IPC: C03C3/06 ,  C03C3/076

CPC classification number: C03C3/06 ,  C03C4/0085 ,  C03C2201/30 ,  C03C2201/42

Abstract: It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnO2 and from 3 to 10 mass % of Ti calculated as TiO2, which has a homogeneity of the coefficient of thermal expansion from 0 to 100° C. to the temperature of from 50 to 200 ppb/° C., a coefficient of thermal expansion from 0 to 100° C. of 0±250 ppb/° C., and a Vickers hardness of at most 650.

Abstract translation: 获得适合作为构成用于EUVL的光学系统的光学材料的石英玻璃，其具有0至100℃的低热膨胀系数，并且其中凹陷缺陷的形成被抑制 在抛光步骤中达到高水平的平整度。 含有0.1〜10质量％的以SnO 2 2计的Sn和3〜10质量％的TiO 2计算的二氧化硅玻璃，其Ti均匀度为 热膨胀系数为0〜100℃，温度为50〜200ppb /℃，0〜100℃的热膨胀系数为0±250ppb /℃，Vickers 硬度至多650。