Method and apparatus for in-situ probe tip replacement inside a charged particle beam microscope
    261.
    发明授权
    Method and apparatus for in-situ probe tip replacement inside a charged particle beam microscope 有权
    用于在带电粒子束显微镜内进行原位探针尖端置换的方法和装置

    公开(公告)号:US07381971B2

    公开(公告)日:2008-06-03

    申请号:US11186073

    申请日:2005-07-21

    Abstract: We disclose a gripper and associated apparatus and methods for delivering nano-manipulator probe tips inside a vacuum chamber. The gripper includes a tube; a compression cylinder inside of and coaxial with the tube; and at least one elastic ring adjacent to the compression cylinder. There is a vacuum seal coaxial with the compression cylinder for receiving and sealing against a probe tip. An actuator is connected to the compression cylinder for compressing the elastic ring and causing it to grip the probe tip. Thus the probe tip can be gripped, transferred to a different location in the vacuum chamber, and released there.Samples attached to the probe tips will be transferred to a TEM sample holder, shown in several embodiments, that includes a bar having opposed ends; an arm attached to each opposed end of the bar; one or more slots for receiving a probe tip; and, each slot having an inner part and an outer part, where the inner part is smaller than the outer part. The TEM sample holders just described are inserted into a carrier cassette. A cassette for transferring one or more TEM sample holders comprises a platform; at least one bar extending upwardly from the platform; the bar having a groove for receiving and holding a TEM sample holder. A rotatable magazine holds one or more probe tips and selectively releases the tips. The magazine includes a cartridge having a plurality of longitudinal openings for receiving probe tips and dispensing probe tips.

    Abstract translation: 我们公开了一种夹具和相关的装置和方法,用于在真空室内输送纳米机械手探针尖端。 夹具包括管; 压缩缸内部并与管同轴; 以及与压缩圆筒相邻的至少一个弹性环。 存在与压缩筒同轴的真空密封件,用于接收和密封探针尖端。 致动器连接到压缩气缸,用于压缩弹性环并使其夹持探针尖端。 因此,探针尖端可以被夹持,转移到真空室中的不同位置,并在那里释放。 附接到探针尖端的样品将转移到TEM样品保持器,如几个实施方案中所示,其包括具有相对端的棒; 连接到杆的每个相对端的臂; 用于接收探针尖端的一个或多个狭槽; 并且每个狭槽具有内部部分和外部部分,其中内部部分小于外部部分。 刚刚描述的TEM样品架被插入到载体盒中。 用于转移一个或多个TEM样品保持器的盒子包括平台; 从平台向上延伸的至少一个杆; 该棒具有用于容纳和保持TEM样品保持器的凹槽。 一个可旋转刀库可容纳一个或多个探针尖端并选择性地释放尖端。 该盒包括具有多个用于接收探针尖端并分配探针尖端的多个纵向开口的盒。

    E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same
    263.
    发明申请
    E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same 有权
    用于同时照射多个光掩模的电子束光刻系统和使用其制造光掩模的方法

    公开(公告)号:US20070181828A1

    公开(公告)日:2007-08-09

    申请号:US11656467

    申请日:2007-01-23

    Abstract: Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.

    Abstract translation: 公开了一种用于同时照射多个基板的表面的电子束光刻系统。 电子束光刻系统可以包括加载单元装载和卸载基板,对准基板的对准室,从加载单元或室转移基板的传送室,将一个或多个电子束辐射到基板上的光刻室,以及 在室中产生真空的真空室。 平台可以安装在光刻室中,使得基板可以安装在平台上并用一个或多个电子束辐射。

    ION IMPLANTING APPARATUS AND METHOD
    269.
    发明申请
    ION IMPLANTING APPARATUS AND METHOD 审中-公开
    离子植入装置和方法

    公开(公告)号:US20070023698A1

    公开(公告)日:2007-02-01

    申请号:US11457775

    申请日:2006-07-14

    Applicant: Geum-Sik PARK

    Inventor: Geum-Sik PARK

    Abstract: An ion implanting apparatus and method are provided. The apparatus includes a plurality of dummy wafers and a plurality of dummy wafer cassettes. The dummy wafers are separately used for respective kinds of ions, and the plurality of dummy wafer cassettes separately store the dummy wafers separately used for the respective kinds of ions. The plurality of dummy wafer cassettes are installed in order to store the plurality of dummy wafers for the respective kinds of ions and use the dummy wafers for an ion implanting process.

    Abstract translation: 提供了离子注入装置和方法。 该装置包括多个虚拟晶片和多个虚拟晶片盒。 虚拟晶片分别用于各种离子,并且多个虚设晶片盒分别存储分别用于各种离子的虚拟晶片。 安装多个虚拟晶片盒以便存储用于各种离子的多个虚拟晶片,并使用虚拟晶片进行离子注入工艺。

    Method and apparatus for specimen fabrication
    270.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号:US07138628B2

    公开(公告)日:2006-11-21

    申请号:US11390201

    申请日:2006-03-28

    Abstract: A specimen fabrication apparatus including: a specimen chamber, a sample stage in the specimen chamber, to mount a specimen substrate, a transfer unit to extract a micro-specimen from the specimen substrate, and to transfer the micro-specimen, within the specimen chamber; a specimen holder in the specimen chamber, to receive the micro-specimen from the transfer unit, and to have the micro-specimen affixed thereto, and an irradiating optical system to irradiate an ion beam to the specimen substrate or to the micro-specimen affixed to the specimen holder, wherein the transfer unit effects transfer of the micro-specimen from the specimen substrate to the specimen holder, and the irradiating optical system irradiates the ion beam onto the micro-specimen affixed to the specimen holder, while the specimen chamber remains substantially sealed.

    Abstract translation: 一种标本制造装置,包括:试样室,试样室中的样品台,安装试样基板,转移单元,从试样基板取出微量试样,并在试样室内转移微量试样 ; 在样本室中的样本保持器,用于从转印单元接收微量样本,并且将微型样品固定在其上;以及照射光学系统,用于将离子束照射到样品基底或贴在微型样品上 所述转印单元将所述微量试样从所述试样基板转移到所述试样保持体,并且所述照射光学系统将所述离子束照射到固定在所述试样保持器上的所述微量试样上, 基本上密封。

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