公开(公告)号：US20140272178A1

公开(公告)日：2014-09-18

申请号：US13798581

申请日：2013-03-13

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Shao-Hua WANG ,  Ming-Te Chen ,  Sheng-Wei Lee

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/201 ,  H01J2237/20214 ,  H01J2237/20228

Abstract: An ion implantation apparatus and a method for ion implantation provides for implanting multiple substrates simultaneously. The different substrates are on corresponding platens within an ion implantation chamber or they may be positioned on separate substrate holders on a single oversized platen. The substrates and platen or platens, are translatable with respect to an ion beam, the individual substrates are rotatable and the position of the substrates relative to one another in the ion implantation chamber are movable. By rotating, translating and repositioning substrates during the ion implantation process, the entirety of all substrates are implanted by an ion beam even when the ion beam has a relatively small footprint and a relatively short scan length, compared to the diameters of the substrates undergoing implantation.

Abstract translation: 离子注入装置和用于离子注入的方法提供了同时植入多个衬底。 不同的衬底位于离子注入室内的相应压板上，或者它们可以位于单个超大压板上的分离的衬底保持器上。 基板和压板或压板可以相对于离子束平移，各个基板是可旋转的，并且离子注入室中的基板相对于彼此的位置是可移动的。 通过在离子注入工艺期间旋转，平移和重新定位衬底，与所进行的衬底的直径相比，即使当离子束具有相对小的占地面积和相对短的扫描长度时，所有衬底的整体也被离子束注入 。

公开(公告)号：US20140197311A1

公开(公告)日：2014-07-17

申请号：US14154753

申请日：2014-01-14

Applicant: FEI Company

Inventor： Frank Nederlof

IPC: H01J37/20

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/2251 ,  H01J2237/201 ,  H01J2237/26

Abstract: The invention relates to a sample carrier for a transmission electron microscope. When using state of the art sample carriers, such as half-moon grids in combination with detectors detecting, for example, X rays emitted at a large emittance angle, shadowing is a problem. Similar problems occur when performing tomography, in which the sample is rotated over a large angle.The invention provides a solution to shadowing by forming the parts of the grid bordering the interface between sample and grid as tapering parts.

Abstract translation: 本发明涉及透射电子显微镜的样品载体。 当使用现有技术的样品载体（例如半月形网格结合检测器检测例如以大的发射角发射的X射线）时，阴影是一个问题。 执行断层扫描时会出现类似的问题，其中样品在大角度旋转。 本发明通过形成与样品和格栅之间的界面接近的网格部分作为渐缩部分来提供阴影的解决方案。

公开(公告)号：US08740209B2

公开(公告)日：2014-06-03

申请号：US13402708

申请日：2012-02-22

Applicant: Lucille A. Giannuzzi

Inventor： Lucille A. Giannuzzi

IPC: B23Q3/00 ,  B23Q7/00 ,  B29C65/00 ,  B31B1/60 ,  B32B37/00

CPC classification number: H01J37/3002 ,  G01N1/00 ,  G01N1/32 ,  H01J37/20 ,  H01J2237/201 ,  H01J2237/31745

Abstract: A specimen carrier for use with an ex-situ lift-out (EXLO) milling process includes a carrier top surface having at least one specimen support area and at least one aperture formed through the specimen carrier top surface. The aperture includes a first opening having an open wider upper end and a narrower lower end. The first opening is bounded by opposed sidewalls in spaced-apart orientation that are inwardly inclined from the wider upper end to the narrower lower end. The aperture is configured to enable a specimen to sit over the opening and can be wedged between the first opening opposed sidewalls so that a region of interest to be milled is centered about the open end of the opening. Specimens so mounted can then be re-thinned via charged particle instruments such as focused ion beam (FIB) milling, broad beam ion milling, or via laser ablation.

