Abstract:
The invention relates to an amorphous porous open-pore molded SiO 2 element which is characterized by being constituted of two or more SiO 2 layers that have a different composition or that have a different structure.
Abstract:
Process for the production of monoliths of glass by means of the sol-gel process, comprising the following steps: a) dispersion in water of an oxide prepared by the pyrogenic route, b) hydrolysis of an alkoxide in aqueous solution to form a hydrolysate, c) mixing of the hydrolysate of the alkoxide with the oxide prepared by the pyrogenic route to form a colloidal sol, d) optional removal of coarse contents from the colloidal sol, e) gelling of the colloidal sol in a mould, f) replacement of the water contained in the resulting aerogel by an organic solvent, g) drying of the aerogel, h) heat treatment of the dried aerogel.
Abstract:
A method of making an optical fiber precursor includes generating vapors from an alkali metal source comprising compound containing oxygen and one or more alkali metals and applying the vapors to a surface of a glass article comprising silica at a temperature that promotes diffusion of the alkali metal into the surface of the glass article. An optical fiber has a core comprising silica and an alkali metal oxide of the form X 2 O, where X is selected from the group consisting of K, Na, Li, Cs, and Rb, wherein a concentration of the alkali metal oxide along a length of the core is uniform.
Abstract translation:制造光纤前体的方法包括从包含氧和一种或多种碱金属的化合物的碱金属源生成蒸气,并在促进碱金属扩散的温度下将蒸气施加到包含二氧化硅的玻璃制品的表面 玻璃制品的表面。 光纤具有包含二氧化硅和X 2 O 2形式的碱金属氧化物的核,其中X选自K,Na,Li,Cs和Rb,其中浓度 的碱金属氧化物沿芯的长度是均匀的。
Abstract:
Vorrichtung zur Herstellung von Fused Silica, dadurch gekennzeichnet, dass die Vorrichtung, deren nun folgende Komponenten metallfrei sind, eine Fördervorrichtung für Fumed Silica, eine Messvorrichtung und eine Dosiervorrichtung und darauf folgend einen Reaktor mit einer Versinterungsvorrichtung und darauf folgend eine Abscheidungsvorrichtung aufweist.
Abstract:
High-purity pyrogenically prepared silicon dioxide having metal contents of less than 0.2 &mgr;g/g is prepared by reacting a silicon tetrachloride having a metal content of less than 30 ppb by means of flame hydrolysis. The silicon dioxide can be utilised for the manufacture of high-purity glasses by means of the sol-gel process, which show a high-homogenity. It can be used for the production of shaped articles, which can be used as preforms for the optical fiber spinning.
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
Abstract:
A quartz glass to be used through exposure to an ultraviolet ray having a wave length of 200 nm or less, characterized in that it is produced from natural rock-crystal or silica sand, has a total content of sodium, potassium, titanium and iron of 2.5 ppm or less and contains an OH group in an amount of 10 ppm or more; and an ultraviolet irradiation apparatus wherein the quartz glass is used as the material of a bulb (11) of a light emitting tube of an ultraviolet discharge lamp (L), and as the material of an ultraviolet-transmittable outer tube or protecting tube (20) housing the ultraviolet discharge lamp. The quartz glass is improved with respect to the lowering of the transmittance of an ultraviolet ray in a shorter wave length region with the elapse of time, which leads to the provision of a discharge lump and an ultraviolet irradiation apparatus which are greatly improved in the degree of retention of ultraviolet ray strength, and thus can be operated at a reduced cost and with saving energy.
Abstract:
An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide an a synthetic quartz glass for optical use. The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2 powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.