公开(公告)号：US20180105452A1

公开(公告)日：2018-04-19

申请号：US15559958

申请日：2016-03-22

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai

IPC: C03C10/00 ,  C03C3/06 ,  C03C3/076 ,  G03F1/60 ,  B32B17/06 ,  C03B19/06 ,  C03B23/203 ,  C03B32/02

CPC classification number: C03C10/0009 ,  B32B3/28 ,  B32B5/16 ,  B32B5/30 ,  B32B7/04 ,  B32B17/06 ,  B32B37/04 ,  B32B2260/025 ,  B32B2260/04 ,  B32B2264/101 ,  B32B2264/102 ,  B32B2264/12 ,  B32B2307/30 ,  B32B2307/416 ,  B32B2307/704 ,  B32B2307/732 ,  B32B2551/00 ,  C03B19/066 ,  C03B23/203 ,  C03B32/02 ,  C03B2201/06 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C27/06 ,  C03C2201/10 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/28 ,  C03C2201/42 ,  C03C2203/50 ,  C03C2203/52 ,  C03C2204/00 ,  G02B1/00 ,  G02B5/0891 ,  G03F1/60

Abstract: A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.

公开(公告)号：US20170349475A1

公开(公告)日：2017-12-07

申请号：US15661303

申请日：2017-07-27

Applicant: Corning Incorporated

Inventor： Carlos Alberto Duran

IPC: C03B25/00 ,  C03C3/076 ,  C03B25/08 ,  C03C3/06 ,  C03B25/02

CPC classification number: C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

公开(公告)号：US20170144917A1

公开(公告)日：2017-05-25

申请号：US15297534

申请日：2016-10-19

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC: C03C3/089 ,  C03C4/00 ,  C03B25/02

CPC classification number: C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US09586850B2

公开(公告)日：2017-03-07

申请号：US14911506

申请日：2014-07-22

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stefan Ochs ,  Klaus Becker ,  Stephan Thomas

IPC: C03C3/06 ,  C03B19/14 ,  G03F1/60 ,  C03C3/00 ,  C03C4/00 ,  G03F1/52

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例Ti3 + / Ti4 +≤5×10-4。

公开(公告)号：US09522840B2

公开(公告)日：2016-12-20

申请号：US14766276

申请日：2014-02-04

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stephan Thomas ,  Klaus Becker ,  Stefan Ochs

IPC: C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B5/08 ,  G03F7/20 ,  C03B25/02

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B25/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70958

Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.

Abstract translation: 用于EUV光刻的用于镜面基板的TiO 2 -SiO 2玻璃的空白对于适应以优化热膨胀系数的进展以及因此也是过零点温度Tzc的进展的需求很低。 TiO 2 -SiO 2玻璃具有在920℃和970℃之间的范围内的假想温度Tf的平均值。表示为其过零点温度Tzc的差分商dTzc / dTf对虚构温度Tf的依赖关系 小于0.3。

公开(公告)号：US20160264447A1

公开(公告)日：2016-09-15

申请号：US15035776

申请日：2014-11-06

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stefan OCHS ,  Klaus BECKER

IPC: C03B19/14 ,  C03C4/00 ,  G03F1/24 ,  C03C3/06

CPC classification number: C03B19/1461 ,  C03B19/066 ,  C03B19/106 ,  C03B19/1095 ,  C03B19/14 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54 ,  C03C2204/00 ,  G03F1/24

Abstract: A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles.

Abstract translation: 描述了在EUV光刻中使用具有指定氟含量的钛掺杂的高硅酸性玻璃制造坯料的方法，其中在工作温度下的热膨胀系数尽可能稳定地保持在零。 Ti掺杂石英玻璃的热膨胀系数取决于多个影响因素。 除了绝对的钛含量之外，钛的分布是重要的，附加的掺杂元素如氟的比例和分布也是重要的。 在该方法中，通过固化和玻璃化进一步生成氟掺杂的TiO 2 -SiO 2烟灰颗粒到坯料中，并且通过含硅和钛的输入物质的火焰水解，形成TiO 2 -SiO 2 - 烟灰颗粒，暴露于 在移动的粉末床中含有氟的试剂，并转化成掺杂氟的TiO 2 -SiO 2 - 烟灰颗粒。

公开(公告)号：US20160085145A1

公开(公告)日：2016-03-24

申请号：US14862707

申请日：2015-09-23

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stefan OCHS ,  Klaus BECKER

IPC: G03F1/22 ,  C03C3/04 ,  C03B19/06

CPC classification number: G03F1/22 ,  C03B19/06 ,  C03B19/14 ,  C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C21/007 ,  C03C23/00 ,  C03C23/007 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54 ,  G03F1/24 ,  G03F1/60 ,  G03F7/00

Abstract: A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.