Abstract translation: 用于非原位提取（EXLO）铣削工艺的样品载体包括具有至少一个样品支撑区域的载体顶表面和穿过样品载体顶表面形成的至少一个孔。 孔包括具有敞开的较宽上端和较窄下端的第一开口。 第一开口由相对侧壁限定，其间隔开的方向从较宽的上端向较窄的下端向内倾斜。 孔被构造成使得样本能够坐在开口上方并且可以楔入第一开口相对的侧壁之间，使得待研磨的感兴趣区域围绕开口的开口端居中。 然后可以通过带电粒子仪器（如聚焦离子束（FIB）铣削，宽束离子铣削或经由激光烧蚀）将如此安装的样品重新稀释。

公开(公告)号：US08729469B1

公开(公告)日：2014-05-20

申请号：US13935720

申请日：2013-07-05

Applicant: FEI Company

Inventor： Michael Schmidt ,  Stacey Stone ,  Corey Senowitz

IPC: H01J37/20

CPC classification number: H01J37/3023 ,  G01N1/286 ,  H01J2237/201 ,  H01J2237/208 ,  H01J2237/31745

Abstract: An improved method for extracting and handling multiple samples for S/TEM analysis is disclosed. Preferred embodiments of the present invention make use of a micromanipulator that attaches multiple samples at one time in a stacked formation and a method of placing each of the samples onto a TEM grid. By using a method that allows for the processing of multiple samples, the throughput of sample prep in increased significantly.

Abstract translation: 公开了一种用于提取和处理多个样品进行S / TEM分析的改进方法。 本发明的优选实施例利用将叠层结构中的多个样品一次附着在一起的显微操纵器和将每个样品放置在TEM网格上的方法。 通过使用允许多个样品处理的方法，样品制备的生产量显着增加。

公开(公告)号：US20140034846A1

公开(公告)日：2014-02-06

申请号：US13566013

申请日：2012-08-03

Applicant: William D. Lee ,  William P. Reynolds ,  Stanley W. Stone

Inventor： William D. Lee ,  William P. Reynolds ,  Stanley W. Stone

IPC: G21K5/08

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31705 ,  H01L21/02002 ,  H01L21/67109 ,  H01L21/67201 ,  H01L21/67213 ,  H01L21/67742 ,  H01L21/67766

Abstract: An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.

Abstract translation: 离子注入系统向位于冷却卡盘上的处理室的真空环境中的工件提供离子。 处理室内的预冷站具有构造成将工件冷却到第一温度的冷冻工件支撑件，并且处理室内的后加热站具有被配置为将工件加热到第二温度的加热工件支撑件。 第一温度低于处理温度，第二温度大于外部温度。 工件传送臂还被构造成在卡盘，加载锁定室，预冷站和后加热站之间的两个或更多个之间同时传送两个或更多个工件。

公开(公告)号：US08530858B2

公开(公告)日：2013-09-10

申请号：US13000593

申请日：2009-06-11

Applicant: Shohei Terada ,  Yoshifumi Taniguchi

Inventor： Shohei Terada ,  Yoshifumi Taniguchi

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/201 ,  H01J2237/20264 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: A transmission electron microscope apparatus, a sample holder and a sample stage and a method for acquiring spectral images as well are provided which can acquire spectral images at a time from a plurality of samples and measure highly accurate chemical shifts from electron energy loss spectra extracted from the spectral images. A transmission electron microscope apparatus comprises an electron gun for emitting an electron beam, a condenser lens for converging the emitted electron beam, a plurality of sample stages radiated with a converged electron beam and adapted to mount samples, a sample movement control unit for moving the sample stages, image-forming lenses for forming an image of an electron beam having transmitted through the plural samples, an electron spectrometer adapted to perform spectrometry of the electron beam in accordance with energy amounts the image-formed electron beam has and deliver spectral images obtained at convergence positions which are different in energy dispersion axis direction and in a direction orthogonal to the energy dispersion axis direction to thereby acquire spectral images from the plural samples at a time, and an image display unit for displaying acquired spectral images.

Abstract translation: 提供透射电子显微镜装置，样品架和样品台以及用于获取光谱图像的方法，其可以从多个样品一次获得光谱图像，并且从提取的电子能量损失谱测量高精度的化学位移 光谱图像。 一种透射电子显微镜装置，包括用于发射电子束的电子枪，用于会聚发射的电子束的聚光透镜，用会聚的电子束辐射并适合安装样品的多个样品台，用于移动 样品级，用于形成透过多个样品的电子束的图像的成像透镜，适于根据图像形成的电子束的能量进行电子束的光谱测定的电子光谱仪，并且传送所获得的光谱图像 在能量色散轴方向和与能量色散轴方向正交的方向上不同的会聚位置，从而一次从多个样本获取光谱图像，以及用于显示所取得的光谱图像的图像显示单元。

公开(公告)号：US20130056655A1

公开(公告)日：2013-03-07

申请号：US13226590

申请日：2011-09-07

Applicant: Theodore Smick ,  Geoffrey Ryding ,  Takao Sakase ,  William Park, JR. ,  Joseph Gillespie ,  Ronald Horner ,  Paul Eide

Inventor： Theodore Smick ,  Geoffrey Ryding ,  Takao Sakase ,  William Park, JR. ,  Joseph Gillespie ,  Ronald Horner ,  Paul Eide

IPC: G21K5/10

CPC classification number: C23C14/48 ,  C23C14/505 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/201 ,  H01J2237/20214

Abstract: An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.

