Abstract:
A withdrawn electrode is formed on a silicon substrate with intervention of upper and lower silicon oxide films each having circular openings corresponding to regions in which cathodes are to be formed. Tower-shaped cathodes are formed in the respective openings of the upper and lower silicon oxide films and of the withdrawn electrode. Each of the cathodes has a sharply tapered tip portion having a radius of 2 nm or less, which has been formed by crystal anisotropic etching and thermal oxidation process for silicon. The region of the silicon substrate exposed in the openings of the upper and lower silicon oxide films and the cathode have their surfaces coated with a thin surface coating film made of a material having a low work function.
Abstract:
The present invention relates to an electron tube having a configuration which can maintain its operating stability for a long period of time. The electron tube comprises, at least, a field emitter which is made of diamond or a material mainly composed of diamond and has a surface terminated with hydrogen, and a sealed envelope for accommodating the diamond field emitter. Due to the hydrogen termination, the electron affinity of the diamond field emitter is set to a negative state. Also, hydrogen is enclosed within the sealed envelope. Due to this configuration, the hydrogen-terminated state of the diamond field emitter surface is stabilized, and the electron affinity of the diamond emitter is restrained from changing for a long period of time.
Abstract:
A field emitter array magnetic sensor (FEAMS) device, comprising: an anode; a base plate member having on a first side thereof a plurality of gated field emitter elements thereon, in spaced proximal relationship to the anode. The plurality of gated field emitter elements and the anode structure are arranged so that each of the gated field emitter elements is in electron emitting relationship to varying electron impingement sites depending on intensity of the magnetic field on the gated field emitter element. The device includes structure for sensing the locations of the anode structure electron impingement sites receiving electrons from the plurality of gated field emitter elements, and determining the strength and orientation of the magnetic field. Also disclosed are various anode configurations which may be usefully employed in the FEAMS device of the invention.
Abstract:
A matrix field-emission cathode (5) comprises a monocrystalline silicon substrate (7) on which are arranged epitaxially grown pointed silicon emitters (1) which also act as a ballast resistor connected in series. In an advantageous embodiment of the proposed cathode, for a radius of curvature (r) at the emitter tip not exceeding 10 nm, the ratio of the height (h) of the emitter to the radius (r) is not less than 1000, while the ratio of (h) to the diameter (D) at the emitter base is not less than 1. The angle alpha at the emitter tip does not exceed 30 DEG . The specific resistance of the emitter material is chosen so as to ensure that the resistance of each emitter will be comparable with the resistance between the cathode and the opposing electrode. The proposed cathode is used in an electronic device for displaying information which also has an anode (3) in the form of a strip (11) of phosphorescent material (10) and a conducting layer (9) whose projection onto the cathode (5) is perpendicular to the conducting paths (6) on the cathode; the anode itself acts as the control electrode.
Abstract:
A field emission cathode includes a layer of conductive material (14) and a layer of amorphic diamond film (12), functioning as a low effective work-function material, deposited over the conductive material to form emission sites. The emission sites each contain at least two sub-regions having differing electron affinities.
Abstract:
Cette source comprend, sur un substrat isolant (2), au moins un conducteur cathodique (4), une couche isolante (6) qui recouvre celui-ci, au moins une grille (8) formée sur la couche isolante, des trous (10) étant formés à travers cette grille et la couche isolante, et des micro-pointes (12) qui sont faites d'un matériau métallique émetteur d'électrons, formées dans ces trous et recouvertes d'un dépôt (13) de particules de carbone diamant ou de type diamant formé par électrophorèse ou par co-dépôt électrochimique de métal et de carbone diamant ou de type diamant.
Abstract:
Zur Herstellung einer elektrisch leitenden Spitze (7) aus dotiertem Silizium wird durch Molekularstrahlepitaxie aus dotiertem Silizium auf einem Substrat (1) aus monokristallinem Silizium innerhalb einer Öffnung (5) einer Maske die Spitze (7) aus dotiertem Silizium und auf der Oberfläche der Maske (4) eine dotierte Siliziumschicht (8) erzeugt. Die Spitze ist insbesondere als Feldemissionskathode für Bauelemente der Vakuumelektronik geeignet.
Abstract:
The present invention provides a field emission device and a process for producing the same. The device comprises a cathode (2) projecting from the surface of a substrate (1), an insulating layer (3) provided on the surface of the substrate, which insulating layer is open at the location of the cathode, and a gate electrode (4) provided on the surface of the insulating layer, which gate electrode is open at the location of the cathode. In the production of the device, the cathode and the insulating layer are fabricated by forming both from a layer of a material by supplying insulating impurities into a portion only of the layer of material for forming the insulating layer whilst leaving another portion of the layer of material as the cathode. Consequently, the cathode and the insulating layer are formed from the same basic material and the same basic layer, which is advantageous from a manufacturing point of view.
Abstract in simplified Chinese:电子发射器之功函数,可使用离子布植在表面上形成一功函数修正层而得以修正。方法的开始是,在一受控制的环境下,在电子发射器的表面之下,以选定的元素作低能量布植。在某些情况下,被布植之物种够深,而在接下来的低温加工中不会与大气反应。在这些情况下,在一受控制的环境(如,真空和/或反应性气体)中,使用对于发射器作升温的热处理,而将被布植物种偏析到发射表面。被布植离子在表面上生成一功函数修正层,例如,在发射器表面顶部以被布植物种之薄层形式而生成,或在发射器表面以化合物或合金层的形式生成。依被布植之物种、起始之发射器物质、及受控制之环境而定,这些层会增加或减少发射器之功函数。。