Abstract translation: 用于EUV光刻的共同掺杂钛和氟的二氧化硅玻璃毛坯的制造方法包括（a）通过含硅和钛的前体物质的火焰水解制备TiO 2 -SiO 2烟炱体，（b）氟化TiO 2 -SiO2烟灰体，形成氟掺杂的TiO 2 -SiO 2烟炱体，（c）在含水蒸气的气氛中处理氟掺杂的TiO 2 -SiO 2烟炱体以形成调节的烟灰体，（d） 烟灰体形成空白。 空白样品厚度为10mm时，在400〜700nm的波长范围内具有至少60％的内透射率，10〜100wt。范围内的平均OH含量。 ppm，平均氟含量在2500至10,000重量％的范围内。 ppm。 钛在氧化形式Ti3 +和Ti4 +中存在于坯料中。

公开(公告)号：US09278881B2

公开(公告)日：2016-03-08

申请号：US14146182

申请日：2014-01-02

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Tetsuji Ueda ,  Masanobu Ezaki

IPC: C03C3/06 ,  C03C10/00 ,  C03C4/00 ,  C03B19/14 ,  C03B20/00 ,  C03B25/02 ,  G03F7/20 ,  G03F1/60 ,  G03F1/22

CPC classification number: C03C10/00 ,  C03B19/1453 ,  C03B19/1469 ,  C03B20/00 ,  C03B25/02 ,  C03B2201/42 ,  C03B2207/20 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  G03F1/22 ,  G03F1/60 ,  G03F7/70958

Abstract: A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.

Abstract translation: 成员由掺杂二氧化钛的石英玻璃制成，其中条纹在与EUV反射表面垂直的表面中具有至少150mm的曲率半径。 没有暴露的条纹并且具有高平整度的部件在EUV光刻中是有用的。

公开(公告)号：US20160016839A1

公开(公告)日：2016-01-21

申请号：US14804673

申请日：2015-07-21

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Malte SCHWERIN ,  Martin TROMMER ,  Steffen ZWARG

IPC: C03B19/06 ,  C03C3/06

CPC classification number: C03B19/066 ,  C03B19/1453 ,  C03B19/1461 ,  C03B23/045 ,  C03B23/095 ,  C03B23/099 ,  C03B37/01446 ,  C03B37/01453 ,  C03B37/0146 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/36 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/12 ,  C03C2201/32 ,  C03C2201/34 ,  C03C2201/36 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/46

Abstract: One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

Abstract translation: 一方面涉及制造掺杂石英玻璃的方法。 此外，一方面涉及根据该方法可获得的石英玻璃，其包括提供烟灰体，用气体处理烟灰体，加热中间产物并玻璃化中间产物。

公开(公告)号：US20150376048A1

公开(公告)日：2015-12-31

申请号：US14748344

申请日：2015-06-24

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Klaus BECKER ,  Stefan OCHS ,  Stephan THOMAS

IPC: C03B23/04 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03B23/04 ,  C03B19/066 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/06 ,  C03B2201/075 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2203/50 ,  G03F1/24 ,  G03F7/70316 ,  G03F7/7095

Abstract: A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTEmax) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEmax is at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTEmax.

Abstract translation: 提供了一种用于EUV光刻的用于镜面基板的掺钛石英玻璃的空白件。 坯料包括具有反射膜并具有光学用途区域（CA）的表面部分，在该区域上的热膨胀系数（CTE）在坯料的厚度上平均的二维不均匀性（dCTE）分布分布平均 。 小于5ppb / K的最大不均匀性（dCTEmax）定义为CTE最大值和CTE最小值之间的差。 dCTEmax至少为0.5 ppb / K。 CA形成具有质心的非圆形区域。 dCTE分布轮廓不是旋转对称的，并且在CA上定义，使得被归一化为单位长度并延伸穿过该区域的质心的直线剖面产生了形成带宽小于的曲线的dCTE曲线族 0.5×dCTEmax。