Abstract translation: 使用具有旋转轴和周边的旋转扫描组件的离子注入的装置和方法。 多个基板保持器围绕周边分布，并且基板保持器布置成保持相应的平面基板。 每个平面基板在周边上具有相应的几何中心。 束线组件提供离子束以用于植入在支架上的平面基底中。 束线组件被布置成沿着最终光束路径引导所述光束。

公开(公告)号：US08143595B2

公开(公告)日：2012-03-27

申请号：US12547195

申请日：2009-08-25

Applicant: Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

Inventor： Junichi Tatemichi ,  Masatoshi Onoda ,  Kohichi Orihira

IPC: C23C14/50

CPC classification number: H01L21/67213 ,  H01J37/20 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/68764 ,  H01L21/68771

Abstract: An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.

Abstract translation: 离子注入机包括：入射离子束的注入室，用于将基板保持在X方向上的第一列和第二列的两列的保持器，以及具有将所述保持器设置为的功能的保持器驱动单元 水平状态，然后将保持器定位在基板更换位置中，并且具有将支架设置在立起状态，然后在离子束的照射区域沿X方向往复并直线地驱动保持器的功能。 此外，离子注入机还包括两个装载锁定机构，以及两个装有臂的基板承载单元，每个臂分别在两个载荷锁定机构和基板更换位置之间承载基板。

公开(公告)号：US20120061560A1

公开(公告)日：2012-03-15

申请号：US12882432

申请日：2010-09-15

Applicant: HENG-GUNG CHEN

Inventor： HENG-GUNG CHEN

IPC: H01J37/317 ,  H01J49/26

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/201 ,  H01J2237/20285 ,  H01J2237/24507

Abstract: An ion implanting system includes an ion beam generator configured for generating a first ion beam; a mass separation device configured for isolating a second ion beam including required ions from the first ion beam; a holder device configured for holding a plurality of substrates, wherein the holder device and the second ion beam reciprocate relative to each other along a first direction to make the plurality of substrates pass across a projection region of the second ion beam; and a first detector configured for obtaining relevant parameters of the second ion beam. The above ion beam implanting system may increase the ion beam utilization rate. The ion implanting system further comprises a second detector arranged on the holder device which could fully scan across the projection range of the second ion beam and obtaining the relevant parameters of the second ion beam.

Abstract translation: 离子注入系统包括被配置用于产生第一离子束的离子束发生器; 质量分离装置，被配置为将包含所需离子的第二离子束与第一离子束隔离; 保持器装置，其构造成保持多个基板，其中所述保持器装置和所述第二离子束沿着第一方向相对于彼此往复运动，以使所述多个基板穿过所述第二离子束的突出区域; 以及第一检测器，被配置为获得所述第二离子束的相关参数。 上述离子束注入系统可以增加离子束的利用率。 离子注入系统还包括布置在保持器装置上的第二检测器，其可完全扫描第二离子束的投影范围并获得第二离子束的相关参数。

公开(公告)号：US20110140006A1

公开(公告)日：2011-06-16

申请号：US13026568

申请日：2011-02-14

Applicant: Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: G21K5/04

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.

Abstract translation: 一种聚焦离子束装置，其特征在于，包括：具有从样本中提取微量试样的探针的检体转印单元，能够通过接合沉积膜接合，将所述微观样品转印到样品保持体上; 并且其中，所述检体转印单元将通过所述接合沉积膜接合的所述探针保持在从所述检体提取的所述微量试样上，并且所述样品台移动，使得安装在所述保持器扣上的样品保持器被设置在 聚焦离子束和样品转印单元接近探针到样品保持器，并且气体喷嘴提供沉积气体，使得微量样品通过定影沉积膜固定到样品保持器，并且离子束照射光学 系统将聚焦的离子束照射到固定到样品保持器上的微量样品用于各种程序。